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1. 发明公开

EP2743969A1 ETCHING METHOD AND METHOD FOR PERFORMING SURFACE PROCESSING ON SOLID MATERIAL FOR SOLAR CELL 审中-公开
标题翻译：蚀刻和方法进行表面处理对企业材料太阳能电池
公开(公告)号：EP2743969A1
公开(公告)日：2014-06-18
申请号：EP12823923.3
申请日：2012-08-10
申请人： Osaka University , Daikin Industries, Ltd.
发明人： MORITA, Mizuho , UCHIKOSHI, Junichi , TSUKAMOTO, Kentaro , NAGAI, Takabumi , ADACHI, Kenji
IPC分类号： H01L21/308 , H01L31/04
CPC分类号： H01L31/02366 , H01L31/02363 , H01L31/18 , Y02E10/50
摘要： Provided is an etching method including: (1) bringing a material containing at least one organic compound having an N-F bond into contact with the surface of a solid material; and (2) a step of heating the solid material; whereby etching can be performed safely and in a simple manner, at a higher etching rate, without the use of a high-environmental-load gas that causes global warming or highly reactive and toxic fluorine gas or hydrofluoric acid. The etching method may further include: (3) a step of exposing the solid material to light from the side of the material containing at least one organic compound having an N-F bond; and (4) a step of removing the material containing at least one organic compound having an N-F bond together with the residue remained between said material and the solid material. In particular, performing heating at a high temperature and applying light irradiation make it possible to form inverted pyramid-shaped recesses that are suitable for applying light-trapping and/or anti-reflection processing to the surface of the solid material for a solar cell.
摘要翻译：本发明提供一种蚀刻方法，包括：（1）使含有具有N-F键与固体材料的表面接触的至少一个有机化合物的材料; 和（2）加热固体材料的步骤; 由此蚀刻可以以简单的方式安全地和速率进行，以较高的蚀刻，而无需使用高环境负荷的气体确实引起全球变暖的或高反应性和毒性的氟气或氢氟酸。蚀刻方法可以进一步包括：（3）将固体材料从含有具有N-F键的至少一种有机化合物材料的侧暴露于光的步骤; 和（4）除去含有N-F键与所述残余物，所述材料和所述固体材料之间一起保持具有至少一种有机化合物材料的工序。特别地，在高温下进行加热和施加光照射使得能够形成倒金字塔形的凹部确实适合于施加光俘获和/或防反射处理，以将固体材料的表面的太阳能电池。

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