专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP1060299A1 METHOD OF ETCHING 审中-公开
标题翻译：法蚀刻
公开(公告)号：EP1060299A1
公开(公告)日：2000-12-20
申请号：EP99909447.7
申请日：1999-03-05
申请人： Obducat AB
发明人： HEIDARI, Babak , OLSSON, Lennart
IPC分类号： C25F3/14
CPC分类号： C25F3/14 , H05K3/07
摘要： A method of making, by etching, depressions (7) in selected portions of an etching surface of an electrically conductive etching material (5), the depressions (7) forming an etching pattern, comprises the step of contacting the etching material (5) with an etchant (22). A passivating layer is formed on the etching material, which layer decreases or stops the etching capability of the etchant on the surface and which is dissolved in a chemical reaction when exposed to electromagnetic radiation. An electrode (1) with electrically conductive electrode portions (3) in selected portions of an electrode surface is provided, the electrode portions (3) forming an electrode pattern corresponding to the etching pattern. The electrode (1) is arranged in contact with the etchant (22) and with the electrode portions (3) facing the etching surface of the etching material (5), an electric voltage is applied between the electrode (1) and the etching material (5), and the etching material is exposed to electromagnetic radiation essentially perpendicular to the etching surface to remove the passivating layer from the surfaces that are to be etched.

2. 发明授权

EP1743217B1 METHOD FOR IMPRINT LITHOGRAPHY AT CONSTANT TEMPERATURE 有权
标题翻译：方法印刷LITHOGRAPHIE恒温
公开(公告)号：EP1743217B1
公开(公告)日：2012-04-04
申请号：EP04804576.9
申请日：2004-11-25
申请人： Obducat AB
发明人： BECK, Marc , HEIDARI, Babak , BOLMSJÖ, Erik , THEANDER, Erik
IPC分类号： G03F7/00 , B29C43/10
CPC分类号： G03F7/0002 , B29C35/0888 , B29C43/003 , B29C43/021 , B29C43/10 , B29C59/022 , B29C2035/0827 , B29C2043/025 , B29C2043/3647 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and - postbaking the layer.

3. 发明公开

EP1264215A1 DEVICE FOR TRANSFERRING A PATTERN TO AN OBJECT 有权
标题翻译： DEVICE一个模式和实物转让
公开(公告)号：EP1264215A1
公开(公告)日：2002-12-11
申请号：EP01915982.1
申请日：2001-03-14
申请人： Obducat AB
发明人： MONTELIUS, Lars , HEIDARI, Babak , STJERNHOLM, Thord
IPC分类号： G03F7/00 , B41M1/06 , B81C1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A device for transferring a pattern, especially micro- or nanostructures, from a stamp (1) to an object (2) comprises a first contacting means (11) with a receiving surface (13) for the stamp (1) and a second contacting means (20) with a receiving surface (23) for the object (2). A pressing means (10) is adapted to operate at least one of the contacting means (11, 20) for contacting the stamp (1) with the object (2). One contacting means (11, 20) comprises a base (21) and a holder (22). The holder (22) has a first end which defines one of the receiving surfaces (23) and a second opposite end which is pivotally connected to the base (21) in such a manner that the stamp (1) and the object (2) are automatically placed in a mutually parallel position when contacting each other.

4. 发明授权

EP1759245B1 MODIFIED METAL MOLD FOR USE IN IMPRINTING PROCESSES 有权
标题翻译：改性金属压FOR USE印刷工艺
公开(公告)号：EP1759245B1
公开(公告)日：2008-11-05
申请号：EP05749153.2
申请日：2005-05-27
申请人： Obducat AB
发明人： KEIL, Matthias , FRENNESSON, Göran , BECK, Marc , HEIDARI, Babak
IPC分类号： G03F7/00
CPC分类号： B05D1/60 , B05D1/185 , B29C33/56 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/31678
摘要： The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.

5. 发明授权

EP1264215B1 DEVICE FOR TRANSFERRING A PATTERN TO AN OBJECT 有权
标题翻译： DEVICE一个模式和实物转让
公开(公告)号：EP1264215B1
公开(公告)日：2006-11-08
申请号：EP01915982.1
申请日：2001-03-14
申请人： Obducat AB
发明人： MONTELIUS, Lars , HEIDARI, Babak , STJERNHOLM, Thord
IPC分类号： G03F7/00 , B41M1/06 , B81C1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A device for transferring a pattern, especially micro- or nanostructures, from a stamp (1) to an object (2) comprises a first contacting means (11) with a receiving surface (13) for the stamp (1) and a second contacting means (20) with a receiving surface (23) for the object (2). A pressing means (10) is adapted to operate at least one of the contacting means (11, 20) for contacting the stamp (1) with the object (2). One contacting means (11, 20) comprises a base (21) and a holder (22). The holder (22) has a first end which defines one of the receiving surfaces (23) and a second opposite end which is pivotally connected to the base (21) in such a manner that the stamp (1) and the object (2) are automatically placed in a mutually parallel position when contacting each other.

6. 发明公开

EP1759245A1 MODIFIED METAL MOLD FOR USE IN IMPRINTING PROCESSES 有权
标题翻译：变形金属冶金维尔德伍德北部破产
公开(公告)号：EP1759245A1
公开(公告)日：2007-03-07
申请号：EP05749153.2
申请日：2005-05-27
申请人： Obducat AB
发明人： KEIL, Matthias , FRENNESSON, Göran , BECK, Marc , HEIDARI, Babak
IPC分类号： G03F7/00
CPC分类号： B05D1/60 , B05D1/185 , B29C33/56 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/31678
摘要： The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.
摘要翻译：本发明涉及一种具有抗粘性的新型金属模具，其包括贱金属模和包含磷原子和烷基链的氟化烷基磷酸衍生物或氟化烷基聚磷酸衍生物的防粘层。防粘剂层直接粘合到母模金属模的表面上。贱金属模可以是例如。镍和所述氟化烷基磷酸衍生物或所述氟代烷基聚磷酸衍生物可以选自膦酸，膦酸，膦酸盐和膦酸盐，膦酸盐和膦酸盐或它们各自的低聚物，使得磷原子直接与烷基链结合，使得磷原子直接与烷基链结合。

7. 发明公开

EP1743217A2 METHOD FOR IMPRINT LITHOGRAPHY AT CONSTANT TEMPERATURE 有权
标题翻译：方法印刷LITHOGRAPHIE恒温
公开(公告)号：EP1743217A2
公开(公告)日：2007-01-17
申请号：EP04804576.9
申请日：2004-11-25
申请人： Obducat AB
发明人： BECK, Marc , HEIDARI, Babak , BOLMSJÖ, Erik , THEANDER, Erik
IPC分类号： G03F7/00 , B29C43/10
CPC分类号： G03F7/0002 , B29C35/0888 , B29C43/003 , B29C43/021 , B29C43/10 , B29C59/022 , B29C2035/0827 , B29C2043/025 , B29C2043/3647 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and - postbaking the layer.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式