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1. 发明授权

EP2001045B1 METHOD FOR FORMING THIN FILM AND SEMICONDUCTOR DEVICE 有权
标题翻译：形成薄膜的方法和半导体器件
公开(公告)号：EP2001045B1
公开(公告)日：2017-06-14
申请号：EP07739394.0
申请日：2007-03-23
申请人： Mitsubishi Electric Corporation
发明人： KUMADA, Teruhiko , NOBUTOKI, Hideharu , YASUDA, Naoki
IPC分类号： H01L21/314 , C23C16/507 , H01L21/31 , C23C16/34
CPC分类号： C23C16/30 , C23C16/342 , C23C16/511 , H01J37/32532 , H01L21/318

2. 发明公开

EP2001045A1 PLASMA CVD APPARATUS, METHOD FOR FORMING THIN FILM AND SEMICONDUCTOR DEVICE 有权
标题翻译：法形成用薄膜及半导体器件的
公开(公告)号：EP2001045A1
公开(公告)日：2008-12-10
申请号：EP07739394.0
申请日：2007-03-23
申请人： Mitsubishi Electric Corporation
发明人： KUMADA, Teruhiko , NOBUTOKI, Hideharu , YASUDA, Naoki
IPC分类号： H01L21/314 , C23C16/507 , H01L21/31
CPC分类号： C23C16/30 , C23C16/342 , C23C16/511 , H01J37/32532 , H01L21/318
摘要： Provided is a plasma CVD apparatus including a reaction chamber (1) having an inlet (5) for supplying a compound having a borazine skeleton, a feeding electrode (7), arranged within the reaction chamber (1), for supporting a substrate (8) and being applied with a negative charge, and plasma generating means (12), arranged opposite to the feeding electrode (7) via the substrate (8), for generating a plasma (11) within the reaction chamber (1). Also provided are a method for forming a thin film wherein a thin film is formed by using a compound having a borazine skeleton as a raw material, and a semiconductor device that includes a thin film formed by such a method as an insulating film. The present invention enables to produce a thin film wherein low dielectric constant and high mechanical strength are stably maintained for a long time and insulating characteristics are secured.

3. 发明公开

EP2410029A1 COATING COMPOSITION, COATING PROCESS, AIR CONDITIONER, VENTILATING FAN, AND ELECTRICAL EQUIPMENT 有权
标题翻译： BESCHICHTUNGSZUSAMMENSETZUNG，BESCHICHTUNGSVERFAHREN，KLIMAANLAGE，LÜFTERUND ELEKTRISCHE ANLAGE
公开(公告)号：EP2410029A1
公开(公告)日：2012-01-25
申请号：EP10753259.0
申请日：2010-03-10
申请人： Mitsubishi Electric Corporation
发明人： YAMAMOTO, Yoshinori , YOSHIDA, Yasuhiro , KUMADA, Teruhiko , MORIOKA, Reiji
IPC分类号： C09D201/00 , C09D7/12
CPC分类号： C09D7/1216 , C08K3/012 , C08K3/22 , C08K3/28 , C09D5/024 , C09D5/1618 , C09D5/1637 , C09D7/61 , C09D7/67 , C09D127/18 , Y10T428/254 , C08K3/36 , C08K3/0025
摘要： A coating composition having high dirt prevention properties and improved adhesiveness to hydrophobic surfaces such as those made of a plastic, and a coating method are provided. More specifically, provided is a coating composition, including: hydrophobic resin particles dispersed in an aqueous medium; hydrophilic inorganic fine particles; and an oxidizing agent containing at least one of a peroxide, a perchloric acid, a chlorate, a persulfuric acid, a superphosphoric acid, and a periodate, and also provided is a coating method including the steps of: preparing a first agent having hydrophilic inorganic fine particles and hydrophobic resin particles dispersed in an aqueous medium; preparing a second agent by adding, to the first agent, an oxidizing agent containing at least one of a peroxide, a perchloric acid, a chlorate, a persulfuric acid, a superphosphoric acid, and a periodate; applying the second agent onto a member to be coated; and drying the second agent on the member to be coated.
摘要翻译：提供了具有高防污性和改善与疏水性表面的粘合性（例如由塑料制成的那些）的涂料组合物和涂布方法。更具体地，提供一种涂料组合物，其包括：分散在水性介质中的疏水性树脂颗粒; 亲水无机细颗粒; 以及包含过氧化物，高氯酸，氯酸盐，过硫酸，过磷酸和高碘酸盐中的至少一种的氧化剂，并且还提供了一种涂布方法，包括以下步骤：制备具有亲水性无机分散在水性介质中的细颗粒和疏水性树脂颗粒; 通过向第一药剂中加入含有过氧化物，高氯酸，氯酸盐，过硫酸，过磷酸和高碘酸盐中的至少一种的氧化剂来制备第二药剂; 将第二试剂施加到待涂覆的构件上; 并将待涂覆的构件上的第二试剂干燥。

4. 发明公开

EP2159832A1 PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, INSULATING FILM FOR SEMICONDUCTOR DEVICE, AND APPARATUS FOR PRODUCING THE INSULATING FILM 审中-公开
标题翻译：方法的半导体元件，绝缘皮膜的绝缘膜的生产半导体元件及装置
公开(公告)号：EP2159832A1
公开(公告)日：2010-03-03
申请号：EP08777183.8
申请日：2008-06-13
申请人： Mitsubishi Heavy Industries, Ltd. , Mitsubishi Electric Corporation , Nippon Shokubai Co., Ltd.
发明人： FUJIWARA, Toshihito , NISHIMORI, Toshihiko , WATANABE, Toshiya , YASUDA, Naoki , NOBUTOKI, Hideharu , KUMADA, Teruhiko , MIZUSHIMA, Chiho , KAMIYAMA, Takuya , YAMAMOTO, Tetsuya
IPC分类号： H01L21/318 , C23C14/12 , H01L21/312 , H01L21/768 , H01L23/522
CPC分类号： H01L21/02118 , C23C16/342 , C23C16/505 , H01L21/02274 , H01L21/02348 , H01L21/02351 , H01L21/312 , H01L21/76801
摘要： An object to provide an insulating film for a semiconductor device, which has characteristics of low permittivity, a low leak current, and high mechanical strength, undergoes small time-dependent change of these characteristics, and has excellent water resistance, and to provide a manufacturing apparatus of the same, and a manufacturing method of the semiconductor device using the insulating film. The production process comprises a film forming step of supplying a mixed gas containing a carrier gas and a raw material gas, which is a gasified material having borazine skeletal molecules, into a chamber, causing the mixed gas to be in a plasma state, applying a bias to the substrate placed in the chamber, and carrying out gas-phase polymerization by using the borazine skeletal molecule as a fundamental unit so as to form the insulating film on the substrate; and a reaction promoting step of, after the film forming step, bringing the bias applied to the substrate to a different magnitude from the bias in the film forming step, supplying the mixed gas while gradually reducing only the raw material gas, which is the gasified material having the borazine skeletal molecules, treating the insulating film with a plasma mainly comprising the carrier gas.
摘要翻译：一个目的是在用于制造半导体器件，其具有低介电常数，低漏电流，高机械强度的特性的绝缘膜提供，下进入的合成特性小随时间的变化，且具有优异的耐水性，并提供一种制造相同的装置，以及使用该绝缘膜 - 半导体装置的制造方法。生产过程包括供应的混合气体含有载气和原料气体的成膜工序中，所有这一切都为具有环硼氮烷骨架的分子气化的材料，到腔室中，使混合气体成为等离子体状态，施加偏压放置于所述腔室中，并通过使用环硼氮烷骨架分子作为基本单位进行气相聚合，从而形成所述绝缘基板的薄膜在基板上; 和的反应促销婷步骤，所述膜形成工序中，使从在膜中的偏压形成工序中施加到基材到不同的幅度的偏压，供给混合气体，同时逐渐减小只原料气体后，所有这一切是将气化的具有环硼氮烷骨架的分子的材料，处理所述绝缘膜-用等离子体主要包含载气。

5. 发明授权

EP2410029B1 COATING COMPOSITION, COATING PROCESS, AIR CONDITIONER, VENTILATING FAN, AND ELECTRICAL EQUIPMENT 有权
标题翻译：涂料组合物，涂布方法，空调，风扇和电气系统
公开(公告)号：EP2410029B1
公开(公告)日：2014-06-04
申请号：EP10753259.0
申请日：2010-03-10
申请人： Mitsubishi Electric Corporation
发明人： YAMAMOTO, Yoshinori , YOSHIDA, Yasuhiro , KUMADA, Teruhiko , MORIOKA, Reiji
IPC分类号： C09D7/12 , C09D201/00
CPC分类号： C09D7/1216 , C08K3/012 , C08K3/22 , C08K3/28 , C09D5/024 , C09D5/1618 , C09D5/1637 , C09D7/61 , C09D7/67 , C09D127/18 , Y10T428/254 , C08K3/36 , C08K3/0025
摘要： A coating composition having high dirt prevention properties and improved adhesiveness to hydrophobic surfaces such as those made of a plastic, and a coating method are provided. More specifically, provided is a coating composition, including: hydrophobic resin particles dispersed in an aqueous medium; hydrophilic inorganic fine particles; and an oxidizing agent containing at least one of a peroxide, a perchloric acid, a chlorate, a persulfuric acid, a superphosphoric acid, and a periodate, and also provided is a coating method including the steps of: preparing a first agent having hydrophilic inorganic fine particles and hydrophobic resin particles dispersed in an aqueous medium; preparing a second agent by adding, to the first agent, an oxidizing agent containing at least one of a peroxide, a perchloric acid, a chlorate, a persulfuric acid, a superphosphoric acid, and a periodate; applying the second agent onto a member to be coated; and drying the second agent on the member to be coated.

6. 发明公开

EP2112207A1 COATING COMPOSITION, COATING METHOD, HEAT EXCHANGER AND AIR CONDITIONER 有权
标题翻译： BESCHICHTUNGSZUSAMMENSETZUNG，BESCHICHTUNGSVERFAHREN，WÄRMETAUSCHERUND KLIMAANLAGE
公开(公告)号：EP2112207A1
公开(公告)日：2009-10-28
申请号：EP08702953.4
申请日：2008-01-08
申请人： Mitsubishi Electric Corporation
发明人： YOSHIDA, Yasuhiro , YAMAMOTO, Yoshinori , KUMADA, Teruhiko , MORIOKA, Reiji , YOSHIKAWA, Toshiaki , TANIKAWA, Yoshinori , TAKAGI, Tsukasa , NAKAGAWA, Hidetomo
IPC分类号： C09D127/18 , B05D5/00 , B05D7/24 , C09D5/16 , C09D7/12 , F28F13/18
CPC分类号： F28F19/04 , B05D3/042 , C09D1/00 , C09D5/1637 , C09D127/18 , F24F1/0059
摘要： The present invention provides a coating composition comprising ultrafine silica particles having an average particle diameter of 15 nm or less and fluororesin particles, in which ultrafine silica particle content is 0.1 to 5 mass%, and the mass ratio of the ultrafine silica particles to the fluororesin particles is 70:30 to 95:5. According to the coating composition of the present invention, there is provided a coating film which makes it possible to readily coat the surfaces of various articles without impairing the color tone and the texture and which is excellent in antisoiling performance and durability.
摘要翻译：本发明提供一种包含平均粒径为15nm以下的超细二氧化硅粒子和超细二氧化硅粒子含量为0.1〜5质量％的氟树脂粒子和超细二氧化硅粒子与氟树脂的质量比的涂料组合物颗粒为70:30至95:5。根据本发明的涂料组合物，提供一种涂膜，其可以容易地涂覆各种物品的表面而不损害色调和质地，并且具有优异的防油性能和耐久性。

7. 发明授权

EP2112207B1 COATING COMPOSITION, COATING METHOD, HEAT EXCHANGER AND AIR CONDITIONER 有权
标题翻译：涂料组合物，涂覆法，热交换空调
公开(公告)号：EP2112207B1
公开(公告)日：2012-09-12
申请号：EP08702953.4
申请日：2008-01-08
申请人： Mitsubishi Electric Corporation
发明人： YOSHIDA, Yasuhiro , YAMAMOTO, Yoshinori , KUMADA, Teruhiko , MORIOKA, Reiji , YOSHIKAWA, Toshiaki , TANIKAWA, Yoshinori , TAKAGI, Tsukasa , NAKAGAWA, Hidetomo
IPC分类号： C09D127/18 , B05D5/00 , B05D7/24 , C09D5/16 , C09D7/12 , F28F13/18
CPC分类号： F28F19/04 , B05D3/042 , C09D1/00 , C09D5/1637 , C09D127/18 , F24F1/0059

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