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    • 5. 发明公开
    • Cold cathode forming process and electron emission element, and applied device of the same
    • 冷阴极的制造方法和电子设备中的发光元件和使用该元件的
    • EP1209716A2
    • 2002-05-29
    • EP01127581.5
    • 2001-11-19
    • MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    • Yamada, YukaYoshida, TakehitoSuzuki, NobuyasuMakino, ToshiharuHori, Yoshikazu
    • H01J9/02
    • H01J9/025
    • The object of the present invention is to form the fine structure on a cathode surface homogeneously and reproducibly to realize the increased emission current value and stability with a simple process in the electron emission element forming process. An electron emission part of an electron emission element that is a crystalline thin film of electron emissive material formed in self-aligning fashion by means of a laser ablation process, in which a laser beam is irradiated onto a target material and the material ejected and emitted from the target material is deposited to form a thin film on a substrate facing to the target, is used as the thin film electron source. The above-mentioned structure is effective to realize the low electron emission threshold value and the increased emission current value and stability, and realize the reduced cost with the structure that is simpler than the conventional structure.
    • 本发明的目的是,以在阴极表面上的精细结构均匀且可重复地实现增加的发射电流值和稳定性与在电子发射元件形成工艺的简单方法。 的电子发射元件的电子发射部分所做的是通过激光烧蚀工艺,其中将激光束照射到靶材料和喷射的材料和所发射的手段在自对准的方式形成的电子发射材料的结晶薄膜 从靶材料被沉积以形成在面对给靶的基片的薄膜,被用作薄膜电子源。 上述结构是有效实现低电子发射阈值和增加的发射电流值和稳定性,并实现与结构中的降低的成本所做的是比传统的结构更简单。