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    • 1. 发明公开
    • METHOD AND APPARATUS FOR MANUFACTURING MONOCRYSTALLINE SILICON
    • EP3951023A1
    • 2022-02-09
    • EP20193393.4
    • 2020-08-28
    • Zhejiang Jinko Solar Co., Ltd.JINKO SOLAR CO., LTD
    • YANG, JunSHANG, WeizeBAI, Xiaolong
    • C30B15/14C30B15/20C30B29/06
    • A method for manufacturing a monocrystalline silicon with a Czochralski process, including: providing a polycrystalline silicon and a dopant to a quartz crucible; placing the quartz crucible in a single crystal furnace and vacuumizing the furnace, and melting the polycrystalline silicon under an atmosphere of a protective gas to obtain silicon melt; after a temperature of the silicon melt is stable, immersing a seed crystal into the silicon melt to start a seeding process, during the seeding process, lifting a water-cooling heat shield in a direction away from a surface of the silicon melt to adjust a distance between a bottom of the water-cooling heat shield and the surface of the silicon melt to a first preset distance; after the seeding process is completed, performing a shouldering process to continuously pull the crystal, and gradually increase a diameter of the pulled crystal to a preset width; starting a constant-diameter body growth process, lowering the water-cooling heat shield in a direction towards the surface of the silicon melt to adjust the distance between the bottom of the water-cooling heat shield and the surface of the silicon melt to a second preset distance; after the constant-diameter body growth process is completed, entering a tailing stage during which the diameter of the pulled crystal is gradually reduced until the pulled crystal is separated from the silicon melt; and cooling the pulled crystal to room temperature and taking out the cooled crystal from the single crystal furnace as the monocrystalline silicon. With the method and apparatus for manufacturing a monocrystalline silicon, the longitudinal temperature gradient of the monocrystalline silicon crystal and the growth speed of the monocrystalline silicon can be increased.