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1. 发明授权

EP0365318B1 Radiation-sensitive resin composition 失效
标题翻译：辐射敏感性树脂组合物。
公开(公告)号：EP0365318B1
公开(公告)日：1994-03-16
申请号：EP89310735.9
申请日：1989-10-18
申请人： JAPAN SYNTHETIC RUBBER CO., LTD.
发明人： Miyashita, Satoshi , Yamanouchi, Akihiro , Nozue, Ikuo , Miura, Takao
IPC分类号： G03F7/023
CPC分类号： C08G8/08 , G03F7/0236

2. 发明公开

EP0365318A3 Radiation-sensitive resin composition 失效
标题翻译：辐射敏感性树脂组合物
公开(公告)号：EP0365318A3
公开(公告)日：1990-11-14
申请号：EP89310735.9
申请日：1989-10-18
申请人： JAPAN SYNTHETIC RUBBER CO., LTD.
发明人： Miyashita, Satoshi , Yamanouchi, Akihiro , Nozue, Ikuo , Miura, Takao
IPC分类号： G03F7/023
CPC分类号： C08G8/08 , G03F7/0236
摘要： A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of:
95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′):
wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I′) with at least one aldehyde] and
5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II):
wherein n is 0, 1, 2 or 3, with at least one aldehyde].
In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.

3. 发明公开

EP0365318A2 Radiation-sensitive resin composition 失效
标题翻译： Strahlungsempfindliche Harzzusammensetzungen。
公开(公告)号：EP0365318A2
公开(公告)日：1990-04-25
申请号：EP89310735.9
申请日：1989-10-18
申请人： JAPAN SYNTHETIC RUBBER CO., LTD.
发明人： Miyashita, Satoshi , Yamanouchi, Akihiro , Nozue, Ikuo , Miura, Takao
IPC分类号： G03F7/023
CPC分类号： C08G8/08 , G03F7/0236
摘要： A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of:
95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′):
wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I′) with at least one aldehyde] and
5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II):
wherein n is 0, 1, 2 or 3, with at least one aldehyde].
In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.
摘要翻译：一种包含碱溶性酚醛清漆树脂和1,2-醌二叠氮化合物的辐射敏感性树脂组合物，其中碱溶性酚醛清漆树脂包括：95-50重量份具有标准聚苯乙烯缩小重量的树脂A - 平均分子量为4,000-20,000 [树脂A为选自由间甲酚和至少一种由结构式（I）表示的苯酚或（Imin）表示的苯酚获得的树脂中的至少一种树脂：其中m为2或3，与至少一种醛和通过间甲酚，对甲酚和至少一种由上述结构式（I）或（I min）表示的苯酚缩聚而得到的树脂与至少一种醛]和5-50重量份具有标准聚苯乙烯换算的重均分子量为200-2,000的树脂B [树脂B是通过至少一种由结构式（II）表示的苯酚缩聚得到的树脂）：其中n为0,1,2或3， h至少一种醛]。在树脂组合物中，树脂A和树脂B的混合物可以进一步含有作为树脂B与1,2-醌二叠氮磺酸的酯的树脂C. 辐射敏感性树脂组合物适合用作具有高灵敏度，优异显影性，高分辨率和优异耐热性的正型抗蚀剂。

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