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1. 发明授权

EP0422570B1 Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions 失效
标题翻译： UV光敏感的光引发剂组合物，它们的使用和辐射敏感组合物
公开(公告)号：EP0422570B1
公开(公告)日：1995-12-27
申请号：EP90119287.2
申请日：1990-10-08
申请人： International Business Machines Corporation
发明人： Babich, Edward Darko , Gelorme, Jeffrey Donald , Hatzakis, Michael , Shaw, Jane Margaret , Stewart, Kevin Jay , Witman, David Frank
IPC分类号： G03F7/027 , G03F7/029 , G03F7/075
CPC分类号： G03F7/0755 , G03F7/027 , G03F7/029 , G03F7/0757 , Y10S430/127 , Y10S502/522

2. 发明公开

EP0567772A1 Method for producing metal powder with a uniform distribution of dispersants, method of uses thereof and structures fabricated therewith 失效
标题翻译：一种用于生产金属粉末的与分散的均匀分布，由其机构提出用于其使用方法和产品的过程。
公开(公告)号：EP0567772A1
公开(公告)日：1993-11-03
申请号：EP93104770.8
申请日：1993-03-23
申请人： International Business Machines Corporation
发明人： Kang, Sung Kwon , Purushothaman, Sampath , Ritsko, John James , Shaw, Jane Margaret , Shinde, Subhash Laxman
IPC分类号： B22F9/04
CPC分类号： H05K1/092 , B22F9/04 , B22F2009/043 , B22F2999/00 , C22C1/1084 , B22F1/0003
摘要： Methods of fabricating powders of metal particles containing grain growth control additives are described. A powder, metal particle, e.g., copper particles, are mixed with a powder of additive particles, e.g., alumina particles. The mixture is milled in a high energy ball mill to provide metal particles having substantially uniformly distributed therein additive particles. The ball milled powder contains elongated high aspect ratio particles. The high aspect ratio particles are reduced in size by jet impact milling. The jet impact milled powder can be used to form a conductor forming paste in the fabrication of a metallized ceramic substrate for semiconductor chip packaging application. The jet impact milled powder has particles sufficiently small in size to fill vias between metallization layers in the green ceramic precursor to the ceramic substrate. During sintering of the combination of ceramic precursor and conductor forming paste, the grain growth control additive results in a substantially void free via filled with metal having a fine grain morphology.
摘要翻译：制造包含晶粒生长抑制剂的金属粒子的粉末的方法进行说明。的粉末，金属粒子，E. G.，铜颗粒与添加剂颗粒，E. G.，氧化铝颗粒的粉末混合。将混合物在高能球磨机粉碎以提供具有基本上均匀地分布在其中的添加剂颗粒的金属颗粒。球磨粉末含有细长的高纵横比的粒子。高纵横比的颗粒是通过喷射冲击研磨尺寸减小。射流冲击研磨的粉末可用于形成导体在用于半导体芯片封装的应用程序的金属化陶瓷基片的制造中形成膏。射流冲击研磨粉末具有颗粒尺寸小到足以填充金属化层之间的通孔中的生坯陶瓷前体陶瓷基片。在陶瓷前体和导体形成用膏的组合的烧结，在基本上无空隙的晶粒生长控制添加剂的结果经由填充有具有细晶粒形态的金属。

3. 发明授权

EP0198215B1 A process for rendering a polymeric material resistant to an oxygen-containing plasma 失效
标题翻译：提炼含有含氧等离子体的聚合材料的方法
公开(公告)号：EP0198215B1
公开(公告)日：1991-05-29
申请号：EP86103208.4
申请日：1986-03-11
申请人： International Business Machines Corporation
发明人： Babich, Edward Darko , Hatzakis, Michael , Jacobs, Scott Laurence , Parasczcak, Juri Rostyslav , Shaw, Jane Margaret , Witman, David Frank
IPC分类号： G03F7/38 , G03F7/075
CPC分类号： G03F7/038 , G03F7/265

4. 发明公开

EP0422570A2 Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions 失效
标题翻译： UV-Lichtempfindliche Fotoinitiatorzusammensetzungen，ihre Verwendung und strahlungsempfindliche Zusammensetzungen。
公开(公告)号：EP0422570A2
公开(公告)日：1991-04-17
申请号：EP90119287.2
申请日：1990-10-08
申请人： International Business Machines Corporation
发明人： Babich, Edward Darko , Gelorme, Jeffrey Donald , Hatzakis, Michael , Shaw, Jane Margaret , Stewart, Kevin Jay , Witman, David Frank
IPC分类号： G03F7/027 , G03F7/029 , G03F7/075
CPC分类号： G03F7/0755 , G03F7/027 , G03F7/029 , G03F7/0757 , Y10S430/127 , Y10S502/522
摘要： An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula:
wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being H or
wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl,
wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.
摘要翻译：一种紫外光敏感性光引发剂组合物，其包含至少一种由下式表示的蒽衍生物：其中X为CH = CH 2或 - （ - CH 2））n O - （ - R），其中R为H或，其中每个R 1，R II和R III各自独立地选自烷基，烯基，芳基，CHEM> CHEM，其中每个R IV，R V和R VI均为单独选自烷基，烯基和芳基; 其中m为0〜4的整数，p为0〜4的整数。 n为1〜2; 和盐; 和有机溶剂。该组合物用于阳离子可聚合材料的阳离子聚合，包括形成光致抗蚀剂图案。还提供了一些对包括电子束辐射在内的辐射敏感的新型环氧官能化有机硅，并表现出对氧反应离子蚀刻的抗性。

5. 发明公开

EP0393348A2 Negative photoresist and use thereof 失效
标题翻译： Negativ-Photoresist和Seine Anwendung。
公开(公告)号：EP0393348A2
公开(公告)日：1990-10-24
申请号：EP90104693.8
申请日：1990-03-13
申请人： International Business Machines Corporation
发明人： Hatzakis, Michael , Shaw, Jane Margaret , Stewart, Kevin Jay
IPC分类号： G03F7/038 , G03F7/075
CPC分类号： G03F7/0758
摘要： A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.
摘要翻译：含有通过将环氧酚醛清漆聚合物与有机硅化合物，辐射敏感的盐和近紫外线相互作用而得到的聚合物的组合物。敏化剂。

6. 发明公开

EP0147127A2 A composition of matter of use as a resist in lithography 失效
标题翻译：组成的平版抗拒。
公开(公告)号：EP0147127A2
公开(公告)日：1985-07-03
申请号：EP84308616.6
申请日：1984-12-11
申请人： International Business Machines Corporation
发明人： Babich, Edward Darko , Hatzakis, Michael , Paraszcak, Jurij Rostyslav , Shaw, Jane Margaret
IPC分类号： G03F7/075 , G03F7/022
CPC分类号： G03F7/0757 , G03F7/023 , G03F7/0754
摘要： A composition of matter is obtained by interreacting a quinone diazo compound and an organosilicon compound. Such a composition can be used as a resist in a lithographic process.

7. 发明公开

EP0667732A1 System for applying microwave energy in processing sheet like materials 失效
标题翻译： Vorrichtung zur Einkopplung von Mikrowellenenergiewährendder Bearbeitung vonbahnförmigen材料。
公开(公告)号：EP0667732A1
公开(公告)日：1995-08-16
申请号：EP94120273.1
申请日：1994-12-21
申请人： International Business Machines Corporation
发明人： Hedrick, Jeffrey Curtis , Lewis, David Andrew , Shaw, Jane Margaret , Viehbeck, Alfred , Whitehair, Stanley Joseph
IPC分类号： H05B6/78
CPC分类号： H05B6/788
摘要： A microwave processing system is provided wherein the material to be processed is in the form of a web type quantity configuration with a thickness that is small in relation to the wavelength of a particular microwave frequency. The material is passed through the field associated with a plurality of microwave standing waves of the particular frequency, each adjacent standing wave being offset 1/4 wavelength along the direction of movement of the web. A carrier gas removes volatile solvents from the material surfaces. Control is provided for the interrelationship of temperature, rate of movement, flow of carrier gas, and microwave power.
摘要翻译：提供了一种微波处理系统，其中待处理的材料是相对于特定微波频率的波长具有较小厚度的腹板类型数量构型的形式。材料通过与特定频率的多个微波驻波相关联的场，每个相邻驻波沿着幅材的移动方向偏移1/4波长。载气从材料表面除去挥发性溶剂。提供温度，运动速率，载气流量和微波功率的相互关系的控制。

8. 发明公开

EP0605814A1 Diamond-like carbon films from a hydrocarbon helium plasma 失效
标题翻译： DiamantähnlicheKohlenstoffilme hergestellt aus einem Kohlenwasserstoff-Helium-Plasma。
公开(公告)号：EP0605814A1
公开(公告)日：1994-07-13
申请号：EP93120065.3
申请日：1993-12-13
申请人： International Business Machines Corporation
发明人： Bailey, Frederic Denis , Buchanan, Douglas Andrew , Callegari, Alessandro Cesare , Clearfield, Howard Marc , Doany, Fuad Elias , Flagello, Donis George , Hovel, Harold John , Latulipe, Douglas Charles, Jr. , Lustig, Naftali Eliahu , Pomerene, Andrew Thomas Stewart , Purushothaman, Sampath , Scherpereel, Christopher Michael , Seeger, David Earle , Shaw, Jane Margaret
IPC分类号： C23C16/26 , G02B1/10
CPC分类号： C23C16/26 , G02B1/105 , G02B1/111 , G02B1/14 , G11B5/255 , Y10S427/104 , Y10S427/106 , Y10T428/30
摘要： The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond-like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
摘要翻译：本发明涉及通过来自烃/氦等离子体的低温等离子体增强化学气相沉积（PECVD）将金刚石状碳膜沉积到衬底上的改进方法。更具体地说，本发明的类金刚石碳膜通过采用以氦作为等离子体气体大量稀释的乙炔沉积在基板上。使用本发明的方法形成的膜的特征在于是无定形的并且具有与通常观察到的金刚石膜相当的介电强度。然而，更重要的是，本文制造的膜是热稳定的，光学透明的，在紫外范围内是吸收性的并且是硬的，从而使得它们对于各种各样的应用是非常需要的。

9. 发明公开

EP0393348A3 Negative photoresist and use thereof 失效
标题翻译：负离子光刻胶及其用途
公开(公告)号：EP0393348A3
公开(公告)日：1991-09-04
申请号：EP90104693.8
申请日：1990-03-13
申请人： International Business Machines Corporation
发明人： Hatzakis, Michael , Shaw, Jane Margaret , Stewart, Kevin Jay
IPC分类号： G03F7/038 , G03F7/075
CPC分类号： G03F7/0758
摘要： A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.

10. 发明授权

EP0147127B1 A composition of matter of use as a resist in lithography 失效
标题翻译：作为研究中使用的物质的组成
公开(公告)号：EP0147127B1
公开(公告)日：1991-03-13
申请号：EP84308616.6
申请日：1984-12-11
申请人： International Business Machines Corporation
发明人： Babich, Edward Darko , Hatzakis, Michael , Paraszcak, Jurij Rostyslav , Shaw, Jane Margaret
IPC分类号： G03F7/075 , G03F7/022
CPC分类号： G03F7/0757 , G03F7/023 , G03F7/0754

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