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    • 3. 发明公开
    • Process for producing liquid crystal optical device
    • Verfahren zur Herstellung einer optischenFlüssigkristall-Vorrichtung。
    • EP0336321A2
    • 1989-10-11
    • EP89105729.1
    • 1989-03-31
    • IDEMITSU KOSAN COMPANY LIMITED
    • Hashimoto, KenjiYuasa, Kimihiro
    • G02F1/133C09K19/38
    • C09K19/38B29C55/00B29K2105/0079C09K19/3857C09K19/388C09K19/408G02F1/133305G02F1/133365G02F1/133784G02F1/1341G02F1/141G02F2001/13415Y10S359/90
    • A process for producing a liquid crystal optical device comprising a ferroelectric liquid-crystalline polymer and two flexible substrates sandwiching the ferroelectric liquid-crystalline polymer between them, which process comprises the following continuously conducted stages of:
      the first stage including a step of forming an oriented layer on each of the two flexible substrates; the second stage including a step of forming a liquid-crystalline polymer layer on the oriented layer of at least one of the two flexible substrates; the third stage including a step of laminating the flexible substrate obtained in the first stage and the flexible substrate obtained in the second stage, or laminating two flexible substrates obtained in the second stage, with the one or two liquid-crystalline polymer layers sandwiched facing each other between the oriented layers carried on the flexible substrates; and the fourth stage including a step of heating the laminate obtained in the third stage to a temperature at which the ferroelectric liquid-crystalline polymer shows isotropic phase, and a step of orienting the ferroelectric liquid-­crystalline polymer by applying an orientation treatment to the laminate heated in the heating step.
    • 一种制造液晶光学器件的方法,包括铁电液晶聚合物和在其间夹有铁电液晶聚合物的两个柔性基底,该方法包括以下连续进行的阶段:第一阶段包括形成定向 在两个柔性基板的每一个上; 第二阶段包括在两个柔性基板中的至少一个的取向层上形成液晶聚合物层的步骤; 第三阶段包括层叠第一阶段获得的柔性基板和在第二阶段中获得的柔性基板的步骤,或者将在第二阶段中获得的两个柔性基板层压在一个或两个液晶聚合物层面向每个 在柔性基板上承载的定向层之间的另一个; 第四阶段包括将第三阶段获得的叠层体加热至铁电液晶聚合物显示各向同性相的温度的步骤,以及通过对层压体进行取向处理来定向铁电液晶聚合物的步骤 在加热步骤中加热。
    • 7. 发明公开
    • Method of forming electrode pattern
    • 赫尔斯特朗·赫斯特伦
    • EP0476856A1
    • 1992-03-25
    • EP91307816.8
    • 1991-08-27
    • IDEMITSU KOSAN COMPANY LIMITED
    • Yuasa, KimihiroHashimoto, Kenji
    • G02F1/1343H01L21/28C23F1/00H05K3/00
    • H05K3/08B23H9/06C23F1/18G02F1/13439H01L31/1884H05K2201/0326H05K2203/0121Y02E10/50
    • A method of forming an electrode pattern in a conductive film covering a surface of a substrate, comprising
         making a metal electrode for etching contact the conductive film at an area on an exposed surface of the conductive film; and
         moving the area where the metal electrode for etching contacts the conductive film while a voltage is applied between the metal electrode for etching and the conductive film to remove the conductive film at and in the vicinity of the area where the metal electrode for etching contacts the conductive film and form an electrode pattern in the conductive film;
         reduces the number of steps in forming an electrode pattern, and the method does not require complicated and expensive apparatuses and enables easy production of fine electrode patterns of large areas.
    • 一种在覆盖基板的表面的导电膜中形成电极图案的方法,包括在所述导电膜的暴露表面上的区域上形成用于蚀刻与所述导电膜接触的金属电极; 并且在用于蚀刻的金属电极与导电膜之间施加电压的同时移动用于蚀刻的金属电极与导电膜接触的区域,以去除蚀刻金属电极与蚀刻金属电极接触的区域附近的导电膜 导电膜,并在导电膜中形成电极图案; 减少形成电极图案的步骤数,并且该方法不需要复杂且昂贵的设备,并且能够容易地制造大面积的精细电极图案。