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1. 发明公开

EP2088508A2 Storage subsystem and control method thereof 有权
标题翻译：说话者系统和动物园Steuerverfahren
公开(公告)号：EP2088508A2
公开(公告)日：2009-08-12
申请号：EP08253957.8
申请日：2008-12-10
申请人： Hitachi Ltd.
发明人： Inoue, Tetsuya , Suzuki, Hiroshi , Koga, Tsutomu
IPC分类号： G06F11/20
CPC分类号： G06F11/201 , G06F11/2089
摘要： Provided is a storage subsystem capable of inhibiting the deterioration in system performance to a minimum while improving reliability and availability. This storage subsystem includes a first controller for controlling multiple drive units connected via multiple first switch devices, and a second controller for controlling the multiple drive units connected via multiple second switch devices associated with the multiple first switch devices. This storage subsystem also includes a connection path that mutually connects the multiple first switch devices and the corresponding multiple second switch devices. When the storage [sub]system detects the occurrence of a failure, it identifies the fault site in the connection path, and changes the connection configuration of the switch device so as to circumvent the fault site.
摘要翻译：提供了一种能够在提高可靠性和可用性的同时将系统性能的恶化最小化的存储子系统。该存储子系统包括用于控制经由多个第一开关装置连接的多个驱动单元的第一控制器，以及用于控制通过与多个第一开关装置相关联的多个第二开关装置连接的多个驱动单元的第二控制器。该存储子系统还包括连接多个第一交换设备和相应的多个第二交换设备的连接路径。当存储[sub]系统检测到故障发生时，它识别连接路径中的故障现场，并更改交换设备的连接配置，以规避故障现场。

2. 发明公开

EP0669538A3 Method of measuring magnetic field and charged particle beam apparatus using the same method 失效
标题翻译：一种用于测量磁场和带电粒子线装置与使用该方法的方法。
公开(公告)号：EP0669538A3
公开(公告)日：1996-12-11
申请号：EP95301077.4
申请日：1995-02-21
申请人： HITACHI, LTD.
发明人： Suzuki, Hiroshi , Shinada, Hiroyuki , Kuroda, Katsuhiro , Yajima, Yusuke , Takahashi, Yoshio , Nakajima, Masato , Saito, Hideo
IPC分类号： G01R33/02
CPC分类号： G01R33/0213 , H01J37/28 , H01J2237/221 , H01J2237/24564
摘要： A charged particle beam (12a, 12b) is transmitted through a specimen (14) for producing an irregular pattern as a first image. Further, a magnetic field to be measured (16) is arranged in space where a charged particle beam is passed between the specimen and an image plane thereby to produce a second image having an irregular pattern as in the foregoing case. The first image and the second image are processed to produce the deflection angle of the charged particle beam due to the magnetic field. This deflection angle is extracted from the entire positions of a cross section of the space where measurement is desired, thereby constructing projection data of a magnetic field by a charged particle beam. Furthermore, the magnetic field to be measured is rotated and the above-mentioned processing is performed from each direction to construct projection data. The projection data thus obtained and the computer tomography technique are used to determine a magnetic field at each point in space.

3. 发明授权

EP0236022B1 Lubricating composition for plastic working and articles worked by using the same 失效
标题翻译：用于塑料加工和加工产品的润滑剂组合物。
公开(公告)号：EP0236022B1
公开(公告)日：1994-02-09
申请号：EP87301471.6
申请日：1987-02-20
申请人： HITACHI, LTD.
发明人： Uematsu, Takao , Suzuki, Hiroshi , Komatsuzaki, Shigeki , Nakano, Fumio , Narahara, Toshikazu
IPC分类号： C10M133/20 , C10M149/20 , C10M141/10 , C10M161/00
CPC分类号： C10M141/10 , C10M125/24 , C10M131/14 , C10M133/20 , C10M135/00 , C10M137/00 , C10M149/20 , C10M161/00 , C10M2201/085 , C10M2205/00 , C10M2205/026 , C10M2207/281 , C10M2207/282 , C10M2207/283 , C10M2207/286 , C10M2209/00 , C10M2209/02 , C10M2209/084 , C10M2209/10 , C10M2211/08 , C10M2215/102 , C10M2217/042 , C10M2217/043 , C10M2217/044 , C10M2217/045 , C10M2219/00 , C10M2219/022 , C10M2219/024 , C10M2219/082 , C10M2221/043 , C10M2223/00 , C10M2223/04 , C10M2223/041 , C10M2223/042 , C10M2229/051 , C10N2240/402 , C10N2240/403 , C10N2240/404 , C10N2240/405 , C10N2240/406 , C10N2240/407 , C10N2240/408 , C10N2240/409
摘要： A lubricating oil for plastic working contains a powder of a compound having a urea bond incorporated therein. The lubricating oil forms a thick lubricating coating having excellent thermal resistance and loading resistance on the frictional surface during working by simply applying it on the surface of a material or a mold and, therefore, effectively prevents occurrence of seizing, even in the production of moldings having a high degree of working or complex shapes. The plastic worked product has a coating of the lubricating oil on its surface which provides an excellent anticorrosive effect for steel stocks. The oil may also contain at least one extreme-pressure additive selected from: (1) condensed phosphoric acid, (2) phosphite and phosphate esters, (3) organic sulfur compounds, and (4) organic chlorine compounds. t

4. 发明授权

EP0032745B1 Ether imides and process for producing the same 失效
标题翻译：其它制造方法及其制造方法
公开(公告)号：EP0032745B1
公开(公告)日：1987-01-07
申请号：EP81100372.2
申请日：1981-01-19
申请人： Hitachi, Ltd.
发明人： Nishikawa, Akio , Shitara, Masashi , Era, Susumu , Fukushima, Toshiaki , Suzuki, Hiroshi , Kohkame, Hisashi
IPC分类号： C07D207/452 , C07D207/456 , C07D209/48 , C07D209/76 , C08L67/00
CPC分类号： C07D207/452 , C07D207/456 , C07D209/48 , C07D209/76 , C08G59/4042 , C08K5/16 , C08K5/3412 , C08K5/3415 , C08L67/06

5. 发明公开

EP0066298A3 SF6 gas insulating electric apparatus and process for producing the same 失效
标题翻译： SF6气体绝缘电气设备及其制造方法
公开(公告)号：EP0066298A3
公开(公告)日：1985-05-15
申请号：EP82104836
申请日：1982-06-02
申请人： Hitachi, Ltd.
发明人： Yamaguchi, Motoo , Sone, Isamu , Hirasawa, Kunio , Yoshioka, Yoshio , Nishikawa, Akio , Suzuki, Hiroshi , Sato, Mikio , Hosokawa, Masao
IPC分类号： H01H33/02
CPC分类号： H01H33/021
摘要： A SF 6 gas insulating electric apparatus usable as a circuit breaker, etc., containing a SF 6 gas insulator and a resin insulator, both of which insulators are present in an atmosphere to be exposed to arcs, characterized by making at least the surface portion to be exposed to arcs of the resin insulator from a polymer containing nitrogen atoms or a polyolefin resin. and if necessary together with an inorganic filler powder, is excellent in both surface and inner arc resistance and can maintain breaking performance for a long period of time.

6. 发明公开

EP0032745A3 Ether imides and process for producing the same 失效
标题翻译：其它的制造方法及其制造方法
公开(公告)号：EP0032745A3
公开(公告)日：1983-11-09
申请号：EP81100372
申请日：1981-01-19
申请人： Hitachi, Ltd.
发明人： Nishikawa, Akio , Shitara, Masashi , Era, Susumu , Fukushima, Toshiaki , Suzuki, Hiroshi , Kohkame, Hisashi
IPC分类号： C07D207/452 , C07D207/456 , C07D209/48 , C07D209/76 , C08L67/00
CPC分类号： C07D207/452 , C07D207/456 , C07D209/48 , C07D209/76 , C08G59/4042 , C08K5/16 , C08K5/3412 , C08K5/3415 , C08L67/06
摘要： An ether imide of the formula:
wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and D are as defined in the specification produced by reacting a diamine with an ethylenically unsaturated dicarboxylic acid can give a composition together with one or more unsaturated polyesters, epoxy compounds, amines, and the like to give shaped ar- ticies excellent in flexibility and heat resistance.

7. 发明公开

EP0028419A3 Imides and process for producing the same 失效
标题翻译：其制造方法及其制造方法
公开(公告)号：EP0028419A3
公开(公告)日：1981-05-27
申请号：EP80106787
申请日：1980-11-04
申请人： Hitachi, Ltd.
发明人： Nishikawa, Akio , Suzuki, Hiroshi , Kohkame, Hisashi
IPC分类号： C08G73/12 , C08L79/08
CPC分类号： C08G73/12
摘要： An imide having the structural units of the formulae (I) and (II), or (I), (II) and (IV),
is soluble excellently in a low-boiling solvent and can give alone or together with one or more amides, epoxy compounds, unsaturated polyesters, diallyl phthalates, or the like, heat resistant polymers. The imide can be produced by, e.g., reacting tetrahydrophthalic anhydride with aniline resin with or without followed by dehydration and ring closure, reacting the resulting reaction product with an ethylenically unsaturated carboxylic acid anhydride such as maleic anhydride, followed by dehydration and ring closure.
摘要翻译：具有式（I）和（II）或（I），（II）和（IV）的结构单元的酰亚胺，可在低沸点溶剂中优异地溶解，并且可以单独或与一种或多种酰胺，环氧化合物，不饱和聚酯，邻苯二甲酸二烯丙酯等，耐热聚合物。酰亚胺可以通过例如使四氢邻苯二甲酸酐与苯胺树脂反应，然后进行脱水和闭环，然后使所得反应产物与烯键式不饱和羧酸酐如马来酸酐反应，随后脱水和闭环。

8. 发明公开

EP0028419A2 Imides and process for producing the same 失效
标题翻译： Imide und Verfahren zu ihrer Herstellung。
公开(公告)号：EP0028419A2
公开(公告)日：1981-05-13
申请号：EP80106787.7
申请日：1980-11-04
申请人： Hitachi, Ltd.
发明人： Nishikawa, Akio , Suzuki, Hiroshi , Kohkame, Hisashi
IPC分类号： C08G73/12 , C08L79/08
CPC分类号： C08G73/12
摘要： An imide having the structural units of the formulae (I) and (II), or (I), (II) and (IV),

is soluble excellently in a low-boiling solvent and can give alone or together with one or more amides, epoxy compounds, unsaturated polyesters, diallyl phthalates, or the like, heat resistant polymers. The imide can be produced by, e.g., reacting tetrahydrophthalic anhydride with aniline resin with or without followed by dehydration and ring closure, reacting the resulting reaction product with an ethylenically unsaturated carboxylic acid anhydride such as maleic anhydride, followed by dehydration and ring closure.
摘要翻译：具有式（I）和（II）或（I），（II）和（IV）的结构单元的酰亚胺，可在低沸点溶剂中优异地溶解，并且可以单独或与一种或多种酰胺，环氧化合物，不饱和聚酯，邻苯二甲酸二烯丙酯等，耐热聚合物。酰亚胺可以通过例如使四氢邻苯二甲酸酐与苯胺树脂反应，然后进行脱水和闭环，然后使所得反应产物与烯键式不饱和羧酸酐如马来酸酐反应，随后脱水和闭环。

9. 发明公开

EP2549539A1 Semiconductor device and electric power conversion system using the same 审中-公开
标题翻译：半导体器件和使用其的电力转换系统
公开(公告)号：EP2549539A1
公开(公告)日：2013-01-23
申请号：EP12177308.9
申请日：2012-07-20
申请人： Hitachi Ltd.
发明人： Watanabe, So , Shiraishi, Masaki , Suzuki, Hiroshi , Mori, Mutsuhiro
IPC分类号： H01L29/739 , H01L29/66 , H01L29/06
CPC分类号： H01L29/7397 , H01L29/0696 , H01L29/407 , H01L29/66348
摘要： A semiconductor device includes: a first semiconductor layer (100) of a first conductivity type; a second semiconductor layer (113) of a second conductivity type on the first semiconductor layer (100); trenches (103) in the first semiconductor layer (100); a semiconductor protruding part (104) on the first semiconductor layer (100); a third semiconductor layer (101) on the semiconductor protruding part (104); a fourth semiconductor layer (102) on the third semiconductor layer (101); a gate insulating layer (105) disposed along the trench (103); a first interlayer insulating layer (107) disposed along the trench (103); a first conductive layer (106) facing to the fourth semiconductor layer (102); a second conductive layer (108) on the first interlayer insulating layer (107) ; a second interlayer insulating layer (109) covering the second conductive layer (108); a third conductive layer (111) on the third semiconductor layer (101) and fourth semiconductor layer (102); a contacting part (110) connecting the third conductive layer (111) and third semiconductor layer (101); and a fourth conductive layer (114) formed on the second semiconductor layer (113).
摘要翻译：一种半导体器件包括：第一导电类型的第一半导体层（100）在第一半导体层（100）上的第二导电类型的第二半导体层（113）; 第一半导体层（100）中的沟槽（103）; 在第一半导体层（100）上的半导体凸出部分（104）; 在所述半导体凸出部分（104）上的第三半导体层（101）; 在第三半导体层（101）上的第四半导体层（102）; 沿着沟槽（103）设置的栅极绝缘层（105）; 沿着沟槽（103）设置的第一层间绝缘层（107）; 面向所述第四半导体层（102）的第一导电层（106）; 在第一层间绝缘层107上的第二导电层108; 覆盖第二导电层（108）的第二层间绝缘层（109）; 在第三半导体层（101）和第四半导体层（102）上的第三导电层（111）; 连接第三导电层（111）和第三半导体层（101）的接触部（110）; 和形成在第二半导体层（113）上的第四导电层（114）。

10. 发明授权

EP0669538B1 Method of measuring magnetic field and charged particle beam apparatus using the same method 失效
标题翻译：一种用于测量磁场和带电粒子线装置与使用该方法的方法
公开(公告)号：EP0669538B1
公开(公告)日：2004-08-11
申请号：EP95301077.4
申请日：1995-02-21
申请人： Hitachi, Ltd.
发明人： Suzuki, Hiroshi , Shinada, Hiroyuki , Kuroda, Katsuhiro , Yajima, Yusuke , Takahashi, Yoshio , Nakajima, Masato , Saito, Hideo
IPC分类号： G01R33/02
CPC分类号： G01R33/0213 , H01J37/28 , H01J2237/221 , H01J2237/24564

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