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    • 2. 发明公开
    • Physical vapor deposition process and apparatus therefor
    • Verfahren und Vorrichtung zur physikalischen Dampfabscheidung
    • EP1806424A1
    • 2007-07-11
    • EP06126830.6
    • 2006-12-21
    • General Electric Company
    • Marijnissen, Gillion HermanVergeldt, Eric Richard Irma CarolusRigney, Joseph DavidKloosterman, Annejan BernardDarolia, Ramgopal
    • C23C14/30
    • C23C14/30C23C14/16C23C14/243C23C14/246
    • A PVD process and apparatus (120) for depositing a coating (132) from multiple sources of materials with different vapor pressures. The process entails forming molten pools (114,115) of different first and second materials in a coating chamber (122) of the apparatus (120), supporting an article (130) within the chamber (122), and evaporating the molten pools (114,115) with an energy beam (126) to deposit a coating (132) on the article (130) with a controlled composition that contains at least a first metal and a relatively lesser amount of at least one reactive metal having a lower vapor pressure than the first metal. The first material contains at least the first metal, and the second material contains the reactive metal and at least a second metal. The second and reactive metals are combined to cause the second material to have a lower melting temperature and wider melting range than the reactive metal.
    • 一种用于从具有不同蒸汽压力的多种材料源沉积涂层(132)的PVD工艺和设备(120)。 该方法需要在装置(120)的涂覆室(122)中形成不同的第一和第二材料的熔池(114,115),从而在室(122)内支撑制品(130),并蒸发熔池(114,115) 具有能量束(126)以用受控组合物将涂层(132)沉积在所述制品(130)上,所述控制组合物包含至少第一金属和相对较少量的至少一种具有比所述第一金属更低的蒸气压的活性金属 金属。 第一材料至少包含第一金属,第二材料包含反应性金属和至少第二金属。 将第二和反应性金属组合以使第二材料具有比反应性金属更低的熔融温度和更宽的熔化范围。