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2. 发明公开

EP1445344A1 Physical vapor deposition apparatus and process 有权
标题翻译： PVD-Vorrichtung und Verfahren
公开(公告)号：EP1445344A1
公开(公告)日：2004-08-11
申请号：EP03250791.5
申请日：2003-02-07
申请人： GENERAL ELECTRIC COMPANY
发明人： Darolia, Ramgopal , Corderman, Reed Roeder , Rigney, Joseph David , Nardil, Richard Arthur, Jr. , Weimer, Michael James
IPC分类号： C23C14/24 , C23C14/28 , C23C14/30
CPC分类号： C23C14/28 , C23C14/246 , C23C14/30 , C23C14/548
摘要： A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110, 111) of different materials (110, 111). The process and apparatus (120) are particularly intended to deposit a beta-nickel aluminide coating (132) containing zirconium, hafnium, yttrium and/or cerium, whose vapor pressures are sufficiently lower than NiAl to require a different evaporation rate in order to achieve higher deposition rates and better control of the coating chemistry. The PVD process and apparatus (120) entail feeding at least two materials (110, 111) into a coating chamber (122) and melting the materials (110, 111) at different rates to form separate molten pools (114,115) thereof. Articles (130) to be coated are suspended within the coating chamber (122) and transported with a support apparatus (118) relative to the two molten pools (114, 115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110, 111 ).
摘要翻译：一种用于从不同材料（110,111）的多个源（110,111）沉积涂层（132）的PVD工艺和设备（120）。方法和装置（120）特别用于沉积含有锆，铪，钇和/或铈的β-镍铝化物涂层（132），其蒸汽压力充分低于NiAl以需要不同的蒸发速率，以实现更高的沉积速率和更好的控制涂层化学性能。 PVD工艺和设备（120）需要将至少两种材料（110,111）进料到涂覆室（122）中并以不同的速率熔化材料（110,111）以形成其分离的熔池（114,115）。待涂覆的制品（130）悬挂在涂覆室（122）内并且相对于两个熔池（114,115）用支撑装置（118）运输，以便以受控组合物沉积涂层（132）是第一和第二材料（110,111）的混合物。

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