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1. 发明公开

EP0969342A4 FLUID SUPPLY APPARATUS 有权
标题翻译： FLUIDZUFUHRVORRICHTUNG
公开(公告)号：EP0969342A4
公开(公告)日：2004-05-19
申请号：EP99900168
申请日：1999-01-11
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , MINAMI YUKIO , NISHINO KOUJI , KAWATA KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K31/06 , C01B5/00 , G05D7/06 , G05D11/13 , G05D21/00
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761
摘要： A fluid supply apparatus comprising a pressure flow controller for controlling the rate of flow of fluid, a fluid selector valve for opening/closing the fluid passage on the secondary side, and a fluid supply controller for controlling the operation of them, wherein the pressure flow controller is provided with an orifice (5), a control valve (1) provided on the upstream side of the orifice (5), a pressure sensor (3) provided between the control valve (1) and the orifice (5), and an operation controller (6) for outputting to a driver (2) of the control valve (1) a control signal (Qy) representing the difference between a rate-of-flow signal (Qc=KP1) generated by calculation based on the pressure (P1) measured by the pressure sensor (3) and a rate-of-flow command signal (Qs), and the pressure (P1) on the upstream side of the orifice (5) is adjusted by opening/closing the control valve (1) so as to regulate the rate of flow on the downstream side of the orifice (5).
摘要翻译： 1。一种流体供给装置，其特征在于，具有：控制流体的流量的压力流量控制器;开闭二次侧的流体通路的流体切换阀;以及控制它们的动作的流体供给控制器，（5），设置在节流孔（5）的上游侧的控制阀（1），设置在控制阀（1）和节流孔（5）之间的压力传感器（3），以及（6），用于向控制阀（1）的驱动器（2）输出表示通过基于压力的计算产生的流量信号（Qc = KP1）之间的差值的控制信号（Qy）（3）测量的压力（P1）和流量指令信号（Qs），并且通过打开/关闭控制阀（5）来调节节流孔（5）上游侧的压力（P1） 1）以调节孔口（5）下游侧的流量。

2. 发明公开

EP1126260A4 PRESSURE DETECTOR MOUNTING STRUCTURE 审中-公开
标题翻译：固定压力传感器的阶
公开(公告)号：EP1126260A4
公开(公告)日：2003-07-09
申请号：EP00949991
申请日：2000-08-03
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , HIROSE TAKASHI , IDETA EIJI , IKEDA NOBUKAZU , DOHI RYOUSUKE , NISHINO KOUJI , YOSHIKAWA KAZUHIRO , KAGATSUME SATOSHI , HIROSE JUN , FUKASAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI
IPC分类号： G01L9/04 , G01L9/00 , G01L19/00 , G01L19/04 , G01L19/06 , G01L19/14 , G01L7/08
CPC分类号： G01L19/0023 , G01L19/0645 , G01L19/145 , G01L19/147
摘要： A pressure detector mounting structure capable of preventing a diaphragm from being deformed by a stress acting on a diaphragm type pressure detector and output characteristics and temperature characteristics from being varied when the pressure detector is incorporated in a fixture provided in a piping or equipment, wherein the pressure detector formed by fixedly combining a diaphragm base having a diaphragm with a sensor base incorporating a sensor element operating according to the displacement of the diaphragm is inserted into an inserting hole through a gasket and pressed air-tight fixedly from the upper side using a pressing member, the pressing member and the gasket are brought into contact with the upper and lower surfaces of a main body of the diaphragm base, respectively, and a shallow groove is formed in ring-shape in the lower surface of the main body on the inner side of a part in contact with the gasket so as to off set a deformation produced by a pressing force from the pressing member through the shallow groove.

3. 发明公开

EP1001326A4 GAS SUPPLY EQUIPMENT WITH PRESSURE TYPE FLOW RATE CONTROL DEVICE 有权
标题翻译：有压敏流动调节装置气体供给机构
公开(公告)号：EP1001326A4
公开(公告)日：2004-11-17
申请号：EP99922553
申请日：1999-05-27
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , IKEDA NOBUKAZU , NISHINO KOUJI , YOSHIKAWA KAZUHIRO , IDETA EIJI , DOHI RYOUSUKE , UNO TOMIO , YAMAJI MICHIO
IPC分类号： F17D1/00 , G05D7/06 , G05D16/20
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761
摘要： A gas supply equipment comprising a gas control valve (2), an orifice accommodating valve (9) provided downstream of the control valve (2), a pressure detector (3) provided between the control valve (2) and the orifice accommodating valve (9), an orifice (5) provided downstream of the valve mechanism of the orifice accommodating (9) and an arithmetic and control unit which calculates a flow rate as Qc = KP1 (K; constant) from a detected pressure P1 by the pressure detector (3) and outputs to the drive unit of the control valve (2) the difference between a flow rate instruction signal Qs and a calculated flow rate Qc as a control signal Qy.

4. 发明公开

EP0931941A4 ORIFICE FOR PRESSURE TYPE FLOW RATE CONTROL UNIT AND PROCESS FOR MANUFACTURING ORIFICE 有权
标题翻译：流量控制器与压力控制及其制造方法NOZZLE
公开(公告)号：EP0931941A4
公开(公告)日：2003-05-21
申请号：EP98937820
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： G01F1/40 , G05D7/01 , F15D1/08 , B23P15/16 , G01F1/42
CPC分类号： G01F1/40 , G05D7/0186
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

5. 发明公开

EP1035457A4 METHOD FOR DETECTING PLUGGING OF PRESSURE FLOW-RATE CONTROLLER AND SENSOR USED THEREFOR 有权
标题翻译：法梗阻的压力测量流量控制器检测gler，一个用于这个目的所使用的传感器
公开(公告)号：EP1035457A4
公开(公告)日：2001-10-17
申请号：EP99935120
申请日：1999-08-09
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , NISHINO KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO , DOHI RYOUSUKE , YOSHIKAWA KAZUHIRO , KOYOMOGI MUTSUNORI , UNO TOMIO , IDETA EIJI , HIROSE TAKASHI
IPC分类号： G05D7/06 , F16K37/00
CPC分类号： G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： An orifice plugging sensor for a flow-rate controller having an orifice, comprising a memory (M) in which is stored reference pressure decrease data Y(t) about the upstream-side pressure P1 measured when the flow rate is changed from a high preset flow rate QSH to a low preset flow rate QSL under the condition that an orifice (2) does not plug, a pressure sensor (14) for measuring pressure decrease data P(t) about the upstream-side pressure P1 measured when the flow rate is changed from the high preset flow rate QSH to the low preset flow rate QSL under the condition that the orifice is in an actual state, a central processing unit (CPU) for comparison operation of the pressure decrease data P(t) and the reference pressure decrease data Y(t), and an alarm circuit (46) for giving an alarm of a plugging when the pressure decrease data P(t) differs from the reference pressure decrease data by a predetermined degree.

6. 发明公开

EP1585002A4 FLOW CONTROL METHOD FOR CLUSTERING FLUID AND FLOW CONTROL DEVICE FOR CLUSTERING FLUID 审中-公开
标题翻译： FLUSSSTEUERVERFAHREN ZUR FLUIDCLUSTERUNG UND FLUSSSTEUEREINRICHTUNG ZUR FLUIDCLUSTERUNG
公开(公告)号：EP1585002A4
公开(公告)日：2006-04-26
申请号：EP04702837
申请日：2004-01-16
申请人： FUJIKIN KK , OHMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OHMI TADAHIRO , SUGIYAMA KAZUHIKO , MIZUSAWA KENETU , TAKAHASHI EIJI , UNO TOMIO , NISHINO KOUJI , DOHI RYOUSUKE , IKEDA NOBUKAZU , NAGASE MASAAKI
IPC分类号： G05D7/06 , H01L21/00 , H01L21/306
CPC分类号： H01L21/67023 , G05D7/0635 , Y10T137/6416 , Y10T137/6606 , Y10T137/7761
摘要： A pressure-type flow control device is used to permit a high-accuracy control of the flow rate of a clustering fluid such as HF gas to be supplied to a vacuum chamber or the like within a flow rate range of about 3-300 SCCM. Specifically, a method of controlling the flow rate of a clustering fluid that uses a pressure-type flow control device where a flow rate Q of a gas flowing through an orifice is computed as Q=KP1 (K is constant) with a ratio P2/P1 between an orifice-upstream-side gas pressure P1 and a downstream-side gas pressure P2 kept up to the critical pressure ratio of the gas, wherein the pressure-type flow control device is heated to at least 40°C, or the clustering fluid is added with a dilute gas to be kept at up to a partial pressure, thereby allowing the clustering fluid, produced by dissociating the association of molecules and then keeping them in a monomolecular state, to flow through the orifice.
摘要翻译：使用压力式流量控制装置，可以在3×300SCCM的流量范围内对供应到真空室等的HF气体等聚集流体进行高精度流量控制。具体地说，本文公开了使用压力型流量控制装置来控制聚集流体的流量的方法，其中通过孔口的气体的流量Q被计算为K = KP1（其中K 是常数），气体处于孔口上游侧的气体压力P1与孔口下游侧的气体压力P2之间的比P2 / P1保持在不高于通过将上述压力式流量控制装置加热至高于40℃的温度，或者通过将稀释气体施加到聚集流体以使其低于分压使得聚簇流体被允许以单分子状态通过上述孔口。

7. 发明公开

EP1126347A4 METHOD FOR DETECTING ABNORMAL FLOW RATE FOR PRESSURE FLOW RATE CONTROLLER 有权
标题翻译：检测方法的异常流量一个流程中的稳压器EION加压流体
公开(公告)号：EP1126347A4
公开(公告)日：2004-11-03
申请号：EP00948265
申请日：2000-07-27
申请人： TOKYO ELECTRON LTD , FUJIKIN KK , OHMI TADAHIRO , IIDA SEIICHI
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , FUKASAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , UNO TOMIO , NISHINO KOUJI , IKEDA NOBUKAZU , DOHI RYOUSUKE , IDETA EIJI
IPC分类号： G01F1/36 , F16K37/00 , G05B23/02 , G05D7/06 , F16K17/22 , G01D21/00
CPC分类号： G05B23/0235 , G05B23/0256 , G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： A method for detecting abnormal flow rate by easily detecting an obstruction of an orifice while a fluid pressure flow rate controller using an orifice is controlling the flow rate. The method uses a flow rate controller (FCS) so as to calculate the flow rate Qc on the downstream side when the upstream-side pressure P1 is maintained at a value about twice or more the downstream-side pressure P2 from Qc=KP1 (K: constant) and to control the operation of a control valve (CV) according to a signal Qy representing the difference between the calculated flow rate Qc and a preset flow rate Qs. A testing circuit or flow rate setting circuit provided separately outputs a testing signal ΔQs having a testing amplitude V0 to the control valve (CV). The pressure amplitude V of a pressure variation ΔP1 of the upstream-side pressure P1 occurring in response to the opening/closing of the control valve (CV) is measured. When the pressure amplitude V decreases below a limit amplitude Vt, the obstruction of the orifice is announced, thus implementing the method. If the testing signal ΔQs is superimposed on a steady-state preset flow rate signal Qs0 and outputted together from the testing circuit or the flow rate setting circuit to the control valve (CV), an abnormal flow rate can be detected while controlling the flow rate by using the steady-state preset flow rate signal Qs0.

8. 发明公开

EP0952505A4 PRESSURE TYPE FLOW RATE CONTROL APPARATUS 有权
标题翻译：压力驱动流动控制设备
公开(公告)号：EP0952505A4
公开(公告)日：2004-04-21
申请号：EP98937819
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , F16K7/14 , F16K7/16 , G05D16/20
CPC分类号： G05D7/0647 , Y10T137/7759 , Y10T137/7761
摘要： A pressure type flow rate control apparatus to be used in a gas supply system for semiconductor manufacturing equipment, which calculates a flow rate (Q = KP1) by using a detected pressure P1 of a pressure detector (4) installed between an orifice (5) and a control valve provided upstream of the orifice (5) and outputs the difference between the calculated flow rate and a flow rate control signal as a control signal to the control valve. The orifice (5) is formed as a direct touch type metal diaphragm, and an annular gap between a valve seat and a diaphragm is made variable to allow the flow rate control range to be changed easily.

9. 发明公开

EP1096351A4 PARALLEL BYPASS TYPE FLUID FEEDING DEVICE, AND METHOD AND DEVICE FOR CONTROLLING FLUID VARIABLE TYPE PRESSURE SYSTEM FLOW RATE USED FOR THE DEVICE 审中-公开
标题翻译：旁路类型和调节压力系统与可变液体压力流量的方法和设备布置成平行液装置这FLÜSSIGLEITSSPEISEVORRICHTUNGUSED
公开(公告)号：EP1096351A4
公开(公告)日：2004-12-15
申请号：EP00913087
申请日：2000-04-03
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid feeding device having a plurality of flow paths disposed in parallel with each other starting at a regulator for pressure regulation, wherein a mass flow controller for flow control or a pressure system flow control device is disposed in each flow path so that the opening and closing operations for fluid supply in each flow path do not provide a transient variation in a stable supply to the other flow paths and, when the fluid supply in a flow path is changed from close to open, a set flow rate is reached a specified delay time after the start of the operation of the mass flow controller in that flow path.
摘要翻译：用的流线从一个调节器，用于压力调整分支出来的多个流体供给装置中，流线平行地布置，worin的量度取，DASS模具手术，也就是，开口或一个流路的开闭将没有在其它流动通道的稳流瞬态效应。为了这个目的，每个流动通道设置有一个时间延迟型质量流量控制器MFC所以没有当一个封闭流体通道打开时，质量流量控制器上没有流动通道达在一个特定的延迟时间ΔT的一组流量Qs 从起点。这样提供了一种方法和用于其中的气体类型的多元性可与精度高流速通过一个压力式流量控制装置来控制上述装置的速率。为了做到端，用于计算气体的流动的公式理论上推导做了与压力比不低于临界压力比更高流动。从做过公式，则流程因数被定义，所以做了式可以被应用到许多用流动因素气体类型。该方法包括：在下游侧计算通过传递到孔口雅丁式QC = KP1（K =常数）具有压力P1的气体的QC流量上设置节流孔上游侧的两次或更多次高于压力P2 ，worin流量因数FF为每种气体的计算如下： FF =（K /伽马S）A2 /（卡帕+ 1）U <1 /（卡帕-1）>是κ/ A（卡帕 + 1）RUU <1.2> 和worin，如果气体类型A的计算的流速是QA，并且，当将B型气体被允许在相同的压力下，通过相同的孔中流动的上游侧并在上游侧相同的温度，流率QB的计算公式如下： QB =（FFB / FFA）QA 其中YS =标准状态的气体的浓度; Kappa值=气体的比热的比值; R为气体的=常数; K =比例常数不依赖于气体的类型; FFA =气体类型A的流动系数; 气体类型B. 的和FFB =流量系数

10. 发明公开

EP1707858A4 VACUUM HEAT INSULATION VALVE 审中-公开
标题翻译： VAKUUMWÄRMEISOLIERVENTIL
公开(公告)号：EP1707858A4
公开(公告)日：2008-10-08
申请号：EP05703504
申请日：2005-01-13
申请人： FUJIKIN KK , OHMI TADAHIRO
发明人： OHMI TADAHIRO , MINAMI YUKIO , TUBOTA KENJI , SHINOHARA TSUTOMU , YAMAJI MICHIO , IKEDA NOBUKAZU , MORIMOTO AKIHIRO , KAWADA KOJI , NARIAI TOSHIRO
IPC分类号： F16K51/00 , F16L59/06 , F16K27/00 , F16K51/02
CPC分类号： F16K51/02 , Y10T137/6606 , Y10T137/7043 , Y10T137/7062
摘要： A vacuum heat insulation valve that can be used in high-temperature conditions in a gas supply system and gas discharge system and that can be drastically reduced in size and made compact because of excellent heat insulating performance of the valve. A vacuum heat insulation valve constructed from a valve that has a valve body and an actuator and from a vacuum insulation box that receives the valve. The vacuum heat insulation box (S) is constructed from a rectangular lower vacuum jacket (S5) that has on its side face a tubular vacuum insulation piping receiving section (J) and whose upper face is opened, and from a rectangular upper vacuum jacket (S4) that is air-tightly fitted to the lower vacuum jacket (S5) from the above and whose lower face is opened.
摘要翻译：一种真空绝热阀，可用于供气系统和排气系统的高温条件下，由于阀门具有优异的绝热性能，可大幅度减小尺寸并制成紧凑的结构。由阀门构成的真空隔热阀，该阀门具有阀体和致动器，以及来自容纳阀门的真空绝热箱。真空隔热箱（S）由矩形的下部真空夹套（S5）构成，其侧面具有管状真空隔热管接收部分（J）并且其上表面开口，并且从矩形上部真空夹套 S4）从上方气密地装配到下部真空夹套（S5）并且其下表面打开。

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