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1. 发明授权

EP1831290B1 KUNSTSTOFFMATERIAL 有权
标题翻译：塑胶原料
公开(公告)号：EP1831290B1
公开(公告)日：2009-03-18
申请号：EP05822864.4
申请日：2005-12-17
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried , RESAVAGE, Lawrence, G.
IPC分类号： C08J3/20 , C08K3/14
CPC分类号： C08K3/14 , C08J3/203 , C08J2365/02 , Y10T428/215 , Y10T428/269 , Y10T428/28
摘要： The invention relates to plastic material which is used to produce tribologically stressed components, in particular, maintaining rings which are used to maintain semi-conductor wafers in chemical/mechanical polishing devices. The invention also relates to the thus produced maintaining rings to a method for the production thereof. The aim of the invention is the considerably prolong the service life of said maintaining rings. As a result, the plastic material contains a plastic matrix and a particle-shaped TiC which is embedded therein.

2. 发明公开

EP1545836A1 HALTERING ZUM HALTEN VON HALBLEITERWAFERN IN EINER CHEMISCH-MECHANISCHEN POLIERVORRICHTUNG 审中-公开
标题翻译：在EINER CHEMISCH-MECHANISCHEN POLIERVORTHHTUNG举行的HALTERING ZUM HALTEN VON HALBLEITERWAFERN
公开(公告)号：EP1545836A1
公开(公告)日：2005-06-29
申请号：EP03757898.6
申请日：2003-10-01
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried
IPC分类号： B24B37/04
CPC分类号： B24B37/32
摘要： The aim of the invention is to provide a retaining ring (10) for holding semiconductor wafers in a chemical-mechanical polishing device, which is more economically produced and is especially more economically provided with a new plastic element than retaining rings according to prior art. To this end, in order to be mounted in a chemical-mechanical polishing device for semiconductor wafers, said retaining ring (10) comprises: a carrier ring (12) consisting of a first material and comprising assembly elements for mounting the carrier ring (12) on the polishing device; and a supporting ring which consists of a plastic material and is concentrically arranged on the carrier ring, said supporting ring being positioned, on a first front side thereof, on a polishing surface of the polishing device, and being held on the carrier ring (12), on the side thereof axially opposing the first front side, in an adhesive-free, detachable, rotationally fixed, positively locking and/or force locking manner. The first material has a higher rigidity than the plastic material of the supporting ring.
摘要翻译：本发明的目的是提供一种用于在化学机械抛光装置中保持半导体晶片的保持环（10），该保持环与根据现有技术的保持环相比更经济地制造并且尤其更经济地设置有新的塑料元件。为此，为了安装在用于半导体晶片的化学机械抛光装置中，所述保持环（10）包括：由第一材料构成的载体环（12），该载体环包括用于安装载体环（12 ）放在抛光装置上; 以及由塑料材料构成并且同心地布置在所述承载环上的支撑环，所述支撑环在其第一前侧上定位在所述抛光装置的抛光表面上并且被保持在所述承载环（12 ）在其与第一前侧轴向相对的侧上以无粘合，可拆卸，旋转固定，主动锁定和/或力锁合的方式。第一种材料具有比支撑环的塑料材料更高的刚性。

3. 发明授权

EP1549464B1 HALTERING ZUM HALTEN VON HALBLEITERWAFERN IN EINER CHEMISCH-MECHANISCHEN POLIERVORRICHTUNG 有权
标题翻译：保持环HOLDING半导体晶圆的化学机械抛光设备
公开(公告)号：EP1549464B1
公开(公告)日：2006-12-13
申请号：EP03779799.0
申请日：2003-10-01
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , B24B37/32
摘要： The aim of the invention is to provide a retaining ring (10, 30) for holding semiconductor wafers in a chemical-mechanical polishing device, whereby not only the edge effect, but also, inter alia, the time-intensive and cost-intensive replacement of the plastic element connected to the metallic ring by means of epoxy adhesive is avoided. To this end, the retaining ring is embodied as a single component and consists of a plastic material. Said retaining ring forms a supporting surface (18) on a first front side, for placing the retaining ring on a polishing surface of the polishing device, and comprises assembly elements (16, 40) on the side opposing the first front side in the axial direction, by which means the retaining ring can be mounted in the polishing device.

4. 发明公开

EP1549464A2 HALTERING ZUM HALTEN VON HALBLEITERWAFERN IN EINER CHEMISCH-MECHANISCHEN POLIERVORRICHTUNG 有权
标题翻译：保持环HOLDING半导体晶圆的化学机械抛光设备
公开(公告)号：EP1549464A2
公开(公告)日：2005-07-06
申请号：EP03779799.0
申请日：2003-10-01
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , B24B37/32
摘要： The aim of the invention is to provide a retaining ring (10, 30) for holding semiconductor wafers in a chemical-mechanical polishing device, whereby not only the edge effect, but also, inter alia, the time-intensive and cost-intensive replacement of the plastic element connected to the metallic ring by means of epoxy adhesive is avoided. To this end, the retaining ring is embodied as a single component and consists of a plastic material. Said retaining ring forms a supporting surface (18) on a first front side, for placing the retaining ring on a polishing surface of the polishing device, and comprises assembly elements (16, 40) on the side opposing the first front side in the axial direction, by which means the retaining ring can be mounted in the polishing device.

5. 发明公开

EP2549047A1 Abstandhalterprofil für Isolierglasscheiben 审中-公开
标题翻译：为中空玻璃间隔件部分
公开(公告)号：EP2549047A1
公开(公告)日：2013-01-23
申请号：EP12188150.2
申请日：2004-03-13
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried
IPC分类号： E06B3/667 , E06B3/677 , E06B3/663 , B01D53/28 , B01J20/16 , B01D53/26
CPC分类号： B01D53/28 , B01D53/261 , B01D2253/106 , B01D2253/108 , B01D2253/116 , B01D2253/304 , B01D2253/308 , B01D2259/4508 , B01D2259/4591 , B01J20/103 , B01J20/18 , B01J20/28004 , B01J20/2803 , B01J20/28047 , B01J20/2808 , B01J2220/46 , E06B3/66328 , E06B3/677 , Y10T428/139 , Y10T428/24562 , Y10T428/24744
摘要： Um ein Abstandhalterprofil für Isolierglasscheiben, das einen von einer Rechteckform abgeleiteten Profilquerschnitt aufweist, wobei bei der Bildung der Isolierglasscheiben zwei zueinander parallel beabstandete Seitenwandungen des Profils an den auf Abstand zu haltenden Glasscheiben anliegen, wobei eine erste und eine zweite, sich zwischen den Seitenwandungen ersteckende Querwand vorhanden sind, wobei die erste Querwand benachbart zum Scheibenrand und die zweite Querwand zum Scheibenzwischenraum hin angeordnet ist, zur Verfügung zu stellen, bei dem bei einer einfachen Handhabung der Profile beim Zusammenbau zu Abstandhalterrahmen in einfacher Weise eine höhere Absorptionskapazität für Wasserdampf erhalten bleibt, wird vorgeschlagen, dass das Abstandhalterprofil eine Bindemittelmatrix und in der Matrix eingelagertes partikuläres Adsorbens für Wasserdampf umfasst und dass die Bindemittelmatrix Wasserdampf durchlässig ist.
摘要翻译：为绝缘玻璃板，包括正方形形轮廓的横截面的在绝缘玻璃板的形成的衍生物，满溢的分隔件外形两个相互平行的轮廓到所述间隔保持玻璃板，间隔开的侧壁，其中第一和侧壁横向壁之间的第二定位ersteckende 存在时，所述第一横向壁布置为邻近晶片边缘和第二横向壁到窗格出之间的空间，以使可用的，其中，被保持在装配到隔离架的简档的简单的操作以简单的方式对水蒸汽的更高的吸收容量，建议该分隔件外形包括粘合剂基质和在基质中嵌入的颗粒吸附剂为水蒸汽，该粘结剂基体是水蒸汽可渗透的。

6. 发明公开

EP1831290A1 KUNSTSTOFFMATERIAL 有权
标题翻译：塑胶原料
公开(公告)号：EP1831290A1
公开(公告)日：2007-09-12
申请号：EP05822864.4
申请日：2005-12-17
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried , RESAVAGE, Lawrence, G.
IPC分类号： C08J3/20 , C08K3/14
CPC分类号： C08K3/14 , C08J3/203 , C08J2365/02 , Y10T428/215 , Y10T428/269 , Y10T428/28
摘要： The invention relates to plastic material which is used to produce tribologically stressed components, in particular, maintaining rings which are used to maintain semi-conductor wafers in chemical/mechanical polishing devices. The invention also relates to the thus produced maintaining rings to a method for the production thereof. The aim of the invention is the considerably prolong the service life of said maintaining rings. As a result, the plastic material contains a plastic matrix and a particle-shaped TiC which is embedded therein.

7. 发明公开

EP1601851A1 ABSTANDHALTERPROFIL FÜR ISOLIERGLASSCHEIBEN 审中-公开
标题翻译：固定框FOR绝缘盘
公开(公告)号：EP1601851A1
公开(公告)日：2005-12-07
申请号：EP04720534.9
申请日：2004-03-13
申请人： Ensinger Kunststofftechnologie GbR
发明人： ENSINGER, Wilfried
IPC分类号： E06B3/667 , E06B3/677 , E06B3/663
CPC分类号： B01D53/28 , B01D53/261 , B01D2253/106 , B01D2253/108 , B01D2253/116 , B01D2253/304 , B01D2253/308 , B01D2259/4508 , B01D2259/4591 , B01J20/103 , B01J20/18 , B01J20/28004 , B01J20/2803 , B01J20/28047 , B01J20/2808 , B01J2220/46 , E06B3/66328 , E06B3/677 , Y10T428/139 , Y10T428/24562 , Y10T428/24744
摘要： The invention relates to a spacer section for glass insulation panes, said section having a cross-section derived from a rectangular form. During the assembly of the glass insulation panes, two parallel lateral walls of the section that are at a distance from one another lie against the glass panes that are to be maintained at a specific distance. The section is equipped with first and second transversal walls that extend between the lateral walls, the first transversal wall adjoining the edge of the pane and the second transversal wall facing towards the gap between the panes. The aim of the invention is to provide sections that are easy to assembly with the spacer frame and that retain a higher absorption capacity for water vapour. To achieve this, the spacer section comprises a binding agent matrix and a particulate adsorbent material for water vapour that is incorporated into said matrix and the binding agent matrix is permeable to water vapour.

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