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1. 发明公开

EP0554006A1 Polyunsaturated diazonium compounds 失效
标题翻译： MehrfachungesättigteDiazoniumverbindungen。
公开(公告)号：EP0554006A1
公开(公告)日：1993-08-04
申请号：EP93300423.6
申请日：1993-01-21
申请人： Du Pont (UK) Limited
发明人： Pratt, Michael John , Ren, Jianrong , Wade, John Robert
IPC分类号： G03F7/027 , C08F20/36 , C07C271/00
CPC分类号： G03F7/016 , C07C271/26 , C07D277/82 , G03F7/027
摘要： Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula

(A⁻N₂⁺)p - Ar - (R)q - (XH)r

with a polyethlenically unsaturated monoisocyanate compound of the general formula

where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A⁻ represents an anion; Z represents the residue of a polyisocyanate OCN-Z-(NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.
摘要翻译：提供了适用于负工作辐射敏感组合物的多不饱和重氮化合物。它们可以通过使式（A 1→N2 +）p -Ar-（R）q - （XH）r的芳族重氮化合物与通式的多不饱和单异氰酸酯化合物反应来制备，其中 p和q是1至5的整数，r是1至10的整数; Ar表示衍生自芳族或杂芳族化合物的取代或未取代的二价或多价基团; X表示O，S或仲或叔氨基; R表示单键或取代或未取代的二价或其它多价基团，当q大于1时可以相同或不同; A < - >表示阴离子; Z表示多异氰酸酯OCN-Z-（NCO）n的残基，其中n为1或2; Y是式YOH的单羟基化合物的残基，其中Y含有至少两个烯属不饱和双键。

2. 发明公开

EP0442638A2 Polymeric compounds 失效转让
标题翻译： Polymerverbindungen。
公开(公告)号：EP0442638A2
公开(公告)日：1991-08-21
申请号：EP91300864.5
申请日：1991-02-04
申请人： Du Pont (UK) Limited
发明人： Potts, Rodney Martin , Etherington, Terence , Ren, Jianrong
IPC分类号： C08F8/30 , C08F8/36
CPC分类号： C08F8/44 , C08F2800/20 , C08F8/32 , C08F8/34 , C08F216/38
摘要： A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula

and pendant alkyl urethane groups of the formula

where X is an aliphatic, aromatic, carboxylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO₂⁻Z⁺, CO₂R or SO₃⁻Z⁺; Z⁺ is a cationic counter ion and R is hydrogen alkyl, alkylene, aryl or aralkyl group.
摘要翻译：聚合化合物衍生自多元材料，并且具有通式为CHEM的侧链磺酸酯基团和式CHEM的侧链烷基氨基甲酸酯基团，其中X为脂族，芳族，羧基或杂环基团; Y是氢，卤素或烷基，芳基，烷氧基，芳氧基或芳烷基，CO 2 Z +，CO 2 R或SO 3 Z 3; Z +是阳离子抗衡离子，R是氢烷基，亚烷基，芳基或芳烷基。

3. 发明公开

EP0554005A1 Photopolymerisable components of radiation-sensitive compositions 失效
标题翻译： Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen。
公开(公告)号：EP0554005A1
公开(公告)日：1993-08-04
申请号：EP93300422.8
申请日：1993-01-21
申请人： Du Pont (UK) Limited
发明人： Pratt, Michael John , Ren, Jianrong , Wade, John Robert
IPC分类号： G03F7/027 , C08F20/36 , C07C271/06
CPC分类号： G03F7/031 , C07C271/24 , C07C271/28 , C08G18/329 , C08G18/8158 , G03F7/027 , Y10S522/904 , Y10S522/905 , C08G18/54 , C08G18/62 , C08G18/58
摘要： Colorants, polymeric binder resins, photoinitiators, photosensitizers, colour-change agents, anti-halation agents, stabilizers, and other active hydrogen-containing components of radiation sensitive compositions for lithographic printing plate production and the like are reacted with a polyethylenically unsaturated monoisocyanate compound of the formula

wherein Y is the residue of a monohydroxyl compound of formula YOH and Y contains at least two ethylenically unsaturated double bonds. In this way the components are bonded to the image on exposure.
摘要翻译：与用于平版印刷版制作的辐射敏感组合物等的着色剂，聚合物粘合剂树脂，光引发剂，光敏剂，变色剂，防晕剂，稳定剂和其它含活性氢的组分与多烯属不饱和单异氰酸酯化合物式其中Y是式YOH和Y的单羟基化合物的残基，Y含有至少两个烯属不饱和双键。以这种方式，组件在曝光时被粘合到图像上。

4. 发明公开

EP0442638A3 Polymeric compounds 失效转让
标题翻译：聚合化合物
公开(公告)号：EP0442638A3
公开(公告)日：1992-06-03
申请号：EP91300864.5
申请日：1991-02-04
申请人： Du Pont (UK) Limited
发明人： Potts, Rodney Martin , Etherington, Terence , Ren, Jianrong
IPC分类号： C08F8/30 , C08F8/36
CPC分类号： C08F8/44 , C08F2800/20 , C08F8/32 , C08F8/34 , C08F216/38
摘要： A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula

and pendant alkyl urethane groups of the formula

where X is an aliphatic, aromatic, carboxylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO₂⁻Z⁺, CO₂R or SO₃⁻Z⁺; Z⁺ is a cationic counter ion and R is hydrogen alkyl, alkylene, aryl or aralkyl group.

5. 发明授权

EP0442638B1 Polymeric compounds 失效转让
标题翻译： Polymerverbindungen
公开(公告)号：EP0442638B1
公开(公告)日：1996-07-10
申请号：EP91300864.5
申请日：1991-02-04
申请人： Du Pont (UK) Limited
发明人： Potts, Rodney Martin , Etherington, Terence , Ren, Jianrong
IPC分类号： C08F8/30 , C08F8/36
CPC分类号： C08F8/44 , C08F2800/20 , C08F8/32 , C08F8/34 , C08F216/38

6. 发明公开

EP0412731A1 Improvements in or relating to bakeable aqueous photopolymers 失效
标题翻译： EinbrennbarewasserlöslichePhotopolymere。
公开(公告)号：EP0412731A1
公开(公告)日：1991-02-13
申请号：EP90308549.6
申请日：1990-08-03
申请人： Du Pont (UK) Limited
发明人： Potts, Rodney Martin , Etherington, Terence , Ren, Jianrong , Kolodziejczyk, Victor
IPC分类号： G03F7/012 , C08G63/685
CPC分类号： C08G63/6858 , G03F7/012
摘要： A radiation-sensitive compound comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.
摘要翻译：辐射敏感化合物包括聚合物，其包括多个叠氮取代的芳族酯基团和多个能够赋予化合物在水性或碱性介质中的溶解度的羧酸或磺酸基团。在成像曝光后，可以使用水性或碱性显影剂显影该化合物。该化合物可用于制造用于制造平版印刷版的辐射敏感板，其可以烘烤以改善印刷寿命。

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