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1. 发明公开

EP2876499A1 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投射曝光设备的照明系统
公开(公告)号：EP2876499A1
公开(公告)日：2015-05-27
申请号：EP14155686.0
申请日：2014-02-19
申请人： Carl Zeiss SMT GmbH
发明人： Degünther, Markus , Davydenko, Vladimir , Korb, Thomas , Schlesener, Frank , Hilt, Stefanie , Högele, Wolfgang
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70058 , G02B26/0833 , G03F7/70066 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/70425
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).

2. 发明授权

EP2876499B1 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光设备的照明系统
公开(公告)号：EP2876499B1
公开(公告)日：2017-05-24
申请号：EP14155686.0
申请日：2014-02-19
申请人： Carl Zeiss SMT GmbH
发明人： Degünther, Markus , Davydenko, Vladimir , Korb, Thomas , Schlesener, Frank , Hilt, Stefanie , Högele, Wolfgang
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70058 , G02B26/0833 , G03F7/70066 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/70425
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).
摘要翻译：微光刻投影曝光设备（10）的照明系统包括具有多个光入射面（75）的光学积分器（60），每个光入射面与次要光源（106）相关联。空间光调制器（52）具有光出射表面（57）并以空间分辨的方式透射或反射入射投射光。瞳孔形成单元（36）将投射光引导到空间光调制器上。物镜（58）将空间光调制器（52）的光出射面（57）成像到光学积分器（60）的光入射面（75）上。光学光调制器（52）的光出射表面（57）包括被区域（130）分隔的物体区域（110）的组（54-1到54-8），区域（130）在光入射小平面）。物镜（58）组合物体区域（110）的图像（110'），使得物体区域的图像（110'）邻接光学积分器（60）。

3. 发明公开

EP2876498A1 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：百科全书系列
公开(公告)号：EP2876498A1
公开(公告)日：2015-05-27
申请号：EP14155685.2
申请日：2014-02-19
申请人： Carl Zeiss SMT GmbH
发明人： Degünther, Markus , Davydenko, Vladimir , Korb, Thomas , Schlesener, Frank , Hilt, Stefanie , Högele, Wolfgang
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70058 , G02B26/0833 , G03F7/70066 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/70425
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75), whose images at least substantially superimpose in a mask plane (88). A spatial light modulator (52) transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective (58) images a light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60) so that an image (110') of an object area (110) on the light exit surface (57) completely coincides with one of the light entrance facets (75). A control unit (90) controls the spatial light modulator (52) such that along a scan direction (Y) a length of an image, which is formed on a mask (16) from a light pattern in the object area, gradually increases at a beginning of a scan cycle and gradually decreases at the end of the scan cycle.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括具有多个光入射面（75）的光学积分器（60），其图像至少基本上叠加在掩模平面（88）中。空间光调制器（52）以空间分辨的方式透射或反射入射的投影光。光瞳形成单元将投射光引导到空间光调制器上。目标（58）将空间光调制器（52）的光出射表面（57）成像到光学积分器（60）的光入射面（75）上，使得物体区域（110）的图像（110'））与光入射面（75）之一完全重合。控制单元（90）控制空间光调制器（52），使得沿着扫描方向（Y），从物体区域中的光图案形成在掩模（16）上的图像的长度在扫描周期的开始，并在扫描周期结束时逐渐减少。

4. 发明授权

EP2876498B1 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：百科全书系列
公开(公告)号：EP2876498B1
公开(公告)日：2017-05-24
申请号：EP14155685.2
申请日：2014-02-19
申请人： Carl Zeiss SMT GmbH
发明人： Degünther, Markus , Davydenko, Vladimir , Korb, Thomas , Schlesener, Frank , Hilt, Stefanie , Högele, Wolfgang
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70058 , G02B26/0833 , G03F7/70066 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/70425
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).
摘要翻译：微光刻投影曝光装置（10）的照明系统包括具有多个光入射面（75）的光学积分器（60），每个光入射面与第二光源（106）相关联。空间光调制器（52）具有光出射表面（57），并且以空间分辨的方式透射或反射入射投影光。光瞳形成单元（36）将投射光引导到空间光调制器上。物镜（58）将空间光调制器（52）的光出射表面（57）成像到光学积分器（60）的光入射面（75）上。光学调制器（52）的光出射表面（57）包括由未被成像在光入射面（75）上的区域（130）分隔的物体区域（110）的组（54-1至54-8））。目标（58）组合对象区域（110）的图像（110'），使得对象区域的图像（110'）邻接在光学积分器（60）上。

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