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    • 1. 发明公开
    • CARBAPENEM DERIVATIVE
    • 碳青霉烯衍生物
    • EP0747381A1
    • 1996-12-11
    • EP95909978.9
    • 1995-02-24
    • BANYU PHARMACEUTICAL CO., LTD.
    • NAKAGAWA, Susumu, Banyu Pharmaceutical Co., Ltd.FUKATSU, Hiroshi, Banyu Pharmaceutical Co., Ltd.USHIJIMA, Ryosuke, Banyu Pharmaceutical Co., Ltd.
    • C07D477/00
    • C07D477/20
    • A compound of the formula:
      wherein R 1 is a hydrogen atom or a lower alkyl group, R 2 is a hydrogen atom or a negative charge, R 3 is a hydrogen atom or a lower alkyl group, Ar is a phenyl group, a naphthyl group or a group of:
      (wherein each of A 4 and A 5 is a single bond, -NHSO 2 - or the like, and Het is a pyrrolinyl group, a 1,4-diazabicyclo[2.2.2]octanyl group or the like which may be substituted with a hydroxyl group, a carbamoyl lower alkyl group or the like) which may be substituted with a lower alkyl group, a lower alkylsulfamoyl group or the like which may be substituted with a hydroxyl group, a di-lower alkylsulfonyl group or the like; a hydroxyl group; a di-lower alkylsulfamoyl group or the like, each of A 1 , A 2 and A 3 is a single bond or a lower alkylene group which may be substituted with a lower alkyl group, a lower alkylsulfamoyl group or the like which may be substituted with a hydroxyl group, a di-lower alkylsulfamoyl group or the like; a pyridyl group or a pyridinio group or the like which may be substituted with a lower alkyl group, a carbamoyl lower alkyl group or the like, and W is a sulfur atom, a single bond or the like; or a pharmaceutically acceptable salt or ester thereof, a process for its production and an antibacterial agent containing it as an active ingredient.
    • 下式化合物:其中R 1为氢原子或低级烷基,R 2为氢原子或负电荷,R 3为氢原子或低级烷基 中,Ar为苯基,萘基或下述基团:其中A4和A5各自为单键,-NHSO2-等,Het为吡咯啉基,1,4-二氮杂双环[ 可以被可被羟基取代的低级烷基,低级烷基氨磺酰基等取代的可以被羟基,氨基甲酰基低级烷基等取代的2-辛基或其类似物) ,二低级烷基磺酰基等; 羟基; 二低级烷基氨磺酰基等,A1,A2和A3各自为可以被羟基取代的低级烷基,低级烷基氨磺酰基等取代的单键或低级亚烷基 基,二低级烷基氨磺酰基等; 可以被低级烷基,氨基甲酰基低级烷基等取代的吡啶基或吡啶基等,W是硫原子,单键等; 或其药学上可接受的盐或酯,其生产方法和含有它作为活性成分的抗菌剂。