专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

2. 发明公开

EP2595702A4 ALIGNMENT OF LIGHT SOURCE FOCUS 审中-公开
标题翻译： AUSRICHTUNG EINES LICHTQUELLENFOKUS
公开(公告)号：EP2595702A4
公开(公告)日：2016-03-16
申请号：EP11810187
申请日：2011-07-14
申请人： ASML NETHERLANDS BV
发明人： GRAHAM MATTHEW R , PARTLO WILLIAM N , CHANG STEVEN , BERGSTEDT ROBERT A
IPC分类号： A61N5/06
CPC分类号： H05G2/008 , G01B11/0608 , G01B11/26 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
摘要翻译：一种极紫外光系统包括：转向系统，其将沿着传播方向传播的放大光束转向和聚焦到位于远紫外光室内的目标位置附近的焦平面;检测系统，包括至少一个检测器，其被定位成检测图像从室内的目标材料的至少一部分反射的激光束，反射激光束的路径中的目标位置和检测系统之间的波前修正系统以及控制器。波前修改系统被配置为根据沿着传播方向的目标焦平面位置来修改反射激光束的波前。控制器包括用于基于检测到的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑。

IPRDB

热门服务

关于我们

友情链接

联系方式