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1. 发明授权

EP0092971B1 Process for selectively depositing a nickel-boron coating over a metallurgy pattern on a dielectric substrate and products produced thereby 失效
标题翻译：用于选择性地沉积介电基底上的金属图案的镍 - 钴阳极涂层和生产的产品的工艺
公开(公告)号：EP0092971B1
公开(公告)日：1989-08-16
申请号：EP83302244.5
申请日：1983-04-20
申请人： RICHARDSON CHEMICAL COMPANY , International Business Machines Corporation
发明人： Baudrand, Donald W. , Powers-Fleming, Rebecca , Gniewek, John J. , Harvilchuck, Joseph M. , Schmeckenbecher, Arnold F.
IPC分类号： C23C18/34 , H01L21/48
CPC分类号： H05K3/246 , C23C18/1607 , C23C18/1608 , C23C18/1637 , C23C18/1831 , C23C18/34 , H01L21/4867 , H05K1/092 , Y10S428/901 , Y10T428/24917

2. 发明授权

EP0071436B1 Electroless nickel plating 失效
标题翻译：电镀镍镀层
公开(公告)号：EP0071436B1
公开(公告)日：1987-10-14
申请号：EP82303913.6
申请日：1982-07-23
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Mallory, Glenn O. , Parker, Konrad
IPC分类号： C23C18/32
CPC分类号： C23C18/36

3. 发明授权

EP0073583B1 Electroless nickel-boron plating 失效
标题翻译：电镀镍镀层
公开(公告)号：EP0073583B1
公开(公告)日：1986-03-12
申请号：EP82304210.6
申请日：1982-08-10
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Mallory, Glenn O. , Horhn, Theresa
IPC分类号： C23C18/32
CPC分类号： C23C18/34

4. 发明公开

EP0237663A1 Electroless deposition magnetic recording media process 失效
标题翻译：一种用于通过化学沉积生产磁性记录介质的过程。
公开(公告)号：EP0237663A1
公开(公告)日：1987-09-23
申请号：EP86301984.0
申请日：1986-03-18
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Malik, Michael , Greene, Joseph L.
IPC分类号： G11B5/858 , C23C18/36
CPC分类号： G11B5/64 , G11B5/858
摘要： A process for producing a high density magnetic storage device such as a rigid memory disc with
high coercivity, high remanence and
hysteresis loop squareness. The device is prepared by initially cleaning the surface of a substrate, such as an aluminum disc, zincating that cleaned surface, when applicable electrolessly depositing a non-magnetic, nickel-phosphorus layer thereon which is substantially free of pits and other surface imperfections and which has a nickel content of from approximately 88 to 92 percent and a phosphorus content of from 12 to 8 percent, by weight. The non-magnetic, nickel-phosphorus layer is then polished and a magnetic, cobalt-phosphorus layer electrolessly deposited thereon. The cobalt-phosphorus deposition is performed in a highly stable, ammonia-free bath containing a source of cobalt ions, a source of hypophosphite ions, a source of citrate ions, and a low molecular weight, bath soluble amino acid. Preferably, a buffering agent such as, for example, a borate is employed in the bath. Thereafter, if desired, a protective coating in the form of a fluorocarbon, graphite or an electroless nickel-boron layer may be applied as an overlayer to the cobalt-phosphorus layer.

5. 发明授权

EP0237663B1 Electroless deposition magnetic recording media process 失效
标题翻译：电沉积磁记录介质过程
公开(公告)号：EP0237663B1
公开(公告)日：1991-09-25
申请号：EP86301984.0
申请日：1986-03-18
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Malik, Michael , Greene, Joseph L.
IPC分类号： G11B5/858 , C23C18/36
CPC分类号： G11B5/64 , G11B5/858

6. 发明公开

EP0073583A1 Electroless nickel-boron plating 失效
标题翻译： Stromlose Nickel-Bor-Plattierung。
公开(公告)号：EP0073583A1
公开(公告)日：1983-03-09
申请号：EP82304210.6
申请日：1982-08-10
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Mallory, Glenn O. , Horhn, Theresa
IPC分类号： C23C18/32
CPC分类号： C23C18/34
摘要： The boron content of an electroless nickel-boron deposit is enhanced by including in the bath a source of zirconyl ions or vanadyl ions, which bath can be operated at moderate temperature and pH despite the fact that boranes can be used as reducing agents. The deposit laid down has a boron content of at least about 2 weight %, based on the total weight of the deposit. The source of the ions may be for example zirconyl chloride, vanadyl sulfate or sodium metavanadate at a concentration between 0.001 and 0.1 mol per liter of the bath.
摘要翻译：化学镀镍 - 硼沉积物中的硼含量通过在浴中包含氧化锆离子或氧钒离子来提高，该溶液可以在中等温度和pH下操作，尽管硼烷可用作还原剂。根据沉积物的总重量，沉积物的硼含量为至少约2重量％。离子源可以是例如氧化锆，硫酸氧钒或偏钒酸钠，浓度为每升浴中0.001至0.1mol。

7. 发明公开

EP0071436A1 Electroless nickel plating 失效
标题翻译： Chemische Vernickelung。
公开(公告)号：EP0071436A1
公开(公告)日：1983-02-09
申请号：EP82303913.6
申请日：1982-07-23
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Mallory, Glenn O. , Parker, Konrad
IPC分类号： C23C18/32
CPC分类号： C23C18/36
摘要： Nickel-phosphorus deposits are electrolessly coated onto substrates at a commercially acceptable rate of deposition in a manner that enhances corrosion resistance and reduces the internal tensile stress of the electroless deposit on the substrate. This is done by plating from a bath that is sulfur-free (or free of sulfur except at its highest oxidation state) and that includes an unsaturated carboxylic acid of the formula R(COOH) n wherein R is an unsaturated alkyl group of at least 2 carbon atoms and n is at least 1, or a derivative thereof. Such compounds include aconitic, citraconic, fumaric, itaconic and maleic acids. The reducing agent of the bath may also be its phosphorus source e.g. an alkali metal hypophosphite.
摘要翻译：镍磷沉积物以商业上可接受的沉积速率无电涂覆在基材上，以提高耐腐蚀性并降低基材上无电解沉积物的内部拉伸应力。这是通过从不含硫的浴（或除了最高的氧化态除外）除去的浴进行电镀，其包括式R（COOH）n的不饱和羧酸，其中R是至少不饱和烷基 2个碳原子，n至少为1，或其衍生物。这些化合物包括乌头酸，柠康酸，富马酸，衣康酸和马来酸。浴的还原剂也可以是其磷源，例如，碱金属次磷酸盐。

8. 发明授权

EP0071436B2 Electroless nickel plating 失效
标题翻译：电镀镍镀层
公开(公告)号：EP0071436B2
公开(公告)日：1993-10-13
申请号：EP82303913.6
申请日：1982-07-23
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Mallory, Glenn O. , Parker, Konrad
IPC分类号： C23C18/32
CPC分类号： C23C18/36

9. 发明公开

EP0084937A1 Electrical contact materials 失效
标题翻译：电接触材料。
公开(公告)号：EP0084937A1
公开(公告)日：1983-08-03
申请号：EP83300152.2
申请日：1983-01-12
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Baudrand, Donald W.
IPC分类号： H01B1/00 , C23C18/34 , C23C18/42 , C25D3/48
CPC分类号： H05K3/244 , H01B1/026 , H01L23/48 , H01L2924/0002 , Y10S428/926 , Y10S428/929 , Y10S428/936 , Y10T428/12889 , Y10T428/1291 , Y10T428/12944 , H01L2924/00
摘要： Electrical contact materials are provided which belong to the general category of copper that is overplated with a noble metal, usually gold. The improvement resides in the provision of an electroless nickel deposit laid down between the copper basis metal and the gold layer, which electroless nickel deposit acts as a barrier layer and is laid down from a particular class of nickel-boron or nickel-phosphorus baths. The nickel-phosphorus bath should have, as well as conventional additives, an unsaturated carboxylic acid tensile stress reducing agent, preferably at between 0.005 and 0.1 mol/litre, and the nickel-boron bath should include zirconyl or vanadyl ion as boron deposition enhancer preferably at between 0.001 and 0.1 mol/litre. The thickness of this layer is preferably not more than 800 microinches. There may be also an electroless deposit of an underlayer between the basis metal and the barrier layer.

10. 发明授权

EP0084937B1 Electrical contact materials 失效
标题翻译：电气接触材料
公开(公告)号：EP0084937B1
公开(公告)日：1987-10-21
申请号：EP83300152.2
申请日：1983-01-12
申请人： RICHARDSON CHEMICAL COMPANY
发明人： Baudrand, Donald W.
IPC分类号： H01B1/00 , C23C18/34 , C23C18/42 , C25D3/48
CPC分类号： H05K3/244 , H01B1/026 , H01L23/48 , H01L2924/0002 , Y10S428/926 , Y10S428/929 , Y10S428/936 , Y10T428/12889 , Y10T428/1291 , Y10T428/12944 , H01L2924/00

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