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    • 2. 发明公开
    • METHOD OF TREATING METAL ANALYSIS SAMPLE AND DEVICE THEREOF
    • VERFAHREN ZUR BEHANDLUNG EINER METALLANALYSEPROBE UND EINRICHTUNGHIERFÜR
    • EP1279958A4
    • 2005-02-23
    • EP01974788
    • 2001-10-11
    • JFE STEEL CORPJAPAN ANALYST CORPULVAC PHI INCIWAI HIDEOABIKO KENJI
    • ABIKO KENJIYASUHARA HISAONIIDA TAKASHISHIMURA MAKOTO
    • G01N1/32G01N33/20G01N1/34
    • G01N1/32G01N33/20
    • A preliminary treating device for a metal analysis sample, comprising (1) a treating room having a closable sample charging inlet in the upper part thereof and a closable sample discharging outlet in the lower part thereof and provided with a gas inlet and a gas outlet, (2) a sample carrying rod joined to a sample receiver doubling as a sputtering-use one-sided electrode and installed to pass through at least one side wall of the treating room so as to be able to move horizontally and turn on the axis thereof, and (3) a sputtering-use counter electrodes installed at least facing each other in those regions in the treating room that do not obstruct the charging and discharging of a sample so as to be able to interpose the sample receiver between the counter poles. A preliminary treating method which uses this preliminary treating room, simply cleans the surface of a metal analysis sample by sputtering, and can prevent re-contamination of the cleaned sample by atmospheric exposure. An analysis device comprising this preliminary treating device to permit a high-accuracy quantification of trace elements in metal.
    • 本发明提供了一种用于分析金属样品的预处理装置,该装置包括(1)处理室,其具有可以打开和关闭并设置在室顶部的样品加料口, 打开和关闭并设置在室的底部,以及气体入口和气体出口,(2)连接到样品保持器的样品携带杆,还用作溅射电极,并且设置成穿过至少一个侧壁 以及(3)至少具有彼此相对布置的部分的溅射相对电极,所述溅射对电极在不抑制分析金属样品的充放电的区域中使样品 支架可以布置在对电极中。 本发明还提供了一种预处理方法,其能够通过使用预处理装置简单地清洁分析金属样品的表面,并防止通过暴露于空气等而对被清洁样品的再污染。 此外,本发明提供一种具有预处理装置的分析装置,以允许金属微量元素的高精度定量测定。