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1. 发明公开

EP1849594A1 CONDUCTIVE LAMINATED BODY, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY AND PROTECTION PLATE FOR PLASMA DISPLAY 有权
标题翻译：导电层合体，膜在电磁波等离子显示器和保护板等离子显示器
公开(公告)号：EP1849594A1
公开(公告)日：2007-10-31
申请号：EP06713911.3
申请日：2006-02-16
申请人： Asahi Glass Company, Limited , Asahi Glass Ceramics Co., Ltd.
发明人： NAKAGAMA, Susumu , KANDA, Koichi , HIRAMOTO, Makoto , KAWASAKI, Masato , MORIMOTO, Tamotsu
IPC分类号： B32B9/00 , G09F9/00 , H05K9/00
CPC分类号： H05K9/0096 , B32B17/10018
摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.
An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3xn layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains "zinc oxide" and "titanium oxide or niobium oxide", the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.
摘要翻译：以提供在导电性层叠体具有优异的导电性和可见光透明性的电磁波屏蔽膜用于等离子显示器，以及具有优异的电磁波屏蔽性，广泛的透射/反射带和高的可见光的等离子体显示器用保护板透光率。侧到导电性层叠体10，其包括基板11，和在导电膜12，其具有具有第一氧化物层12a，金属层12b和第二氧化物层12c的层叠顺序从基板11，或具有3XN层的3层结构结构（worin n是至少为2的整数）具有上述三层结构重复，worin第一氧化物层12a含有“氧化锌”和“二氧化钛或氧化铌”，该金属层12b是一个层含银和所述第二氧化物层12c中包含氧化锌和氧化铝，或类似物的混合物。

2. 发明授权

EP0852266B1 TARGET, PROCESS FOR PRODUCTION THEREOF, AND METHOD OF FORMING HIGHLY REFRACTIVE FILM 无效
标题翻译： TARGET，方法其生产和电影HOCHREFRAKTIVER
公开(公告)号：EP0852266B1
公开(公告)日：2004-10-13
申请号：EP96906935.0
申请日：1996-03-25
申请人： Asahi Glass Ceramics Co., Ltd.
发明人： KIDA, Otojiro, Asahi Glass CO. Ltd. , MITSUI, Akira, Asahi Glass CO. Ltd. , SUZUKI, Eri, Asahi Glass CO. Ltd. , OSAKI, Hisashi, Asahi Glass CO. Ltd. , HAYASHI, Atsushi, Asahi Glass CO. Ltd.
IPC分类号： C23C14/34 , C23C14/38
CPC分类号： C23C14/083 , C23C4/02 , C23C4/11 , C23C14/3414
摘要： A target to be used in forming a transparent thin oxide film having a high refractive index by direct-current sputtering and a method of forming the film by using the target. Although it has been a practice to form a highly refractive film by direct-current sputtering wherein a metallic target is sputtered in an oxygenic atmosphere, this method is problematic owing to the extremely low speed of film formation. An alternative method therefor comprises using oxide ceramics as the target, but this method is also problematic in that the ceramics are nonconductive and hence direct-current sputtering is difficult. The invention method enables a highly refractive film to be produced rapidly by direct-current sputtering by using a target mainly comprising a metal oxide, MOx, wherein oxygen is contained in a stoichiometrically insufficient quantity and M represents at least one metal selected among Ti, Nb, Ta, Mo, W, Zr and Hf.

3. 发明公开

EP1452622A2 Target and process for its production, and method for forming a film having a high refractive index 失效
$Target and process for its production, and method for forming a film having a high refractive index$
标题翻译：目标，Verfahren zu dessen Herstellung und Herstellung hochrefraktiver Filme
公开(公告)号：EP1452622A2
公开(公告)日：2004-09-01
申请号：EP04013040.3
申请日：1996-03-25
申请人： Asahi Glass Ceramics Co., Ltd.
发明人： Kida, Otojiro , Mitsui, Akira , Suzuki, Eri , Osaki, Hisashi , Hayashi, Atsushi
IPC分类号： C23C14/34 , C23C14/08
CPC分类号： C23C14/083 , C23C4/02 , C23C4/11 , C23C14/3414
摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO x as the main component, wherein MO x is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
摘要翻译： 1.一种溅射靶，其特征在于，包括在所述基板上形成的基板和靶材，其中，所述靶材包含化学式MOx的金属氧化物为主要成分，其中MOx为与化学计量组成相比缺氧的金属氧化物 M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法以及具有高折射率的膜的形成方法。

4. 发明公开

EP1810956A1 ZIRCONIA BASED MONOTHILIC REFRACTORY 审中-公开
标题翻译： MONOLITHISCHER FEUERFESTER STOFF AUF ZIRCONIUMOXIDBASIS
公开(公告)号：EP1810956A1
公开(公告)日：2007-07-25
申请号：EP04732811.7
申请日：2004-05-13
申请人： Asahi Glass Ceramics Co., Ltd.
发明人： ONO, Yasushi, c/o Asahi Glass Ceramics, Co., Ltd. , KIDO, Nobuyuki, c/o Asahi Glass Ceramics, Co., Ltd
IPC分类号： C04B35/66
CPC分类号： C04B35/66 , C03B5/43 , C04B35/481 , C04B35/482 , C04B35/4885 , C04B35/62665 , C04B35/6303 , C04B35/6306 , C04B35/6313 , C04B35/6316 , C04B2235/3217 , C04B2235/3244 , C04B2235/3418 , C04B2235/36 , C04B2235/44 , C04B2235/447 , C04B2235/5427 , C04B2235/5436 , C04B2235/5445 , C04B2235/5472 , C04B2235/61 , C04B2235/72 , C04B2235/96 , C04B2235/9669
摘要： It is an object of the present invention to provide a zirconia-based monolithic refractory which is excellent in corrosion resistance and penetration resistance against molten glass, and anti-contamination property for molten glass and which is suitable as a tamping material for a glass furnace, excellent in workability and durability.
The present invention provides a zirconia-based monolithic refractory characterized in that it is a monolithic refractory comprising from 70 to 95 mass% of zirconia particles (as calculated as ZrO 2 ) from 2 to 12 mass% of alumina particles, from 1 to 10 mass% of a binder and from 2 to 8 mass% of a glass content (including a glass phase if such a glass phase is contained in the zirconia particles), and it contains substantially no alumina cement in the monolithic refractory.
摘要翻译：本发明的目的是提供一种耐熔融玻璃的耐腐蚀性和耐渗透性优异的熔融玻璃的耐污染性，适用于玻璃熔窑的捣固材料的氧化锆系整体耐火材料，优良的可加工性和耐用性。本发明提供一种氧化锆系整体耐火材料，其特征在于，其为含有70〜95质量％的氧化锆粒子（按ZrO 2计算）为2〜12质量％的氧化铝粒子，为1〜10质量％％的粘合剂和2〜8质量％的玻璃含量（如果这种玻璃相包含在氧化锆颗粒中则包括玻璃相），并且其在整体耐火材料中基本上不含氧化铝粘固剂。

5. 发明公开

EP1452622A3 Target and process for its production, and method for forming a film having a high refractive index 失效
$Target and process for its production, and method for forming a film having a high refractive index$
标题翻译：其制造目标和方法以及用于形成具有高折射率的膜的方法
公开(公告)号：EP1452622A3
公开(公告)日：2004-09-29
申请号：EP04013040.3
申请日：1996-03-25
申请人： Asahi Glass Ceramics Co., Ltd.
发明人： Kida, Otojiro , Mitsui, Akira , Suzuki, Eri , Osaki, Hisashi , Hayashi, Atsushi
IPC分类号： C23C14/34 , C23C14/38
CPC分类号： C23C14/083 , C23C4/02 , C23C4/11 , C23C14/3414
摘要： A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO x as the main component, wherein MO x is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
摘要翻译：一种溅射靶材，其特征在于，在上述基材上形成有靶材，上述靶材包含化学式MOx的金属氧化物作为主要成分，其中MOx是与化学计量组成相比氧不足的金属氧化物，M是选自Ti，Nb，Ta，Mo，W，Zr和Hf中的至少一种金属，其制造方法和形成具有高折射率的膜的方法。

6. 发明公开

EP1810956A4 ZIRCONIA BASED MONOLITHIC REFRACTORY 审中-公开
标题翻译： MONOLITHISCHER FEUERFESTER STOFF AUF ZIRCONIUMOXIDBASIS
公开(公告)号：EP1810956A4
公开(公告)日：2007-11-28
申请号：EP04732811
申请日：2004-05-13
申请人： ASAHI GLASS CERAMICS CO LTD
发明人： ONO YASUSHI , KIDO NOBUYUKI
IPC分类号： C04B35/66 , C03B5/42 , C04B35/48 , C04B35/482 , C04B35/488 , C04B35/63
CPC分类号： C04B35/66 , C03B5/43 , C04B35/481 , C04B35/482 , C04B35/4885 , C04B35/62665 , C04B35/6303 , C04B35/6306 , C04B35/6313 , C04B35/6316 , C04B2235/3217 , C04B2235/3244 , C04B2235/3418 , C04B2235/36 , C04B2235/44 , C04B2235/447 , C04B2235/5427 , C04B2235/5436 , C04B2235/5445 , C04B2235/5472 , C04B2235/61 , C04B2235/72 , C04B2235/96 , C04B2235/9669
摘要： A zirconia based monothilic refractory, characterized in that it comprises 70 to 95 mass % of zirconia particles (in terms of ZrO2) and 2 to 12 mass % of alumina particles, 1 to 10 mass % of a binder and 2 to 8 mass % of a glass component (including the glass phase contained in the zirconia particles, if any), and is substantially free of alumina cement. The zirconia based monothilic refractory can be suitably used as a tamping material for a glass tank furnace which is excellent in the corrosion resistance to molten glass, the resistance to permeation, and the anti-staining property to a glass base material, and also exhibits excellent workability and durability.
摘要翻译：甲氧化锆基monothilic耐火材料，其特征在于，它包括氧化锆粒子的70〜95质量％（以ZrO 2换算）和氧化铝颗粒的2〜12质量％，粘结剂为1〜10质量％和2〜8质量％的玻璃成分（包括氧化锆颗粒中所含的玻璃相，如果有的话），并且基本上不含氧化铝水泥。基于monothilic耐火材料的氧化锆可以被适当地用作用于玻璃池窑捣固材料，该材料具有优异的对熔融玻璃，以渗透的阻力，和防污性的玻璃基底材料，耐腐蚀性，并且还表现出优异的可操作性和耐久性。

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