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    • 1. 发明公开
    • Magnetron sputtering apparatus
    • Magnetronsputteranlage。
    • EP0645798A1
    • 1995-03-29
    • EP94117736.2
    • 1990-01-30
    • MITSUBISHI KASEI CORPORATION
    • Arita, Yoji
    • H01J37/34C23C14/35
    • H01J37/3426H01J37/3408
    • Magnetron sputtering apparatus is disclosed having an inner magnetic pole (12) and an outer magnetic pole (13) having a polarity opposite to that of the inner magnetic pole and ranged to surround the inner magnetic pole, and a target (11) disposed at least above the inner magnetic pole and extending therefrom towards the outer magnetic pole. A soft magnetic material (8) divided into plural discreet sections is mounted on the back of the target between the inner and outer magnetic poles, and is adapted to decrease the vertical component of the leakage magnetic field at a central portion between the inner and outer magnetic poles, and to increase it at a portion in the vicinity of magnetic poles, and thereby to cause the distribution of intensity of a horizontal component of the magnetic field between the poles to adopt an M-shaped form, having peaks towards the magnetic poles and a trough therebetween. In preferred embodiments, the magnetron apparatus further comprises a first permanent magnet (16) having magnetization predominantly in the horizontal direction disposed between the inner and outer magnetic poles, and a second permanent magnet (17) having magnetization predominantly in the direction opposite to that of the first magnet, disposed on an outer side of the outer magnetic pole.
    • 公开了具有内磁极(12)和外磁极(13)的磁控管溅射装置,所述内磁极(12)和外磁极(13)的极性与内磁极的极性相反,并且包围内磁极,并且至少设置有目标(11) 在内磁极上方并从其向外磁极延伸。 分为多个分立部分的软磁材料(8)安装在内磁极和外磁极之间的靶的背面,并且适于减小内外部之间的中心部分处的泄漏磁场的垂直分量 磁极,并且在磁极附近的一部分增加磁极,从而使磁极之间的磁场的水平分量的强度分布采用M形形式,具有朝向磁极的峰值 和它们之间的槽。 在优选实施例中,磁控管装置还包括第一永磁体(16),其主要在水平方向上具有设置在内磁极和外磁极之间的磁化;以及第二永磁体(17),其主要在与 第一磁体,设置在外磁极的外侧。