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81. 发明公开

EP1325810A2 Image recording material 有权
标题翻译： Bildaufzeichnungsmaterial
公开(公告)号：EP1325810A2
公开(公告)日：2003-07-09
申请号：EP03000042.6
申请日：2003-01-07
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Aoshima, Keitaro
IPC分类号： B41C1/10 , G03F7/004
CPC分类号： G03F7/035 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/033 , G03F7/037 , G03F7/038 , G03F7/0384 , G03F7/0387 , G03F7/0388
摘要： The invention provides a negative image recording material comprising: a support and an image recording layer disposed on the support, the image recording layer comprising an amide-acid compound containing a carboxyl group and an amide group expressed by the following General Formula (1):
wherein L 11 represents a hydrogen atom or a hydrocarbon group having 30 or fewer carbon atoms which may have a substituent; and wherein the amide-acid compound is insolubilized by a thermal ring-closure reaction between the carboxyl group and the amide group.
The invention further provides a negative image recording material comprising a support, an image recording layer disposed on the support, the image recording layer containing a polymerization initiator and a polymerizable compound, and an overcoat layer disposed on the image recording layer, the overcoat layer containing the amide-acid compound expressed by the General Formula (1).
摘要翻译：本发明提供一种负型图像记录材料，包括：载体和设置在载体上的图像记录层，该图像记录层包含由以下通式（1）表示的含羧基和酰胺基的酰胺酸化合物：其中L 11表示氢原子或具有30个以下可具有取代基的碳原子的烃基; 并且其中酰胺酸化合物通过羧基和酰胺基之间的热封闭反应而不溶解。本发明还提供了一种负型图像记录材料，包括载体，设置在载体上的图像记录层，含有聚合引发剂的图像记录层和可聚合化合物，以及设置在图像记录层上的外涂层，所述外涂层含有由通式（1）表示的酰胺酸化合物。

82. 发明公开

EP0950923A1 PHOTOSENSITIVE RESIN COMPOSITION AND FLEXOGRAPHIC RESIN PLATE 有权
标题翻译： FOTOEMPFINDLICHE ZUSAMMENSETZUNGEN UND FLEXODRUCKPLATTE
公开(公告)号：EP0950923A1
公开(公告)日：1999-10-20
申请号：EP98951683.6
申请日：1998-11-04
申请人： TOKYO OHKA KOGYO CO., LTD. , Nippon Shokubai Co., Ltd.
发明人： TAKAGI, Toshiya , AOYAMA, Toshimi , KAHARA, Koji , KOBAYASHI, Nobuhiro , YOSHIDA, Masatoshi
IPC分类号： G03F7/027 , G03F7/00 , C08G18/67
CPC分类号： C08G18/4018 , C08G18/67 , C08G18/672 , C08G18/8175 , G03F7/035 , G03F7/0388
摘要： The present invention provides a photosensitive resin composition which comprises an urethane resin obtained by reacting (A) a carboxyl group-containing polymer having an acid value of 30 mg KOH/g or more and a glass transition temperature of 30°C or more, (B) a compound having two isocyanate groups in one molecule, (C) a compound having two hydroxyl groups in one molecule and (D) a photopolymerizable unsaturated monomer having one hydroxyl group in one molecule, and a photopolymerization initiator, and a resin plate for flexography using the photosensitive resin composition, whereby the photosensitive resin composition having water developing properties, high in sensitivity and impact resilience, and excellent in water resistance, ink resistance and press life of a hardened portion forming a line pattern area of a printing plate material and the resin plate for flexography prepared by the use of the photosensitive resin composition can be provided.
摘要翻译：本发明提供一种感光性树脂组合物，其包含通过使（A）含有酸值为30mg KOH / g以上且含有30℃以上的玻璃化转变温度的含羧基聚合物与（A） B）在一个分子中具有两个异氰酸酯基的化合物，（C）在一个分子中具有两个羟基的化合物和（D）在一个分子中具有一个羟基的光聚合性不饱和单体和光聚合引发剂，以及用于使用感光性树脂组合物的柔性印刷版，由此具有水显影性，高灵敏度和回弹性的感光性树脂组合物，形成印版材料的线图案区域的硬化部分的耐水性，耐油墨性和印刷寿命优异，可以提供通过使用感光性树脂组合物制备的用于柔性版印刷用树脂板。

83. 发明公开

EP0602292A1 Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates 有权转让
标题翻译：光固化性聚氨酯丙烯酸酯的离聚物组合物的水性可显影的印刷板。
公开(公告)号：EP0602292A1
公开(公告)日：1994-06-22
申请号：EP92311588.5
申请日：1992-12-18
申请人： PT Sub, Inc.
发明人： Huynh-Tran, Truc-Chi Thi
IPC分类号： G03F7/027 , G03F7/035 , C08F299/06 , C08G18/10 , C08G18/08 , C08G18/67
CPC分类号： G03F7/0384 , C08G18/638 , C08G18/672 , C08G18/675 , G03F7/035 , Y10S430/114 , Y10S430/128 , C08G18/0823 , C08G18/63 , C08G18/6674
摘要： A photopolymer useful in preparing water-developable, solid printing plates is prepared by (A) preparing a urethane prepolymer by reacting a polyoxyalkylene diol (optionally carboxylic acid grafted) with an excess of diisocyanate, followed by chain extending the resulting prepolymer mixture with a dialkylolpropionic acid and preferably with additional diols(s) such as alkane diol(s) and (meth)acrylate-containing diol(s). Use of a new (meth)acrylate-containing diol in such chain extension completes the formation of photopolymer. However, in a third operation (B) hydroxyalkylmethacrylate may be reacted with the result of (A) whether or not (meth)acrylate-containing diol is used in (A). The carboxylic acid groups of the photopolymer may also be partially neutralized with a base. The photopolymer is suitably formulated with additional photoactive (meth)acrylate monomers or oligomers and photoinitiator for casting on a substrate or extruding to form a flexographic printing plate. Following UV exposure of the plate through a negative, unexposed areas can be removed by washing with an aqueous alkaline solution to give a plate with a desirable relief image. The use of the aqueous alkaline washout solution as opposed to organic solvents minimizes pollution problems.
摘要翻译：在制备水可显影，固体印刷板中有用的光聚合物是由（A）制备通过在过量二异氰酸酯反应的聚氧化烯二醇（任选地羧酸接枝的）用制备的聚氨酯预聚物，随后链将所得的预聚物混合物与dialkylolpropionic扩展酸，优选与另外的二醇（或多个）：如烷烃二醇（S）和（甲基）二醇（S）含有丙烯酸酯 - 。一个新的（甲基）丙烯酸酯含有的搜索扩链二醇的使用完成光聚合物的形成。然而，在第三操作（B）羟基 - 甲基丙烯酸烷基酯可以与（A）的结果进行反应是否含丙烯酸酯的（甲基）二醇（A）中使用。光聚合物的羧酸基团可以因此用碱部分中和。光聚合物适当地与额外的光活性（甲基）丙烯酸酯单体或低聚物和光引发剂用于铸造上的基片或挤出，以形成柔性版印版配制。通过负，未曝光的区域之后的板的UV曝光可以通过在wässrige碱性溶液与洗涤，得到具有浮雕图像，较好的一个板被移除。相对于有机溶剂的使用wässrige碱性冲洗溶液的最小化污染问题。

84. 发明公开

EP0587189A2 A solder resist ink composition 失效
标题翻译：阻焊剂油墨组合物
公开(公告)号：EP0587189A2
公开(公告)日：1994-03-16
申请号：EP93114613.8
申请日：1993-09-10
申请人： NIPPON SHOKUBAI CO., LTD.
发明人： Awaji, Toshio , Otsuki, Nobuaki , Arakawa, Motohiro , Tanaka, Hiromichi
IPC分类号： C09D163/00 , C08F283/10 , C08F299/02 , C08G59/02 , C08G59/40 , H05K3/28 , H05K3/34
CPC分类号： G03F7/0388 , C08F290/14 , C08F290/144 , C08G59/02 , C08G59/1466 , G03F7/027 , G03F7/032 , G03F7/035 , H05K3/287 , H05K2203/0783 , H05K2203/0793
摘要： The photo-curable liquid solder resist ink composition of the present invention mainly comprises a photo-polymerizable resin having a sufficient molecular weight and (meth)acryloyl groups which are imparted by both the introduction of (meth)acryloyl groups into a novolak-type epoxy resin having 4 or more benzene nuclei and the polymerization using a chain-extension agent. The composition is useful for a photo-curable type resist, since it can produce a coated film excellent in tack free characteristic and resolution, and can produce a cured film excellent in heat resistance, adhesiveness, and chemical resistance. In addition, by reaction with an acid anhydride, development with alkalis becomes possible.
摘要翻译：本发明的光固化液体阻焊油墨组合物主要包含具有足够分子量的可光聚合树脂和通过将（甲基）丙烯酰基团引入酚醛清漆型环氧树脂中而赋予的（甲基）丙烯酰基具有4个或更多个苯核的树脂和使用扩链剂的聚合。该组合物对于光固化型抗蚀剂是有用的，因为其可以制备具有优异的不粘特性和分辨率的涂布膜，并且可以制备耐热性，粘附性和耐化学性优异的固化膜。另外，通过与酸酐反应，可以用碱进行显影。

85. 发明公开

EP4411479A1 PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE 审中-实审
公开(公告)号：EP4411479A1
公开(公告)日：2024-08-07
申请号：EP22876139.1
申请日：2022-09-26
申请人： TOYOBO MC Corporation
发明人： TANIGAWA, Masahito , IWASHITA, Yuji
IPC分类号： G03F7/095 , B41N1/00 , G03F7/00 , G03F7/004 , G03F7/032 , G03F7/035 , G03F7/037
CPC分类号： B41N1/00 , G03F7/00 , G03F7/004 , G03F7/032 , G03F7/035 , G03F7/037 , G03F7/095
摘要： The present invention provides a photosensitive resin printing plate precursor for relief printing that can achieve both gradation print reproducibility of a highlight part and plate life, and that has a low plate-surface adhesiveness.
A photosensitive resin printing plate precursor for relief printing, wherein the photosensitive resin printing plate precursor comprises a support, a photosensitive resin layer, and a cover film stacked in this order, wherein the photosensitive resin layer comprises a lower layer present on a support side and an upper layer present on a cover-film side, wherein the upper layer is a photosensitive resin layer that contains a water-soluble or water-dispersible resin (A) having a glass transition temperature measured by differential scanning calorimeter of 40 to 90°C, wherein the upper layer has a thickness of 3 to 30 micrometers, wherein the lower layer is a layer that contains a water-soluble or water-dispersible resin (B) having a glass transition temperature higher than the glass transition temperature of the water-soluble or water-dispersible resin (A) by 5°C or more, and wherein the glass transition temperature of the resin (B) measured by differential scanning calorimeter is 95 to 135°C.

87. 发明授权

EP2762974B1 METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE 有权
公开(公告)号：EP2762974B1
公开(公告)日：2017-07-26
申请号：EP12837108.5
申请日：2012-09-14
申请人： Fujifilm Corporation
发明人： SONOKAWA Koji , FUKUDA Tsubasa
IPC分类号： G03F7/033 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/035 , G03F7/32 , B41C1/10 , G03F7/031
CPC分类号： B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/10 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/035 , G03F7/32 , G03F7/322

88. 发明公开

EP3175297A1 SCHICHTAUFBAU UMFASSEND EINE PHOTOPOLYMER- UND EINE SUBSTRATSCHICHT 有权
公开(公告)号：EP3175297A1
公开(公告)日：2017-06-07
申请号：EP15745464.6
申请日：2015-07-31
申请人： Covestro Deutschland AG
发明人： FÄCKE, Thomas , BRUDER, Friedrich-Karl , HÖNEL, Dennis , WALZE, Günther , RÖLLE, Thomas
IPC分类号： G03F7/027 , G03F7/035
CPC分类号： G03F7/035 , G03F7/027
摘要： The invention relates to a layer structure comprising a substrate layer and a photopolymer layer which is connected to the substrate layer at least in sections, the substrate layer having an average retardation of ≤ 60 nm.
摘要翻译：本发明涉及一种层结构，其包括基底层和至少部分地连接到基底层的光聚合物层，基底层具有≤60nm的平均延迟。

89. 发明公开

EP3134446A1 AROMATISCHE GLYKOLETHER ALS SCHREIBMONOMERE IN HOLOGRAPHISCHEN PHOTOPOLYMER-FORMULIERUNGEN 有权
标题翻译：芳族化合物GLYKOLETHER ALS SCHRIBMONOMERE IN HOLOGRAPHISCHEN PHOTOPOLYMER-FORMULIERUNGEN
公开(公告)号：EP3134446A1
公开(公告)日：2017-03-01
申请号：EP15711757.3
申请日：2015-03-24
申请人： Covestro Deutschland AG
发明人： FÄCKE, Thomas , BRUDER, Friedrich-Karl , RÖLLE, Thomas , WEISER, Marc-Stephan , HÖNEL, Dennis , BERNETH, Horst , WALZE, Günther , HAGEN, Rainer
IPC分类号： C08F290/06 , G03F7/00 , G03F7/24 , G11B7/245
CPC分类号： G03F7/001 , C07C69/017 , C07C69/54 , C07C69/612 , C07C271/16 , C08F290/062 , C08F290/067 , G03F7/028 , G03F7/035 , G03H1/0248 , G03H2001/0264 , G03H2260/12 , G11B7/24044 , C08F220/34 , C08F2220/346 , C08F222/22
摘要： The present invention concerns a photopolymer formulation comprising specific aromatic glycol ethers as writing monomers, matrix polymers and a photoinitiator. Other subjects of the invention are an unexposed holographic medium obtainable using a photopolymer formulation of the invention, and an exposed holographic medium obtainable by exposing a hologram into an unexposed holographic medium of the invention. Subjects of the invention likewise are an optical display comprising an exposed holographic medium of the invention, the use of an exposed holographic medium of the invention for fabricating chip cards, identity documents, 3D images, product protection labels, tags, banknotes or elements with holographic optical properties, and also specific aromatic glycol ethers.
摘要翻译：本发明涉及包含作为书写单体的特定芳族二醇醚，基质聚合物和光引发剂的光聚合物制剂。本发明进一步提供了使用本发明的光聚合物制剂可获得的未曝光全息照相介质，以及通过将全息图曝光到本发明的未曝光全息介质中可获得的曝光全息介质。本发明同样提供了包括本发明的曝光全息介质的视觉显示器，用于使用本发明的曝光全息介质来生产芯片卡，识别文件，3D图像，产品保护标签，标签，纸币或全息光学元件，以及特定芳族乙二醇醚。

90. 发明公开

EP2787010A1 POLYROTAXANE COMPOUND, PHOTOCURABLE COATING COMPOSITION, AND COATED FILM 有权
标题翻译：聚轮烷，光固化涂料组合物和薄膜包衣
公开(公告)号：EP2787010A1
公开(公告)日：2014-10-08
申请号：EP13794275.1
申请日：2013-05-27
申请人： LG Chem, Ltd.
发明人： KIM, Heon , CHANG, Yeong-Rae , KIM, Hye-Min
IPC分类号： C08B37/16 , C08G63/08 , C08L5/16 , C09D105/16 , C09D133/04
CPC分类号： C09D7/63 , C08B37/0012 , C08B37/0015 , C08F2220/343 , C08G63/08 , C08G83/007 , C08J7/047 , C08J2367/02 , C08J2400/21 , C08L5/16 , C08L101/005 , C09D4/06 , C09D105/16 , G03F7/027 , G03F7/031 , G03F7/032 , G03F7/033 , G03F7/035 , G03F7/0757 , C08L67/04
摘要： The present invention relates to a novel polyrotaxane compound having a specific chemical structure, a photocurable coating composition that may provide a coating material having excellent mechanical properties such as scratch resistance, chemical resistance, abrasion resistance, and the like, and excellent self-healing capability, and a coating film obtained from the photocurable coating composition.

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