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    • 73. 发明公开
    • PROCESS FOR THE PRODUCTION OF ORGANIC OXIDES
    • HERSTELLUNGSVERFAHRENFÜR有机硅氧化物
    • EP2003116A2
    • 2008-12-17
    • EP07741451.4
    • 2007-04-05
    • Takeda Pharmaceutical Company Limited
    • IKEMOTO, TomomiFUKUDA, Naohiro
    • C07C315/02C07C317/04C07C317/14C07C317/22C07D213/70C07D213/71C07D213/84C07D277/76C07D333/48C07B33/00
    • C07C315/02C07D213/70C07D213/71C07D213/84C07D277/76C07D333/48
    • The present invention provides a method for producing an organic oxide, wherein a substrate is oxidized using hypohalous acid, hypohalous acid salt, chlorine, bromine or iodine in the presence of water and a catalytic amount of a compound represented by the following formula (I): R 1 -X 1 -NY-R 2 , wherein: X 1 represents -CO- or -SO 2 -; Y represents a hydrogen atom, a potassium atom, a sodium atom, a chlorine atom, a bromine atom or an iodine atom; R 1 represents a substituted or unsubstituted hydrocarbon group, -NYR 3 group or -OR 3 group (in the formulae, R 3 represents a substituted or unsubstituted hydrocarbon group, and Y represents the same meaning as defined above); and R 2 represents a hydrogen atom or -CO-R 4 group (in the formula, R 4 represents a substituted or unsubstituted hydrocarbon group, -NYR 5 group or -OR 5 group (in the formulae, R 5 represents a substituted or unsubstituted hydrocarbon group, and Y represents the same meaning as defined above)); or R 1 and R 4 may bind to each other to form a further substituted or unsubstituted nitrogen-containing heterocyclic ring.
    • 本发明提供一种有机氧化物的制造方法,其中在水和催化量的下式(I)表示的化合物的存在下,使用次卤酸,次卤酸盐,氯,溴或碘氧化底物, :R 1 -X 1 -NY-R 2,其中:X 1表示-CO-或-SO 2 - ; Y表示氢原子,钾原子,钠原子,氯原子,溴原子或碘原子; R 1表示取代或未取代的烃基,-NYR 3基或-OR 3基(式中,R 3表示取代或未取代的烃基,Y表示与上述相同的含义)。 R 2表示氢原子或-CO-R 4基团(式中,R 4表示取代或未取代的烃基,-NYR 5基或-OR 5基)(式中,R 5表示取代或未取代的 烃基,Y表示与上述相同的含义)); 或R 1和R 4可以彼此结合形成另外的取代或未取代的含氮杂环。