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    • 52. 发明公开
    • Process for preparing acrylamide
    • Verfahren zur Herstellung von Acrylamid。
    • EP0670301A1
    • 1995-09-06
    • EP95301321.6
    • 1995-03-01
    • MITSUI TOATSU CHEMICALS, INCORPORATED
    • Kambara, YoshihikoAbe, TakeyaUehara, YoshikazuAsao, Koichi
    • C07C231/06C07C233/09C07C231/22C07C231/24C08F20/36
    • C07C231/065C07C231/24
    • A process for preparing acrylamide is disclosed herein which comprises subjecting acrylonitrile to a hydration reaction in the presence of a copper-based catalyst, said process comprising the step of allowing a compound having an active methylene group and an acidic group in one molecule or a salt of the compound, for example, malonic acid, cyanoacetic acid or its salt to be present in a reaction system. According to the hydration reaction, it is possible to inhibit the secondary formation of impurities which cannot be heretofore removed, without any deterioration of a catalyst activity, and acrylamide can be obtained which is useful as a material for the manufacture of a high-molecular weight flocculant having a sufficiently large molecular weight and a good water solubility.
    • 本文公开了一种制备丙烯酰胺的方法,其包括在铜基催化剂存在下使丙烯腈进行水合反应,所述方法包括使一分子中具有活性亚甲基和酸性基团的化合物或盐 的化合物,例如丙二酸,氰基乙酸或其盐存在于反应体系中。 根据水合反应,可以抑制以前不能去除的杂质的二次形成,而不会导致催化剂活性的降低,并且可以获得丙烯酰胺,其可用作制备高分子量的材料 絮凝剂具有足够大的分子量和良好的水溶性。
    • 58. 发明公开
    • Polyunsaturated diazonium compounds
    • MehrfachungesättigteDiazoniumverbindungen。
    • EP0554006A1
    • 1993-08-04
    • EP93300423.6
    • 1993-01-21
    • Du Pont (UK) Limited
    • Pratt, Michael JohnRen, JianrongWade, John Robert
    • G03F7/027C08F20/36C07C271/00
    • G03F7/016C07C271/26C07D277/82G03F7/027
    • Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula

              (A⁻N₂⁺)p - Ar - (R)q - (XH)r


      with a polyethlenically unsaturated monoisocyanate compound of the general formula

      where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A⁻ represents an anion; Z represents the residue of a polyisocyanate OCN-Z-(NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.
    • 提供了适用于负工作辐射敏感组合物的多不饱和重氮化合物。 它们可以通过使式(A 1→N2 +)p -Ar-(R)q - (XH)r的芳族重氮化合物与通式的多不饱和单异氰酸酯化合物反应来制备,其中 p和q是1至5的整数,r是1至10的整数; Ar表示衍生自芳族或杂芳族化合物的取代或未取代的二价或多价基团; X表示O,S或仲或叔氨基; R表示单键或取代或未取代的二价或其它多价基团,当q大于1时可以相同或不同; A < - >表示阴离子; Z表示多异氰酸酯OCN-Z-(NCO)n的残基,其中n为1或2; Y是式YOH的单羟基化合物的残基,其中Y含有至少两个烯属不饱和双键。