会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 49. 发明公开
    • III-Nitride switching device with an emulated diode
    • III-Nitrid-Schaltvorrichtung mit emulierter二极管
    • EP2390919A2
    • 2011-11-30
    • EP11003177.0
    • 2011-04-15
    • International Rectifier Corporation
    • Zhang, Jason
    • H01L27/085H03K17/687
    • H01L27/0255H01L21/8252H01L27/0605H01L27/0629H01L27/085H01L29/2003H01L29/205H01L29/7787H01L29/872H03K17/687
    • Some exemplary embodiments of a III-nitride switching device with an emulated diode have been disclosed. One exemplary embodiment comprises a GaN switching device fabricated on a substrate comprising a high threshold GaN transistor (340) coupled across a low threshold GaN transistor (346), wherein a gate and a source of the low threshold GaN transistor are shorted with an interconnect metal to function as a parallel diode in a reverse mode. The high threshold GaN transistor is configured to provide noise immunity for the GaN switching device when in a forward mode. The high threshold GaN transistor and the low threshold GaN transistor are typically fabricated on the same substrate, and with significantly different thresholds. As a result, the superior switching characteristics of III-nitride devices may be leveraged while retaining the functionality and the monolithic structure of the inherent body diode in traditional silicon FETs.
    • 已经公开了具有仿真二极管的III族氮化物开关器件的一些示例性实施例。 一个示例性实施例包括制造在包括耦合在低阈值GaN晶体管(346)上的高阈值GaN晶体管(340)的衬底上的GaN开关器件,其中低阈值GaN晶体管的栅极和源极与互连金属 在反向模式下用作并联二极管。 高阈值GaN晶体管被配置为当处于正向模式时为GaN开关器件提供抗噪声性。 高阈值GaN晶体管和低阈值GaN晶体管通常制造在相同的衬底上,并具有明显不同的阈值。 因此,可以利用III族氮化物器件的优异的开关特性,同时保持传统硅FET中固有体二极管的功能和单片结构。