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31. 发明授权

EP1932953B1 Galvanisches Verfahren mit Analyse des Elektrolytbads durch Festphasenextraktion 有权
标题翻译：通过固相萃取电解槽的分析方法电
公开(公告)号：EP1932953B1
公开(公告)日：2012-11-14
申请号：EP06025569.2
申请日：2006-12-11
申请人： Atotech Deutschland GmbH
发明人： Barthelmes, Jürgen , Rüther, Robert , Lagorce-Broc, Florence , Kurtz, Olaf , Sprenger, Oleg , Sainz-Vila, Marta , Moritz, Thomas , Gaida, Josef
IPC分类号： C25D21/12
CPC分类号： C25D21/12 , C25D21/14

32. 发明公开

EP2520140A1 VERFAHREN UND VORRICHTUNG ZUM NASSCHEMISCHEN BEHANDELN VON BEHANDLUNGSGUT 有权
标题翻译：方法和装置湿法化学处理处理
公开(公告)号：EP2520140A1
公开(公告)日：2012-11-07
申请号：EP10800710.5
申请日：2010-12-28
申请人： Atotech Deutschland GmbH
发明人： SKUPIN, Andreas , BRUCKNER, Helmut , LOWINSKI, Christian
IPC分类号： H05K3/00 , H05K3/18 , C23C18/16
CPC分类号： H05K3/187 , C25D5/003 , C25D7/0621 , C25D21/12 , H05K3/0085 , H05K2203/086
摘要： The invention relates to a device (1) for the wet chemical treatment of material feedstock (10), in particular of planar material feedstock (10), comprising a treatment container (2) for treating the material feedstock (10) with a treatment liquid (9), a transport device (24) for transporting the material feedstock (10) through the treatment container (2) and a feed device (11) for feeding an inert gas (16) to the treatment container (2).

33. 发明公开

EP2478133A2 ELECTROLYTIC PROCESS APPARATUS 审中-公开
标题翻译：设备电解过程
公开(公告)号：EP2478133A2
公开(公告)日：2012-07-25
申请号：EP10766098.7
申请日：2010-09-16
申请人： Buttaci, Vincenzo
发明人： Buttaci, Vincenzo
IPC分类号： C25D17/00 , C25D21/10 , C25D17/10 , C25D21/12
CPC分类号： C25D17/008 , C25D17/10 , C25D21/12
摘要： Electrolytic process apparatus comprises a voltage source for electrically coupling to first and second electrodes, a detection circuit electrically coupled to the voltage source and a guard for providing a barrier between the first and second electrodes. The guard is arranged to permit current to travel within an electrolyte between the electrodes. The guard includes a guard conductor arranged to be electrically isolated from the electrodes. The guard conductor is arranged to be electrically coupled to the detection circuit such that the detection circuit can detect the presence of a current path between the guard conductor on the one hand and either electrode on the other hand.

34. 发明授权

EP2152939B1 VORRICHTUNG UND VERFAHREN ZUR ELEKTRISCHE KONTAKTIERUNG VON EBENEM GUT IN DURCHLAUFANLAGEN 有权
标题翻译：装置和方法用于电接触IN GOOD PASS系统的水平
公开(公告)号：EP2152939B1
公开(公告)日：2012-07-11
申请号：EP09757157.4
申请日：2009-05-08
申请人： RENA GmbH
发明人： GUTEKUNST, Mathias
IPC分类号： C25D5/02 , C25D17/00 , C25D7/06 , C25D21/12
CPC分类号： C25D5/028 , C25D5/18 , C25D7/0621 , C25D17/001 , C25D17/005 , C25D21/12
摘要： The invention relates to the electrical contact of flat material (1) as sections in straight-through installations for the electrolytic and/or chemical wet treatment of the treatment side (10) of the material using external electric current, with the top, contact side (9) being kept dry and the treatment side (10) penetrating into the treatment liquid (11). The known transporting systems with top and bottom transporting and/or contact means result in treatment liquid (11) being transferred from the bottom means to the top means, in which case the top side of the material is often inadmissbly wetted and the top contacts are galvanized and therefore continuously stripped, which requires relatively high outlay. According to the invention, the level is lowered in the region of top contacts (6). This means that these cannot be wetted, even when there is no material located in the region of the contacts (6). This is achieved by way of downpipes (5) which are assigned to each contact (6). Even in the case of contacts being relieved of any stressing, they do not come into contact with any treatment liquid, as a result of which the top side of the material remains dry and the contacts do not require any stripping.

35. 发明公开

EP2298965A3 Verfahren und Vorrichtung zur galvanischen Beschichtung von Substraten 有权
标题翻译：方法和装置用于基片的电解涂覆
公开(公告)号：EP2298965A3
公开(公告)日：2012-07-04
申请号：EP10176929.7
申请日：2010-09-15
申请人： SCHOTT Solar AG
发明人： LIPPERT, Lothar , DAUWE, Stefan
IPC分类号： C25D5/02 , C25D5/18 , C25D17/00 , C25D5/00 , C25D7/12 , H01L21/288 , H01L31/0224
CPC分类号： C25D5/18 , C25D5/00 , C25D5/006 , C25D5/08 , C25D7/126 , C25D17/001 , C25D21/12 , H01L31/022425 , Y02E10/50
摘要： Es wird eine Vorrichtung (10) zur galvanischen Beschichtung von mindestens einer Oberfläche (2, 3) mindestens eines Substrates (1), insbesondere einer Solarzelle (1a), beschrieben. Die Vorrichtung weist ein Beschichtungsbad (13) auf, das eine mit elektrolytischer Beschichtungsflüssigkeit (14) gefüllte Beschichtungswanne (2) aufweist. Ferner ist eine Transporteinrichtung (15) zum Durchführen des Substrates (1) durch das Beschichtungsbad (13), ein Lichtquellenschaltkreis (60) mit mindestens einer Lichtquelle (64) zur Bestrahlung des Substrates (1) und ein Gleichrichterschaltkreis (50) für das Substrat (1) vorgesehen. Die Vorrichtung weist Mittel zur Erzeugung von synchronen Stromimpulsen und Lichtimpulsen auf, wobei in den Impulspausen zwischen den Stromimpulsen die Bestrahlung des Substrates unterbrochen ist. Es wird auch ein Verfahren zur galvanischen Beschichtung von Oberflächen eines Substrates beschrieben.

36. 发明公开

EP2342553A1 A METHOD OF INSPECTING A METAL COATING AND A METHOD FOR ANALYTICAL CONTROL OF A DEPOSITION ELECTROLYTE SERVING TO DEPOSIT SAID METAL COATING 有权转让
标题翻译：控制金属涂层的分离分析方法DERIVE从分离电解质
公开(公告)号：EP2342553A1
公开(公告)日：2011-07-13
申请号：EP09748250.9
申请日：2009-10-26
申请人： ATOTECH Deutschland GmbH
发明人： HARTMANN, Philip , JONAT, Michael , WUENSCHE, Mathias
IPC分类号： G01N27/416 , G01N27/42 , G01N17/02
CPC分类号： G01N27/42 , C25D5/18 , C25D21/12
摘要： For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarisation of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during dissolution of the metal coating; and d) determining a time- averaged value of the dissolution potential. For analytical control of the deposition electrolyte, a method is provided, which comprises the following method steps: a) depositing the metal coating from the deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarisation of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during dissolution of the metal coating; d) determining a time-averaged value of the dissolution potential; e) determining a difference between the time-averaged value of the dissolution potential and a reference value; and f) allocating said difference to a difference between the concentration of a component of the deposition electrolyte determining the dissolution potential and its standard concentration.

37. 发明公开

EP2329063A2 ALLOY COATING APPARATUS AND METALLIDING METHOD 审中-公开
标题翻译：合金涂层设备和METALLIDIERUNGSVERFAHREN
公开(公告)号：EP2329063A2
公开(公告)日：2011-06-08
申请号：EP09816826.3
申请日：2009-09-24
申请人： Hurst, William D.
发明人： Hurst, William D.
IPC分类号： C25D3/56 , C25D17/10 , C25D17/00 , C25D21/02
CPC分类号： C25D17/10 , C25D3/56 , C25D3/66 , C25D9/04 , C25D17/004 , C25D21/12 , F01D5/288 , F05C2203/0839 , F05D2230/31 , F05D2300/222 , F05D2300/611 , Y10T428/12986
摘要： A material (20) is coated to enhance and add desirable properties through a metalliding process employing an atmosphere (14) substantially free of oxygen and an electrolytic bath (18) within the atmosphere (14). An electrically conductive substrate (20) to be coated is submerged within the bath (18) as a cathode (20) along with multiple anodes (26), each anode (26a, 26b, 26c) having a distinctive composition from the other. A variable power source (30) provides distinctly selected current densities to each of the anodes (26) so as to result in a coating of the substrate (20) by each anode material (26a, 26b, 26c) in proportion to the applied current densities.

38. 发明公开

EP2229472A1 DEVICE AND METHOD FOR THE ELECTROCHEMICAL DEPOSITION OF CHEMICAL COMPOUNDS AND ALLOYS WITH CONTROLLED COMPOSITION AND/OR STOICHIOMETRY 有权转让
标题翻译： DEVICE AND METHOD FOR化学元素的电隔离和合金中控制的组成和/或化学计量学
公开(公告)号：EP2229472A1
公开(公告)日：2010-09-22
申请号：EP08864450.5
申请日：2008-12-17
申请人： Eidgenössische Technische Hochschule Zürich
发明人： GLATZ, Wulf , DURRER, Lukas , SCHWYTER, Etienne
IPC分类号： C25D5/18 , C25D3/56 , C25D21/12
CPC分类号： C25D5/18 , C25D3/56 , C25D9/04 , C25D21/12
摘要： Disclosed is a method for depositing an alloy and/or chemical compounds on a substrate immersed in an electrolyte (1), comprising the steps of: I) applying a first constant or varying potential to the substrate under voltage control for a first time interval (tA); II) applying a second constant or varying current to the substrate under current control for a second time interval (tB); repeating the sequence of steps (I-II). at least twice. Further the use of the method in particular for the deposition of Bi2+xTe3-x is disclosed as well as a specific device for carrying out the above method.

39. 发明公开

EP1860212A4 BASE MATERIAL PROCESSING APPARATUS AND BASE MATERIAL PROCESSING METHOD 审中-公开
标题翻译：基材处理设备和方法
公开(公告)号：EP1860212A4
公开(公告)日：2010-05-26
申请号：EP06728822
申请日：2006-03-09
申请人： FUJIFILM CORP
发明人： TOMARU YUICHI
IPC分类号： C25D21/12 , C25D11/02 , G01B11/06 , H01L21/316
CPC分类号： C25D21/12 , C25D11/005 , C25D11/02 , G01B11/0675 , G01N21/21 , G01N21/55 , G01N21/8422

40. 发明公开

EP2054539A2 METHOD FOR DEPOSITION OF CHROMIUM LAYERS AS HARD- CHROME PLATING, ELECTROPLATING BATH AND HARD- CHROME SURFACES 有权
标题翻译：工艺镀铬层数大于镀硬铬，镀锌槽和硬铬表面的分离
公开(公告)号：EP2054539A2
公开(公告)日：2009-05-06
申请号：EP07786477.5
申请日：2007-07-31
申请人： Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V.
发明人： BOHNET, Jens , METZNER, Martin , KRASSNITZER, Herwig , SCHERMANZ, Karl
IPC分类号： C25D3/06 , C25D21/12 , C25D17/00
CPC分类号： C25D3/06 , C25D17/002 , C25D21/12 , Y10T428/12847
摘要： The invention relates to a method for deposition of chromium layers as hard-chrome plating for protection against wear or corrosion and/or for decorative purposes and also an electroplating bath with which chromium layers of this type can be deposited. The invention also relates to hard-chrome surfaces produced accordingly.

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