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    • 40. 发明公开
    • MASK PLATE AND PREPARATION METHOD THEREOF
    • EP3640365A1
    • 2020-04-22
    • EP18912788.9
    • 2018-08-21
    • Kunshan Go-Visionox Opto-Electronics Co., Ltd.
    • LI, Weili
    • C23C14/04H01L51/56
    • The present application relates to a mask plate and a method of preparing the same, wherein the mask plate comprises a mask frame and a mask fixedly disposed on the mask frame. The mask is provided with a first region having a plurality of pixel openings for display, and a second region disposed around the first region and having a plurality of first auxiliary pixel openings. The first auxiliary pixel openings in the second region are in sizes smaller than the pixel openings in the first region. In the present application, by disposing the second region around the first region in the mask, and by making smaller sizes of the first auxiliary pixel openings in the second region than the pixel openings in the first region, the FMM from an unetched region to a fully etched region may have a strength between strengths of the unetched region and the fully etched region, thus causing a gradually changing stress that gradually reduces after the AA region (including the first region and the second region), and thereby preventing the AA area from damage to achieve the purpose of balancing the strength and uniformity of the FMM.