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    • 28. 发明公开
    • Variable power device for a uniform heating of fluids
    • 用于均匀加热流体的可变功率装置
    • EP2871429A3
    • 2015-07-29
    • EP14425140.2
    • 2014-11-03
    • HT S.p.A.
    • Dall'Anese, Costante
    • F24H1/12H05B3/44
    • H05B3/44F24H1/142H05B2203/021
    • A variable power device for a uniform heating of fluids, comprising an outer tube (10), which is connected to a fitting or flange (14) for connecting the power supply and grounding cables (21) and to one or more fluid distribution connectors (24, 26), said outer tube (10) enclosing a first drilled heat sink (13), made of conductive material, within which a first hollow space (11) and a wire-type or layer-type resistor (12), embedded within an insulating layer, are inserted, In this way, the resistor (12) is not directly connected with the fluid, but it is directly connected with said first heat sink (13) and therefore it is possible to distribute heat from said first heat sink (13) to the fluid in correspondence with a large surface, while said first heat sink (13) also maintains a low temperature at the fluid contact surface.
    • 一种用于均匀加热流体的可变功率装置,包括外管(10),该外管连接到用于连接电源和接地电缆(21)以及一个或多个流体分配连接器(21)的配件或法兰(14) 所述外管(10)包围由导电材料制成的第一钻孔散热器(13),在所述第一钻孔散热器(13)内嵌入第一中空空间(11)和线型或层型电阻器(12) 插入绝缘层内。这样,电阻器(12)不直接与流体连接,而是直接与所述第一散热器(13)连接,并且因此可以从所述第一热量 (13)与大表面相对应,而所述第一散热器(13)在流体接触表面处也保持低温。
    • 29. 发明公开
    • CERAMIC HEATER AND MANUFACTURING METHOD THEREOF
    • 陶瓷加热装置及其制造方法
    • EP2701459A1
    • 2014-02-26
    • EP12774734.3
    • 2012-04-18
    • NGK Spark Plug Co., Ltd.
    • MATSUI, KazuyaWATANABE, Shindo
    • H05B3/44F23Q7/00F23Q7/22
    • F23Q7/001F23Q2007/004H01C17/02H05B3/44Y10T29/49083
    • A taper surface 12 having a contour L1 extending along an imaginary ellipse E is composed of a plurality of successively arranged curved surfaces which decrease in radius of curvature toward the forward end with respect to the direction of an axis P. The taper surface 12 is such that the distance between the end points M1 and M2 of the contour L1 is large in the direction of the axis P, and the angle between the axis P and a tangential line of the contour L1 on the side toward the forward end surface 11 is larger than the angle between the axis P and a tangential line of the contour L1 on the side toward the side circumferential surface 15. Thus, the taper surface 12 can maintain a diameter close to the outer diameter of the side circumferential surface 15 of the substrate up to a position closer to the forward end. Therefore, it is possible to secure a sufficiently large outer surface area to thereby secure a satisfactory heat radiation amount. Also, when the average outer diameter of a portion (conditions specified section) which extends 6 mm from the forward end surface 11 in the direction of the axis P is less than 2.3 mm, a satisfactory heat radiation performance can be secured. When the average outer diameter is equal to or less than 3.3 mm, a satisfactory quick temperature raising performance is obtained. By rendering the area of the forward end surface 11 equal to or greater than 27% of the area of a circle having a diameter equal to the average outer diameter, the outer diameter of the taper surface 12 can be made sufficiently large, whereby a satisfactory heat radiation performance can be secured.