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    • 21. 发明公开
    • GAS BARRIER FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
    • GASSPERRFILM UND VERFAHREN ZUR HERSTELLUNG DES GASSPERRFILMS
    • EP2777930A1
    • 2014-09-17
    • EP12847937.5
    • 2012-10-12
    • Lintec Corporation
    • NAGANAWA SatoshiSUZUKI Yuta
    • B32B9/00C23C14/48
    • C23C14/48C01B21/0823C08J7/047C08J7/123C08J2367/02C08J2483/16C23C14/0676Y10T428/265
    • A gas barrier film having excellent gas barrier properties, and a method for producing such a gas barrier film are provided.
      Disclosed are a gas barrier film obtained by forming a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer contains at least oxygen atoms, silicon atoms and nitrogen atoms, and in connection with the amount of nitrogen, the amount of silicon and the amount of oxygen measured by an XPS analysis, when the surface of the gas barrier layer that is in contact with the base material is designated as a base material side, and the opposite surface is designated as a surface side, the gas barrier layer includes a first region constituted in the order of the amount of oxygen > the amount of silicon > the amount of nitrogen; a second region constituted in the order of the amount of silicon > the amount of oxygen > the amount of nitrogen; and a third region constituted in the order of the amount of oxygen > the amount of silicon > the amount of nitrogen, from the surface side toward the base material side.
    • 提供阻气性优异的阻气膜及其制造方法。 公开了通过在基材上形成阻气层而获得的阻气膜,以及其中气体阻隔层至少含有氧原子,硅原子和氮原子并且在连接中的阻气膜的制造方法 当与基材接触的阻气层的表面被指定为基材侧时,通过XPS分析测量的氮的量,硅的量和氧的量被测定,并且相对表面是 指定为表面侧,阻气层包括以氧的量>硅的量>氮的量的顺序构成的第一区域; 以硅的量>氧的量>氮的量的顺序构成的第二区域; 以及从表面侧朝向基材侧的氧的量>硅的量>氮的量的顺序构成的第三区域。