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    • 11. 发明授权
    • POINT PROJECTION PHOTOELECTRON MICROSCOPE WITH HOLLOW NEEDLE
    • PUNKTPROJEKTIONS-PHOTO电子显微镜MIT HOHLNADEL
    • EP0322419B1
    • 1996-10-30
    • EP87906273.5
    • 1987-09-09
    • HIRSCH, Gregory
    • HIRSCH, Gregory
    • G01N23/00G03G13/00G03G15/00G21K7/00
    • H01J37/285G01N23/2273
    • A point projection photoelectron microscope. A specimen is enclosed in a photoconductor (N) that is subject to the photoelectric effect. The specimen is positioned on a pedestal in an evacuated chamber (C). The specimen is bombarded by radiation, either of light, ultraviolet radiation, or soft X-rays (S). The photoconductor is in a vacuum chamber and it is highly charged with a negative potential. The vacuum chamber includes a surface sensitive to electron flow (P) for making an image (I). This surface is a phosphor screen or an image intensifier having the capability to be gated for imaging or not imaging incident electrons or a segmented electron collecting anode for electronic imaging. In operation, a collimated beam of radiation, ranging from light to soft x-rays is projected through a specimen disposed in the photoconductor. An image of the specimen is produced on the photoconductor. The light or X-ray which impact on the photoconductor which produce electrons by the photoelectric effect. The electrons migrate beyond the photoconductor where the electric field at the tip of the photoconductor radially repels the electrons to an towards the imaging surface, typically the image intensifier.