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    • 12. 发明公开
    • Method of monitoring constituents in plating baths
    • Verfahren zur Feststellung von Bestandteilen在Plattierungsbädern。
    • EP0598380A2
    • 1994-05-25
    • EP93118488.1
    • 1993-11-16
    • Hughes Aircraft Company
    • Ludwig, Frank A.Eliash, Bruce M.Phan, Nguyet H.Reddy, Vilambi NRK
    • G01N27/49
    • G01N27/49
    • A method of monitoring a plating bath which combines ac and dc voltammetry to accurately measure major and trace constituent concentrations. The method involves applying both ac and dc voltammetric signals to a pretreated electrode in contact with the plating bath solution, measuring the ac and dc response current spectra, and comparing the resultant spectra to determine which provides maximum spectral detail for monitoring particular constituents with minimum interference from other constituents. Then, the ac and dc response current spectra are each used to monitor the particular constituents for which each provides the best accuracy. The method complements and is easily integrated with known voltammetric techniques and equipment.
    • 一种监测电镀浴的方法,其结合了交流和直流伏安法以精确测量主要和痕量成分浓度。 该方法包括将ac和dc伏安信号应用于与电镀浴溶液接触的预处理电极,测量ac和dc响应电流光谱,并比较得到的光谱,以确定哪个提供用于以最小干扰监测特定成分的最大光谱细节 来自其他成分。 然后,交流和直流响应电流谱分别用于监测各自提供最佳精度的特定成分。 该方法补充并易于与已知的伏安技术和设备集成。
    • 13. 发明公开
    • Method of selectively monitoring trace constituents in plating baths
    • 在Plattierungsbädern的Verfahren zur selektivenÜberwachungvon Spurenbestandteilen。
    • EP0597474A1
    • 1994-05-18
    • EP93118295.0
    • 1993-11-11
    • Hughes Aircraft Company
    • Eliash, Bruce M.
    • G01N27/42
    • G01N27/42
    • A method of selectively monitoring particular trace constituents within a plating bath containing multiple trace constituents. The method provides improved selectivity over known voltammetric techniques for certain plating baths and trace constituents. The method involves applying a brief voltammetric plating signal to a pretreated electrode positioned within the plating bath solution, applying a rapid stripping signal to the plated electrode, and monitoring the resultant stripping signal response current. The characteristics of the stripping signal response current indicate the particular trace constituent concentration level. The method complements and is easily integrated with known voltammetric techniques and equipment, and thus improves the efficiency and versatility of existing plating bath analysis systems.
    • 选择性地监测含有多种微量成分的电镀液中的特定微量成分的方法。 该方法提供了对于某些电镀浴和微量成分的已知伏安技术的改进的选择性。 该方法包括向位于镀浴溶液中的预处理电极施加简单的伏安电镀信号,向镀覆电极施加快速剥离信号,并监测所得汽提信号响应电流。 剥离信号响应电流的特征表明特定的痕量成分浓度水平。 该方法与已知的伏安技术和设备相辅相成并易于集成,从而提高现有电镀浴分析系统的效率和通用性。
    • 14. 发明公开
    • Method and system for monitoring quality of phosphate coating
    • Verfahren und Vorrichtung zumÜberwachenderQualitäteinesPhosphatüberzugs。
    • EP0569826A1
    • 1993-11-18
    • EP93107226.8
    • 1993-05-04
    • Hughes Aircraft Company
    • Ludwig, Frank A.Eliash, Bruce M.
    • G01N27/49G01N27/416
    • G01N17/02Y10S204/08
    • A method and system for monitoring the quality of a phosphate coating on a metal surface having a large surface area. The method comprises applying a current or potential between the metal surface and one or more counter electrodes while they are in the phosphating solution and superimposing a constant ac signal thereon. An ac impedance spectra is obtained by measuring the ac potential between the metal substrate and one or more reference electrodes located between the counter electrode and the substrate. The ac impedance spectra provide an indication of defects in the phosphate coating even when the defects are located within a relatively small region of the total surface area of the metal surface.
    • 一种用于监测具有大表面积的金属表面上的磷酸盐涂层的质量的方法和系统。 该方法包括在金属表面与一个或多个反电极同时在磷化溶液中施加电流或电位,并在其上叠加恒定的交流信号。 通过测量金属基板和位于对电极和基板之间的一个或多个参考电极之间的交流电位,获得交流阻抗谱。 即使当缺陷位于金属表面的总表面积的相对小的区域内时,交流阻抗谱也提供磷酸盐涂层中的缺陷的指示。