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    • 133. 发明公开
    • VAPOR DEPOSITION MATERIAL AND PRODUCTION METHOD THEREOF
    • 材料ZUR GASPHASENABSCHEIDUNG UND HERSTELLUNGSVERFAHREN。
    • EP0603407A1
    • 1994-06-29
    • EP93911971.5
    • 1993-05-06
    • SUMITOMO ELECTRIC INDUSTRIES, LTD
    • OISHI, YukihiroYAMAMOTO, Susumu Itami Works of Sumitomo El.Ind.MURAI, Teruyuki Itami Works of Sumitomo El.Ind.KAWABE, Nozomu
    • C22C19/07C22F1/10B21C1/00C23C14/20
    • C23C14/20C22C19/07C22F1/10C23C14/246Y10S117/90
    • A vapor deposition material is provided for the production of VTR tapes, vertical magnetic recording thin films, etc. The vapor deposition material is wire made of cobalt with unavoidable impurity, a cobalt-nickel alloy containing up to 30 wt % cobalt impurities, and the balance of unavoidable impurities, or a cobalt-chromium alloy containing up to 30 wt % chromium and the balance of unavoidable impurities. This wire has a diameter of from 1.0 mm to 10 mm, a tensile strength of 400 MPa to 1,500 MPa and elongation and contraction of at least 5 %. The vapor deposition material has a predetermined crystalline structure, and a proportion of the face-centered cubic lattice is 0.1 to 1. To obtain such properties, the material is heated to Tu °C and then subjected to plastic working at a temperature between Td °C and Tu + 200°C in such a manner that the reduction of area per pass is more than 10 %, where Tu is the transformation temperature during heating for a change from close-packed hexagonal to face-centered cubic while Td is the transformation temperature during cooling for a change from face-centered cubic to close-packed hexagonal. When the wire material is made of the cobalt metal or the cobalt-nickel alloy, 0.01 to 0.1 wt % of either one of the elements selected from the group consisting of Mn, Cr, Mg, Zr and Ca is preferably contained. When the wire material is made of the cobalt-chromium alloy, 0.01 to 0.1 wt % of either one of the elements selected from the group consisting of Mn, Mg, Zr and Ca is preferably contained.
    • 提供了用于生产VTR带,垂直磁记录薄膜等的气相沉积材料。气相沉积材料是由不可避免的杂质的钴制成的线,含有至多30重量%的钴杂质的钴镍合金, 不可避免的杂质的平衡或含有至多30重量%铬的钴铬合金和余量的不可避免的杂质。 该线材具有1.0mm至10mm的直径,400MPa至1,500MPa的拉伸强度和至少5%的伸长率和收缩率。 气相沉积材料具有预定的晶体结构,面心立方晶格的比例为0.1:1。为了获得这样的性能,将材料加热至Tu℃,然后在Td DEG之间的温度下进行塑性加工 C和Tu + 200℃,每次通过面积的减少大于10%,其中Tu是加热期间从紧密堆积的六边形到面心立方的变化的相变温度,而Td是转变 在冷却期间的温度从面心立方变为密集六边形。 当线材由钴金属或钴镍合金制成时,优选含有0.01〜0.1重量%的选自Mn,Cr,Mg,Zr和Ca中的任一种元素。 当线材由钴 - 铬合金制成时,优选含有0.01〜0.1重量%的选自Mn,Mg,Zr和Ca中的任一种元素。