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101. 发明公开

EP3172169A1 LITHIATED TRANSITION METAL OXIDES 有权转让
标题翻译：锂化过渡金属氧化物
公开(公告)号：EP3172169A1
公开(公告)日：2017-05-31
申请号：EP15825174.4
申请日：2015-07-22
申请人： Xerion Advanced Battery Corp.
发明人： ZHANG, Huigang , BUSBEE, John D. , NING, Hailong , ARPIN, Kevin A.
IPC分类号： C01G51/04 , C01G53/04
CPC分类号： H01M4/0454 , C01G45/1221 , C01G51/42 , C01G53/44 , C01P2002/54 , C01P2002/72 , C01P2002/82 , C01P2006/40 , C25D9/04 , C25D9/06 , C25D9/08 , C25D9/12 , C25D17/10 , C25D21/02 , H01M4/0404 , H01M4/131 , H01M4/133 , H01M4/1391 , H01M4/366 , H01M4/485 , H01M4/525 , H01M4/587 , H01M4/661 , H01M4/663 , H01M4/747 , H01M4/75 , H01M4/80 , H01M4/806 , H01M4/808 , H01M10/0525 , H01M2004/021 , H01M2220/30 , Y02E60/122
摘要： Process for the fabrication of an electrode structure comprising an electrochemically active material suitable for use in an energy storage device. The method includes electrodepositing the electrochemically active material onto an electrode in electrodeposition bath containing a non-aqueous electrolyte. The electrode structure can be used for various applications such as electrochemical energy storage devices including high power and high-energy lithium-ion batteries.
摘要翻译：用于制造包含适用于能量存储装置的电化学活性材料的电极结构的方法。该方法包括将电化学活性材料电沉积到含有非水电解质的电沉积浴中的电极上。电极结构可用于各种应用，例如包括高功率和高能量锂离子电池的电化学储能装置。

102. 发明公开

EP3149222A1 PLATING OR COATING METHOD FOR PRODUCING METAL-CERAMIC COATING ON A SUBSTRATE 审中-公开
标题翻译：镀层或涂层工艺用于生产金属陶瓷涂层在基底上
公开(公告)号：EP3149222A1
公开(公告)日：2017-04-05
申请号：EP15798809.8
申请日：2015-05-26
申请人： Auckland Uniservices Limited , Hu, Bo , Xiong, Chao
发明人： HU, Bo , XIONG, Chao , GAO, Wei , WANG, Yuxin , SHU, Xin , WEI, Shanghai , GHAZIOF, Soroor , TAY, See Leng , JU, Ying , SHARIFI, Marzieh , GOODE, Christopher W. , SLATER, Glen
IPC分类号： C23C18/16 , C25D21/10 , C25D15/02 , C25D21/14 , C25D13/10 , C25D21/02 , C25D1/00 , C25D5/00
CPC分类号： C25D15/00 , C23C18/1662 , C23C18/1669 , C23C18/1675 , C23C18/1676 , C23C18/34 , C23C18/36 , C25D3/46 , C25D3/56 , C25D3/562 , C25D3/565 , C25D3/62 , C25D21/02 , C25D21/10 , C25D21/12
摘要： N comprises adding a sol of a ceramic phase to a plating solution or electrolyte and controlling the pH, degree of mixing, and/or temperature of the plating solution or electrolyte. An item or surface comprising a substrate and a metal-ceramic composite coating on the substrate, the metal-ceramic composite coating comprising a ceramic phase of dispersed amorphous ceramic particles having an average diameter of from 1 to 100 nm is also provided.
摘要翻译： N包括添加的陶瓷相，以电镀液或电解质的溶胶和控制pH，混合的程度，和/或电镀溶液或电解液的温度。包括衬底和在衬底上的金属 - 陶瓷复合涂层的物品或表面，金属 - 陶瓷复合物涂层，其包括具有从1至100纳米的平均直径分散的无定形陶瓷颗粒构成的陶瓷相因此提供。

103. 发明授权

EP2462260B1 VERFAHREN ZUR HERSTELLUNG STRUKTURIERTER CHROMSCHICHTEN 有权
标题翻译：用于生产结构化铬LAYERS
公开(公告)号：EP2462260B1
公开(公告)日：2016-04-20
申请号：EP10740123.4
申请日：2010-07-28
申请人： Technische Universität Wien , Kronberger, Hermann , Wolf, Günter , Schubert, Martin
发明人： KRONBERGER, Hermann , WOLF, Günter , SCHUBERT, Martin
IPC分类号： C25D3/08 , C25D5/00 , C25D3/04 , C25D21/02
CPC分类号： C25D3/04 , C25D3/08 , C25D5/003 , C25D5/02 , C25D21/02 , C25D21/12

104. 发明公开

EP2606163A4 NICKEL pH ADJUSTMENT METHOD AND APPARATUS 有权转让
标题翻译：方法和装置用于调整镍的pH
公开(公告)号：EP2606163A4
公开(公告)日：2015-10-07
申请号：EP11818522
申请日：2011-07-21
申请人： MACDERMID INC , CHEMTECH SYSTEMS INC
发明人： HAYES ALLEN R , SWANSON STEVEN L
IPC分类号： C25C1/08 , C25C1/00 , C25D21/02 , C25D21/14 , C25D21/18
CPC分类号： C25D21/18 , C25D17/10 , C25D21/02 , C25D21/12 , C25D21/14
摘要： An electrolytic cell for adjusting pH and replenishing nickel in a nickel plating solution of a nickel plating bath and a method of using the same is disclosed. The electrolytic cell comprises an inlet for receiving nickel plating solution from the nickel plating bath; a cooled cathode connected to a first bus bar connected to a negative terminal of a power supply; a plurality of nickel anodes capable of creating hydrogen gas on the cooled cathode when current is applied, connected to at least a second bus bar, the at least the second bus bar connected to a positive terminal of the power supply; and an outlet for returning nickel plating solution in the electrolytic cell to the nickel plating bath.

105. 发明公开

EP2623646A4 APPARATUS FOR PLATING CYLINDER 审中-公开
标题翻译： DEVICE电镀缸
公开(公告)号：EP2623646A4
公开(公告)日：2015-09-23
申请号：EP11829066
申请日：2011-09-27
申请人： THINK LABS KK
发明人： SHIGETA TATSUO
IPC分类号： C25D17/06 , C25D7/04 , C25D17/00 , C25D17/10 , C25D21/02
CPC分类号： C25D21/02 , C25D7/04 , C25D17/005 , C25D17/06 , C25D17/10

106. 发明公开

EP2864527A2 GALVANOANLAGE MIT MEHREREN BÄDERN UND MINDESTENS EINER EINHAUSUNG 有权
标题翻译： AL AGE UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG UNG
公开(公告)号：EP2864527A2
公开(公告)日：2015-04-29
申请号：EP13728395.8
申请日：2013-06-13
申请人： AUCOS AG
发明人： FREUND, Robert
IPC分类号： C25D17/06 , C25D21/02 , C25D21/04 , C25D17/00 , B08B15/02
CPC分类号： C25D17/00 , B08B15/02 , C25D17/06 , C25D21/02 , C25D21/04
摘要： The galvanization plant has a plurality of baths (22, 24, 26), at least one goods carrier (28) for accommodating goods (30) to be treated, and a transporting device (36) for transporting the at least one goods carrier (28) to the individual baths (22, 24, 26). The transporting device (36) has at least one lifting transport carriage (40). A releasable coupling device (44) is provided, which is arranged between the lifting transport carriage (40) and the goods carrier (28). The lifting transport carriage (40) has a housing (34), which covers a bath (22), is hood-shaped, and is open only at the bottom. Said housing (34) has a fan (48) and an air purifier (52).
摘要翻译：镀锌厂具有多个浴室（22,24,26），至少一个用于容纳要处理的货物（30）的货物承载件（28）和用于运输至少一个货物承运人的运输装置（36） 28）到各个浴室（22,24,26）。运送装置（36）具有至少一个提升运输托架（40）。提供了一种可释放的联接装置（44），其布置在提升运输托架（40）和货物托架（28）之间。提升运输托架（40）具有覆盖浴（22）的壳体（34），罩盖形状，仅在底部开口。所述壳体（34）具有风扇（48）和空气净化器（52）。

107. 发明授权

EP2611950B1 PROCESS FOR ELECTRODEPOSITION OF COPPER CHIP TO CHIP CHIP TO WAFER AND WAFER TO WAFER INTERCONNECTS IN THROUGH-SILICON VIAS (TSV), WITH HEATED SUBSTRATE AND COOLED ELECTROLYTE 有权
标题翻译：将铜片电沉积至芯片至晶片和晶片的电沉积工艺，以在硅通孔硅（TSV）中与加热衬底和冷却电解液中的晶片交互
公开(公告)号：EP2611950B1
公开(公告)日：2013-11-13
申请号：EP11760829.9
申请日：2011-07-08
申请人： Atotech Deutschland GmbH
发明人： PREISSER, Robert, F.
IPC分类号： C25D3/38 , C25D5/00 , C25D21/02 , C25D7/12 , C25D17/00 , H01L21/768 , H01L21/288
CPC分类号： C25D3/38 , C25D5/00 , C25D7/123 , C25D17/001 , C25D21/02 , H01L21/2885 , H01L21/76898 , H01L25/50 , H01L2224/131 , H01L2224/16145 , H01L2224/16225 , H01L2224/73204 , H01L2225/06513 , H01L2225/06541 , H01L2924/1461 , H01L2224/32225 , H01L2924/00012 , H01L2224/32145 , H01L2924/00 , H01L2924/014
摘要： Process of electrodepositing a metal in a high aspect ratio via in a silicon substrate to form a through-silicon-via (TSV), utilizing an electrolytic bath including a redox mediator, in an electrolytic metal plating system including a chuck adapted to hold the silicon substrate and to heat the silicon substrate to a first temperature, a temperature control device to maintain temperature of the electrolytic bath at a second temperature, in which the first temperature is maintained in a range from about 30° C. to about 60° C. and the second temperature is maintained at a temperature (a) at least 5° C. lower than the first temperature and (b) in a range from about 15° C. to about 35° C.
摘要翻译：在电解金属电镀系统中，利用包括氧化还原介体的电解浴，在硅衬底中以高纵横比通孔电沉积金属以形成硅通孔（TSV）的工艺，所述电解金属电镀系统包括适于保持硅并将硅衬底加热到第一温度;温度控制装置，将电解槽的温度保持在第二温度，其中第一温度保持在约30℃至约60℃的范围内并且第二温度保持在比第一温度低至少5℃的温度（a）和（b）在约15℃至约35℃的范围内

108. 发明公开

EP2652178A2 ELECTROCHEMICAL DEPOSITION APPARATUS 有权转让
标题翻译： GALVANISIERUNGSVORRICHTUNG
公开(公告)号：EP2652178A2
公开(公告)日：2013-10-23
申请号：EP11805143.2
申请日：2011-12-08
申请人： Picofluidics Limited
发明人： MACNEIL, John
IPC分类号： C25D5/10 , C25D5/18 , C25D5/02 , C25D17/00 , C25D5/20 , C25D21/02
CPC分类号： C25D17/001 , C25D5/022 , C25D5/08 , C25D5/18 , C25D7/123 , C25D17/004 , C25D17/02 , C25D21/02 , C25D21/18
摘要： This invention relates to apparatus for electrochemical deposition onto the surface of a substrate. The apparatus includes an anode electrode 13 a support 12 for supporting the substrate 11 with its one surface 21 exposed at a location, the support 12 and the anode electrode 13 being relatively movable to alter the gap between the anode 13 and the location to define a chamber 23 between them and an electrical power source 18 with an ohmic contact to the seed layer 20 for creating a potential difference across the gap. The apparatus further includes a seal 14 for sealing with the seed layer 20 to define the fluid chamber 23; and the fluid inlet 16 and a fluid outlet 17 to the chamber 13.
摘要翻译：本发明涉及用于电化学沉积到衬底表面上的装置。该装置包括阳极电极13，支撑体12用于支撑基板11，其一个表面21暴露在一个位置处，支撑件和阳极电极13可相对移动以改变阳极13与位置之间的间隙，以限定一个室在它们之间和与种子层20的欧姆接触的电源18之间形成跨越间隙的电位差。该装置还包括用于密封种子层20以限定流体室23的密封件14; 流感入口16和流体出口17连接到腔室13。

109. 发明公开

EP2534720A1 LITHIUM-ION BATTERIES WITH NANOSTRUCTURED ELECTRODES AND ASSOCIATED METHODS OF MAKING 有权
标题翻译： LITHIUMIONENBATTERIEN MIT NANOSTRUKTURIERTEN ELEKTRODEN SOWIE HERSTELLUNGSVERFAHRENDAFÜR
公开(公告)号：EP2534720A1
公开(公告)日：2012-12-19
申请号：EP11742898.7
申请日：2011-02-11
申请人： Washington State University Researchfoundation
发明人： NORTON, M., Grant , SAHAYM, Uttara
IPC分类号： H01M4/78
CPC分类号： H01M4/0452 , C25D3/30 , C25D5/18 , C25D5/34 , C25D7/0614 , C25D21/02 , C25D21/10 , C25D21/12 , C25D21/14 , H01M4/0461 , H01M4/134 , H01M4/1395 , H01M4/387 , H01M4/661 , H01M4/75 , H01M4/80 , H01M10/0525 , H01M2004/027 , Y02E60/122
摘要： Several embodiments related to lithium-ion batteries having electrodes with nanostructures, compositions of such nanostructures, and associated methods of making such electrodes are disclosed herein. In one embodiment, a method for producing an anode suitable for a lithium-ion battery comprising preparing a surface of a substrate material and forming a plurality of conductive nanostructures on the surface of the substrate material via electrodeposition without using a template.
摘要翻译：本文公开了与具有纳米结构电极的锂离子电池，这种纳米结构的组成以及制造这种电极的相关方法相关的几个实施方案。在一个实施方案中，一种用于生产适用于锂离子电池的阳极的方法，包括通过电沉积而不使用模板来制备衬底材料的表面并在衬底材料的表面上形成多个导电纳米结构。

110. 发明公开

EP2507414A1 VORRICHTUNG UND VERFAHREN ZUM ELEKTRISCHEN KONTAKTIEREN VON BEHANDLUNGSGUT IN GALVANISIERANLAGEN 审中-公开
标题翻译：用于电接触设备和方法镀锌处理
公开(公告)号：EP2507414A1
公开(公告)日：2012-10-10
申请号：EP10808969.9
申请日：2010-12-01
申请人： Somont GmbH
发明人： HÜBEL, Egon
IPC分类号： C25D7/06 , C25D17/02 , C25D17/10 , C25D21/02
CPC分类号： C25D7/0657 , C25D17/02 , C25D17/10 , C25D21/02
摘要： The invention relates to the electrical contacting of band-shaped or plate-shaped material (1), which can be conveyed through an electroplating system on a transport track. The cathodically polarized contact means (6) are located, for example, on the underside of the material (1) in the electrolyte (12), which is circulated in the electroplating system. The material is electrically contacted in order to transfer current to the material (1). In the prior art, the contact means (6) are metal-coated in addition to the material (1). Said metal coating must be continuously removed from the contacts. According to the invention, each for example tubular contact means (6) is cooled by means of a cooling unit or a cooling medium. No metal is deposited on the cooled surface of the contact means (6) if the temperature difference between the working temperature of the electrolyte (12) and the surface temperature of the contact means (6) is sufficiently large. This property can be supplemented with a surface of the contact means (6) that cannot be cathodically metal-coated in the electrolyte (12) used.

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