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    • 1. 发明公开
    • RESISTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 电阻器装置及其制造方法
    • EP3282455A1
    • 2018-02-14
    • EP16183502.0
    • 2016-08-10
    • Walsin Technology Corporation
    • Wang, Kao-YuanChuang, Nai-ChuanWei, Shih-Long
    • H01C17/24H01C1/148
    • H01C17/24H01C1/148H01C17/006H01C17/281
    • The present invention provides a wafer resistor device and a manufacturing method thereof. The manufacturing method of the wafer resistor device comprises the following steps: a first cutting step of magnetically attracting a magnetic metal contact of the wafer resistor device to cut a resistive layer for a first time; a second step of magnetically attracting the magnetic metal contact of the wafer resistor device to cut the resistive layer for a second time. Through the above steps, each wafer resistor device is heading in the same direction during the cutting steps to allow the cutting marks to appear in the same position on each wafer resistor device to reduce the amount of variation of the resistance value of each resistor due to the cutting steps.
    • 本发明提供一种晶圆电阻器装置及其制造方法。 晶片电阻装置的制造方法包括以下步骤:第一切割步骤,磁性吸引晶圆电阻装置的磁性金属接点,以第一次切割电阻层; 第二步骤,磁性吸引晶片电阻器装置的磁性金属触点以第二次切割电阻层。 通过上述步骤,每个晶片电阻器件在切割步骤期间以相同的方向前进,以允许切割标记出现在每个晶片电阻器件上的相同位置,以减少每个电阻器的电阻值的变化量,这是由于 切割步骤。