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1. 发明授权

US06268700B1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil 失效
标题翻译：具有中间部分的线圈的真空等离子体处理器将等离子体的磁通密度降低到线圈的中心部分和周边部分
公开(公告)号：US06268700B1
公开(公告)日：2001-07-31
申请号：US08931503
申请日：1997-09-16
申请人： John Patrick Holland , Alex Demos
发明人： John Patrick Holland , Alex Demos
IPC分类号： H31J724
CPC分类号： H01J37/321
摘要： A vacuum plasma processor for treating a workpiece with an RF plasma has a plasma excitation coil including interior, intermediate and peripheral portions. The interior and peripheral portions have turns connected to each other and arranged so the magnetic flux density coupled to the plasma by each of the interior and peripheral coil portions exceeds the magnetic flux density coupled to the plasma by the intermediate coil portion. The coil includes two electrically parallel, spiral like windings, each with an interior terminal connected to one output terminal of a matching network and an output terminal connected via a capacitor to another output terminal of the matching network. The capacitor values and the lengths of the windings relative to the plasma RF excitation wavelength are such that current flowing in the coil has maximum and minimum standing wave values in the peripheral and interior coil portions, respectively. The coil and workpiece peripheries have similar rectangular dimensions and geometries.
摘要翻译：用于用RF等离子体处理工件的真空等离子体处理器具有包括内部，中间和周边部分的等离子体激励线圈。内部和外围部分具有彼此连接并且布置成通过内部和外部线圈部分中的每一个耦合到等离子体的磁通密度超过通过中间线圈部分耦合到等离子体的磁通密度。线圈包括两个电平行的螺旋状绕组，每个具有连接到匹配网络的一个输出端子的内部端子和经由电容器连接到匹配网络的另一个输出端子的输出端子。绕组相对于等离子体RF激发波长的电容器值和长度使得在线圈中流动的电流分别在周边和内部线圈部分中具有最大和最小的驻波值。线圈和工件外围具有类似的矩形尺寸和几何形状。

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