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1. 发明授权

US06624426B2 Split magnetic lens for controlling a charged particle beam 失效
公开(公告)号：US06624426B2
公开(公告)日：2003-09-23
申请号：US09734409
申请日：2000-12-11
申请人： Allan I. Rubin
发明人： Allan I. Rubin
IPC分类号： H01J3714
CPC分类号： G21K1/093 , H01J37/14 , H01J2237/1501
摘要： A magnetic lens focuses a charged particle beam generated by an instrument to a very small spot for deriving characteristics of a sample. The magnetic flux pattern is created by splitting the winding coil into a primary coil and a secondary coil. This enables faster adjustment of the magnetic flux, and with improved resolution.

2. 发明授权

US06784437B2 Corrector for correcting first-order chromatic aberrations of the first degree 有权
标题翻译：用于校正第一度的一阶色差的校正器
公开(公告)号：US06784437B2
公开(公告)日：2004-08-31
申请号：US10309262
申请日：2002-12-04
申请人： Harald Rose
发明人： Harald Rose
IPC分类号： H01J3714
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/153 , H01J37/3174 , H01J2237/1534 , H01J2237/3175 , H01J2237/31754
摘要： The invention is directed to a corrector for correcting energy-dependent first-order aberrations of the first degree as well as third-order spherical aberrations of electron-optical lens systems. The corrector includes at least one quadropole septuplet (S1) having seven quadrupoles (Q1 to Q7). The quadrupoles are mounted symmetrically to a center plane (ZS) so as to permit excitation along a linear axis. The corrector furthermore includes at least five octopoles (O1 to O7) which can be excited within the quadrupole septuplet. In an advantageous embodiment, two quadrupole septuplets are mounted in series one behind the other. The quadrupole fields of the two quadrupole septuplets are excited antisymmetrically to a center plane lying between the two quadrupole septuplets. With such a system, all geometric third-order aberrations and additional energy-dependent first-order aberrations of the third degree and geometric fifth-order aberrations of a lens system can be corrected in addition to the axial and off-axial first-order chromatic aberrations of the first degree.
摘要翻译：本发明涉及用于校正电子 - 光学透镜系统的第一度以及三阶球面像差的能量相关一阶像差的校正器。校正器包括至少一个具有七个四极管（Q1至Q7）的四极簧片（S1）。四极杆对称地安装在中心平面（ZS）上，以便沿线性轴线激发。校正器还包括至少五个八极管（O1至O7），其可以在四极六通孔内被激发。在一个有利的实施例中，两个四极簧片串联地一个接一个地安装。两个四极七分体的四极场与位于两个四极六分体之间的中心平面反对称地被激发。利用这样的系统，除了轴向和轴向外的一阶色度之外，可以校正透镜系统的第三度和第五级像差的所有几何三阶像差和附加的依赖于能量的一阶像差第一度的畸变。

3. 发明授权

US06635881B2 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same 失效
标题翻译：具有减小的模糊和几何失真的带电粒子束投影透镜系统，以及包括其的微光刻设备
公开(公告)号：US06635881B2
公开(公告)日：2003-10-21
申请号：US09843592
申请日：2001-04-26
申请人： Atsushi Yamada , Hiroyasu Simizu , Koichi Kamijo
发明人： Atsushi Yamada , Hiroyasu Simizu , Koichi Kamijo
IPC分类号： H01J3714
CPC分类号： G21K1/093
摘要： Charged-particle-beam (CPB) optical systems (especially projection-lens systems for use in CPB microlithography apparatus) are disclosed that exhibit excellent control of geometric aberration and the Coulomb effect while exhibiting low combined aberration and blur. As the column length of the projection-lens system is increased, geometric aberration is reduced but the Coulomb effect increases, which degrades overall optical characteristics. Conversely, as the column length is decreased, the Coulomb effect is reduced but geometric aberration increases, which degrades overall optical characteristics. Hence, the projection-lens system, exhibiting a magnification of 1/M and having a column length (distance in mm between reticle and wafer) of 250×M0.63±10% (wherein 0
摘要翻译：公开了带电粒子束（CPB）光学系统（特别是用于CPB微光刻设备的投影透镜系统），其表现出优异的几何像差控制和库仑效应，同时呈现低的组合像差和模糊。随着投影透镜系统的列长度增加，几何像差减小，但是库仑效应增加，这降低了总的光学特性。相反，当柱长度减小时，库仑效应降低，但是几何像差增加，这降低了整体光学特性。因此，投影透镜系统的倍率为1 / M，并且具有250xM <0.63>±10％（其中0

4. 发明授权

US06218675B1 Charged particle beam irradiation apparatus 有权
标题翻译：带电粒子束照射装置
公开(公告)号：US06218675B1
公开(公告)日：2001-04-17
申请号：US09136308
申请日：1998-08-19
申请人： Hiroshi Akiyama , Kazuo Hiramoto , Koji Matsuda , Tetsuro Norimine
发明人： Hiroshi Akiyama , Kazuo Hiramoto , Koji Matsuda , Tetsuro Norimine
IPC分类号： H01J3714
CPC分类号： H01J37/147 , A61N5/1043 , A61N2005/1087 , G21K5/04
摘要： A charged particle beam irradiation apparatus for irradiating a target with a charged particle beam emitted from an accelerator includes a plurality of scanning electromagnets, and a quadrupole electromagnet is used between two of the plurality of the scanning electromagnets.
摘要翻译：用于从加速器发射的带电粒子束照射靶的带电粒子束照射装置包括多个扫描电磁体，并且在多个扫描电磁体中的两个之间使用四极电磁体。

5. 发明授权

US06624412B2 Energy filter 失效
公开(公告)号：US06624412B2
公开(公告)日：2003-09-23
申请号：US09897767
申请日：2001-07-02
申请人： Michiyoshi Tanaka , Masami Terauchi , Kenji Tsuda , Katsushige Tsuno , Toshikazu Honda
发明人： Michiyoshi Tanaka , Masami Terauchi , Kenji Tsuda , Katsushige Tsuno , Toshikazu Honda
IPC分类号： H01J3714
CPC分类号： G21K1/093
摘要： An omega energy filter capable of increasing energy dispersion while canceling out second-order aberrations. The energy filter is mirror-symmetric with respect to the center plane C. A beam enters a first nonuniform magnetic field produced by a first magnet, then enters a second nonuniform magnetic field region produced by a second magnet. The trajectory of the beam is curved by the field produced by the second magnet. Finally, the beam enters a third magnetic field region produced by the first magnet. The beam is deflected in this region and reaches an exit slit.

6. 发明授权

US06414319B1 Electron optical lens system with a slot-shaped aperture cross section 有权
标题翻译：具有槽形孔径横截面的电子光学透镜系统
公开(公告)号：US06414319B1
公开(公告)日：2002-07-02
申请号：US09242431
申请日：1999-03-29
申请人： Rainer Spehr
发明人： Rainer Spehr
IPC分类号： H01J3714
CPC分类号： H01J37/145
摘要： This invention concerns a lens system, particularly for focusing electrons, with a cylindrical lens with pole shoes or electrodes, between which an aperture is located. This aperture has a slot-shaped cross section perpendicular to the optical axis of the lens. The cylindrical lens (4) is combined with a magnetic lens (1) with which a quadripole field can be produced. The lenses are arranged with little or no distance between them and their optical axes run parallel to one another. The quadripole lens (1) has a slot-shaped aperture (10) which is oriented parallel to the opening (9-11) of the cylindrical lens (4). The focusing plane of the quadripole lens (1), which comprises the optical axis (19), is oriented parallel to the longitudinal axes of the apertures (9-11) and its defocusing plane perpendicular to the longitudinal axes. The refractive power of the cylindrical lens (4) can be set at twice that of the quadripole lens (1).
摘要翻译：本发明涉及一种透镜系统，特别是用于将电子聚焦在具有极靴或电极的圆柱形透镜上，孔之间位于其间。该孔具有垂直于透镜的光轴的槽形截面。柱面透镜（4）与可以产生四极场的磁性透镜（1）组合。这些透镜被布置成它们之间很少或没有距离，并且它们的光轴彼此平行地延伸。四极透镜（1）具有平行于柱面透镜（4）的开口（9-11）定向的槽形孔（10）。包括光轴（19）的四极透镜（1）的聚焦平面平行于孔（9-11）的纵向轴线和垂直于纵轴的其散焦平面定向。柱面透镜（4）的屈光力可以设定为四极透镜（1）的屈光度的两倍。

7. 发明授权

US06180947B2 Multi-element deflection aberration correction for electron beam lithography 有权
标题翻译：用于电子束光刻的多元素偏转像差校正
公开(公告)号：US06180947B2
公开(公告)日：2001-01-30
申请号：US09131113
申请日：1998-08-07
申请人： Werner Stickel , Michael S. Gordon , Hans C. Pfeiffer , Steven D. Golladay
发明人： Werner Stickel , Michael S. Gordon , Hans C. Pfeiffer , Steven D. Golladay
IPC分类号： H01J3714
CPC分类号： H01J37/153 , H01J37/304 , H01J2237/3045 , H01J2237/3175
摘要： A method of optimizing locations of correction elements of a charged particle beam system determines respective corrector element currents to achieve optimum correction as a function of individual corrector location. Substantially complete dynamic correction of FSD and SFD can be obtained consistent with efficiency of operation and minimization of deflection distortion. In particular, FSD and SFD corrections can be sufficiently separated for substantially complete correction of SFD and FSD simultaneously with two stigmators. Both of these types of correction can be provided in complex charged particle beam systems employing curvilinear axis (CVA) particle trajectories and or large area reduction projection optics (LARPO) which cause complex hybrid aberrations in order to achieve high throughput consistent with extremely high resolution supporting one-tenth micron minimum feature size lithography regimes and smaller.
摘要翻译：优化带电粒子束系统的校正元件的位置的方法确定各个校正元件电流，以实现作为单独校正器位置的函数的最佳校正。可以根据操作效率和偏转失真最小化，实现FSD和SFD的基本完整的动态校正。特别地，FSD和SFD校正可以被充分地分离，以便与两个施放器同时进行SFD和FSD的基本上完全的校正。这些类型的校正可以在使用曲线轴（CVA）粒子轨迹和或大面积减小投影光学（LARPO）的复杂带电粒子束系统中提供，其导致复杂的混合像差，以实现与极高分辨率支持一致的高通量十分之一微米的最小特征尺寸光刻方案和更小。

8. 发明授权

US06768117B1 Immersion lens with magnetic shield for charged particle beam system 失效
标题翻译：浸没式透镜带磁屏蔽带电粒子束系统
公开(公告)号：US06768117B1
公开(公告)日：2004-07-27
申请号：US09625284
申请日：2000-07-25
申请人： Lee H. Veneklasen , William J. DeVore
发明人： Lee H. Veneklasen , William J. DeVore
IPC分类号： H01J3714
CPC分类号： H01J37/141 , H01J2237/1035 , H01J2237/3175
摘要： An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically conductive components of the system downstream from the shield. The surface of the shield lies parallel or approximately parallel to a magnetic equipotential surface of the focusing magnetic field so that the shield does not affect the focusing magnetic field. The shield is, e.g., a ferrite disk or a hollow ferrite cone defining a central bore for passage of the charged particle beam.
摘要翻译：用于带电粒子束光刻系统的浸没透镜包括磁浮屏蔽，其限制偏转磁场在屏蔽体下游的系统的导电部件中产生涡流。屏蔽表面平行或近似平行于聚焦磁场的磁等势面，使屏蔽不影响聚焦磁场。屏蔽是例如铁氧体磁盘或中空铁素体磁体，限定用于带电粒子束通过的中心孔。

9. 发明授权

US06600156B2 Scanning electron microscope 有权
公开(公告)号：US06600156B2
公开(公告)日：2003-07-29
申请号：US09917285
申请日：2001-07-27
申请人： Hiroyoshi Kazumori
发明人： Hiroyoshi Kazumori
IPC分类号： H01J3714
CPC分类号： G01N23/04 , H01J37/141 , H01J37/28 , H01J2237/244
摘要： A scanning electron microscope comprises: an electron gun for emitting an electron beam; a system of condenser lenses; scanning coils; and an objective lens having inner and outer magnetic polepieces to form a magnetic field lens below the lower ends of the polepieces. The inner and outer polepieces are provided with mutually communicating bores via which the backscattered electron detector can be withdrawably inserted into the electron beam path within the objective lens.

10. 发明授权

US06191423B1 Correction device for correcting the spherical aberration in particle-optical apparatus 有权
标题翻译：用于校正粒子光学装置中的球面像差的校正装置
公开(公告)号：US06191423B1
公开(公告)日：2001-02-20
申请号：US09209969
申请日：1998-12-10
申请人： Marcellinus P. C. M. Krijn , Karel Diederick Van Der Mast
发明人： Marcellinus P. C. M. Krijn , Karel Diederick Van Der Mast
IPC分类号： H01J3714
CPC分类号： H01J37/153
摘要： Electron-optical rotationally symmetrical lenses inevitably suffer from spherical aberration which often imposes a limit on the resolution. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution nevertheless, it has already been proposed to correct the spherical aberration by means of a correction device provided with two hexapoles (24, 26) and two rotationally symmetrical transmission lens systems (28, 30). Each transmission lens system in the known correction device consists of two lenses. According to the invention, one or both transmission lens systems can be replaced by a single lens without reducing the corrective capacity (when only one system 30 is replaced) or while reducing it only slightly (when both systems 28, 30 are replaced).
摘要翻译：电子光学旋转对称透镜不可避免地遭受球面像差，这通常对分辨率造成限制。这种透镜缺陷不能通过旋转对称场的补偿来消除。为了提高分辨率，已经提出通过设置有两个六极（24,26）和两个旋转对称透射透镜系统（28,30）的校正装置来校正球面像差。已知校正装置中的每个透镜系统由两个透镜组成。根据本发明，一个或两个传输透镜系统可以由单个透镜代替，而不会降低校正能力（当仅更换一个系统30时）或者仅稍微减小（当更换两个系统28,30时）。

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