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    • 1. 发明授权
    • X-ray tube assembly with beam limiting device for reducing off-focus radiation
    • 具有用于减少离焦辐射的光束限制装置的X射线管组件
    • US06320936B1
    • 2001-11-20
    • US09449778
    • 1999-11-26
    • William P. Holland, Sr.Timothy J. HollandMatthew J. HollandMichael L. Holland
    • William P. Holland, Sr.Timothy J. HollandMatthew J. HollandMichael L. Holland
    • G21K102
    • G21K1/10G21K1/02
    • A beam limiting apparatus is provided for reducing the amount of off-focus radiation in the image-forming beam emitted from an x-ray tube assembly. The x-ray tube assembly has a housing with an x-ray port for the passage of x-rays therethrough, a mounting boss defining the x-ray port, an x-ray tube mounted within the housing and defining a glass envelope, an anode mounted within the glass envelope, and a cathode spaced relative to the anode within the glass envelope. A peripheral flange of the beam limiting apparatus is mountable to the mounting boss of the x-ray tube housing, and a radiation-absorbing body of the beam limiting apparatus projects downwardly from the peripheral flange through the x-ray port. The radiation-absorbing body is formed of an electrically nonconductive, filled epoxy resin material, and defines a base surface, an x-ray entrance aperture formed through the base surface, an x-ray exit aperture spaced relative to the x-ray entrance aperture, and an x-ray transmissive beam conduit formed between the entrance and exit apertures. An x-ray transmissive window is integrally molded with the radiation-absorbing body and extends across the beam conduit. The base surface of the radiation-absorbing body is spaced closely adjacent to the glass envelope of the x-ray tube and defines a predetermined gap therebetween. The x-ray tube housing also is molded of an electrically non-conductive, radiopaque, filled epoxy resin material, and includes a conductive outer surface formed of a conductive coating.
    • 提供了一种用于减少从X射线管组件发射的图像形成光束中的离焦辐射量的光束限制装置。 X射线管组件具有一个带X射线端口的外壳,用于通过X射线通道,一个安装凸台限定x射线端口,x射线管安装在外壳内并限定玻璃外壳, 安装在玻璃外壳内的阳极以及在玻璃封套内相对于阳极隔开的阴极。 光束限制装置的外围法兰可安装到X射线管壳体的安装凸台上,并且光束限制装置的辐射吸收体从周边凸缘通过x射线端口向下突出。 辐射吸收体由不导电的填充的环氧树脂材料形成,并且限定基底表面,穿过基底表面形成的x射线入口孔,相对于x射线入口孔间隔的X射线出射孔 以及形成在入口孔和出口孔之间的x射线透射束导管。 x射线透射窗与辐射吸收体整体模制并且横跨束导管延伸。 辐射吸收体的基面与X射线管的玻璃外壳紧密地隔开并且在它们之间形成预定的间隙。 X射线管外壳也由不导电的不透射线填充的环氧树脂材料模制,并且包括由导电涂层形成的导电外表面。
    • 3. 发明授权
    • High collection angle short wavelength radiation collimator and focusing optic
    • 高采集角度短波长辐射准直仪和聚焦光学元件
    • US06624431B1
    • 2003-09-23
    • US09621404
    • 2000-07-21
    • Richard M. FosterI. C. Edmond Turcu
    • Richard M. FosterI. C. Edmond Turcu
    • G21K102
    • G21K1/025B82Y10/00G02B27/30G03F7/70166G21K1/06
    • The present invention provides a high gain collimator producing generally uniform intensity profiles for use in lithography and other applications. A focusing optic is also provided. The collimator includes a reflector and guide channel. The guide channel preferably includes polycapillary tubes and/or microchannel plates. The polycapillary tubes are used to collimate or focus the central portion of the x-ray beam in a circular, elliptic, square, or rectangular shape. A conical, parabolic resonance reflector or grazing incidence reflector with a shape similar to the polycapillary collimator is used to increase the solid angle collected and produce a circular, square, etc. annular x-ray beam whose inside dimensions are approximately equal to the exit dimensions of the polycapillary collimator. The annular beam shape, intensity profile and collimation angle is adjusted, if necessary, by an absorber, or polycapillary tubes to provide the desired intensity profile at the exit aperture of the hybrid x-ray collimator optic. A focusing optic is obtained by placing two collimating optics end to end.
    • 本发明提供了一种高增益准直器,其产生用于光刻和其它应用的大致均匀的强度分布。 还提供聚焦光学元件。 准直器包括反射器和引导通道。 引导通道优选地包括多毛细管和/或微通道板。 多毛细管用于将X射线束的中心部分准直或聚焦成圆形,椭圆形,正方形或矩形。 使用具有类似于多毛发准直仪的形状的圆锥形抛物面共振反射器或掠入射反射器以增加所收集的立体角,并产生圆形,正方形等环形X射线束,其内部尺寸近似等于出口尺寸 的多毛细管准直仪。 如果需要,通过吸收器或多毛细管调节环形束形状,强度分布和准直角,以在混合X射线准直器光学器件的出射孔处提供期望的强度分布。 通过将两个准直光学器件端到端放置来获得聚焦光学元件。
    • 6. 发明授权
    • Method and apparatus for direct write fabrication of nanostructures
    • 用于直接制造纳米结构的方法和装置
    • US06183817B2
    • 2001-02-06
    • US09086005
    • 1998-05-27
    • Michael S. Gersonde
    • Michael S. Gersonde
    • G21K102
    • G21K5/04H01J2237/31735
    • A method and apparatus to fabricate nano-device and semiconductor device structures and features by controlling a coherent or near coherent particle beam to directly deposit, or direct write, onto a preselected deposition site of a substrate and into a predetermined shape is provided. Evanescent wave plates are optionally included to increase the order of the particle beam prior to interaction with a photonic lens. The photonic lens is holographically generated by means of a source laser and an optical lens to focus the atomic beam onto the deposition site by means of Lorenz force interaction between light fields of the photonic lens and dipole moments of the atoms of the atomic beam. The diffraction pattern of the optical lens is computer calculated to precisely form the desired photonic lens in accordance with the shape and size of the desired feature or structure to be built on the substrate and the characteristics of the atomic beam, the source laser, the shape and position of the substrate and the location of the deposition site.
    • 提供了一种通过控制相干或近似相干的粒子束来直接沉积或直接写入到基片的预选沉积位置并形成预定形状来制造纳米器件和半导体器件结构和特征的方法和装置。 任选地包括消逝波片以在与光子晶体相互作用之前增加粒子束的次序。 通过源激光器和光学透镜全息地产生光子透镜,以通过光子晶体的光场和原子束的原子的偶极矩之间的洛伦茨力相互作用将原子束聚焦到沉积位置上。 计算机计算光学透镜的衍射图,以根据要建立在基板上的期望特征或结构的形状和尺寸精确地形成期望的光子晶体,并且原子束,源激光器,形状 基板的位置和沉积位置的位置。