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    • 8. 发明专利
    • PROCESSING METHOD OF PHOTOSENSITIVE MATERIAL
    • JPS58127925A
    • 1983-07-30
    • JP1117482
    • 1982-01-27
    • FUJI PHOTO FILM CO LTD
    • HATAKEYAMA AKIRANAOI TAKASHITATSUTA SUMITAKA
    • G03C5/29G03C5/26G03C5/32
    • PURPOSE:To enhance covering power, film strength, etc. with a small amount of silver and to enable automatic development especially for X-rays by immersing a photosensitive silver halide material in a pretreating bath contg. a developing agent but causing practically no developing reaction before developing the material. CONSTITUTION:A photosensitive material having a silver halide emulsion on at least one side of a support, especially a photosensitive material for X-rays having silver halide emulsion layers on both sides of a support is exposed and pre- treated in a bath contg. a developing agent and a suitable acid added to adjust the bath to a pH at which no developing reaction is practically caused at about 10-40 deg.C for about 1 sec-15min. When the bath is adjusted to the pH, the optical maximum density of a photosensitive material coated with 12g/cm silver halide emulsion is >=0.2 after immersing the material in the bath at 35 deg.C for 60sec. The pretreated material is subjected to conventional development within 1min. Thus, an image with high Dm, high silver covering power and high film strength is obtd. using a small amount of silver.