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    • 1. 发明申请
    • Liquid crystal display device and method of manufacturing the same
    • 液晶显示装置及其制造方法
    • US20040252250A1
    • 2004-12-16
    • US10844346
    • 2004-05-13
    • LG.PHILIPS LCD CO., LTD.
    • Joon Young YangSang Min Jang
    • G02F001/136
    • G02F1/136277G02F1/13454G02F1/13624G02F1/1368
    • A liquid crystal display (LCD) device includes a substrate including a pixel region and a driving circuit region, first and second semiconductor layers within the pixel region and the driving circuit region, a gate insulating layer on the substrate, first and second gate electrodes on the gate insulating layer, and a storage capacitor electrode on the gate insulating layer within the pixel region, first conductive source and drain regions within the first semiconductor layer, second conductive source and drain regions within the second semiconductor layer, a first insulating interlayer on the substrate, a pixel electrode on the first insulating interlayer overlapping the storage capacitor electrode, a second insulating interlayer on the substrate including the pixel electrode, a plurality of contact holes exposing the pixel electrode and the first and second source and drain regions, and first and second source and drain electrodes connected with the first and second source and drain regions through the contact holes.
    • 液晶显示器(LCD)装置包括:包括像素区域和驱动电路区域的衬底;像素区域内的第一和第二半导体层;以及驱动电路区域;衬底上的栅极绝缘层;第一和第二栅极电极; 所述栅极绝缘层和所述像素区域内的栅极绝缘层上的辅助电容电极,所述第一半导体层内的第一导电源极和漏极区域,所述第二半导体层内的第二导电源极和漏极区域, 基板,与第一绝缘夹层重叠的像素电极与辅助电容电极重叠,在包括像素电极的基板上的第二绝缘中间层,暴露像素电极以及第一和第二源极和漏极区域的多个接触孔,以及第一和第 与第一和第二源极和漏极r连接的第二源极和漏极 通过接触孔穿过。
    • 4. 发明申请
    • Liquid crystal display and method of manufacturing the same
    • 液晶显示器及其制造方法
    • US20040201808A1
    • 2004-10-14
    • US10458782
    • 2003-06-11
    • AU Optronics Corp.
    • Kun-Hong ChenKuang-Chao Yeh
    • G02F001/136
    • G02F1/136227
    • A liquid crystal display (LCD) comprises an ILD layer formed on a glass substrate to cover a device made thereon. A first contact hole is formed in the ILD layer to expose partial surface of the device. An interconnecting layer is formed in the first contact hole to directly contact the device. A passivation layer is formed on the ILD layer and covers the interconnecting layer. A second contact hole is formed in the passivation layer to expose a portion of upper surface of the interconnecting layer. A planarizing film is formed on the passivation layer and covers side walls of the second contact hole completely, wherein a portion of bottom surface of the second contact hole is exposed. A pixel electrode is attached on the exposed bottom surface of the second contact hole to electrically connect to the interconnecting layer.
    • 液晶显示器(LCD)包括形成在玻璃基板上以覆盖其上形成的器件的ILD层。 在ILD层中形成第一接触孔以暴露器件的部分表面。 在第一接触孔中形成互连层直接接触器件。 钝化层形成在ILD层上并覆盖互连层。 在钝化层中形成第二接触孔以暴露互连层的上表面的一部分。 平坦化膜形成在钝化层上,并且完全覆盖第二接触孔的侧壁,其中露出第二接触孔的底表面的一部分。 像素电极附着在第二接触孔的暴露的底表面上以电连接到互连层。
    • 5. 发明申请
    • Thin film transistor array panel and manufacturing method thereof
    • 薄膜晶体管阵列面板及其制造方法
    • US20040183955A1
    • 2004-09-23
    • US10759389
    • 2004-01-16
    • SAMSUNG ELECTRONICS CO., LTD.
    • Jun-Hyung SoukJeong-Young LeeJong-Soo YoonKwon-Young ChoiBum-Ki Baek
    • G02F001/136
    • G02F1/13458G02F1/136227G02F1/136286H01L27/12H01L27/124H01L27/1288
    • A method of manufacturing a thin film transistor array panel is provided, the method includes: forming a gate line on an insulating substrate; forming a gate insulating layer; forming a semiconductor layer; forming a data conductive layer including a data line and a drain electrode; depositing a passivation layer; forming a photoresist including a first portion located on an end portion of the gate line, a second portion thicker than the first portion and located on the drain electrode, and a third portion thicker than the second portion; exposing a portion of the passivation layer under the second portion of the photoresist and a portion of the gate insulating layer under the first portion of the photoresist by etching using the photoresist as an etch mask; forming first and second contact holes exposing the drain electrode and the end portions of the gate line, respectively; and forming a pixel electrode connected to the drain electrode through the first contact hole.
    • 提供一种制造薄膜晶体管阵列面板的方法,该方法包括:在绝缘基板上形成栅极线; 形成栅极绝缘层; 形成半导体层; 形成包括数据线和漏电极的数据导电层; 沉积钝化层; 形成包括位于所述栅极线的端部的第一部分的光致抗蚀剂,比所述第一部分更厚且位于所述漏极上的第二部分,以及比所述第二部分更厚的第三部分; 通过使用光致抗蚀剂作为蚀刻掩模,将光致抗蚀剂的第二部分下的钝化层的一部分暴露在光致抗蚀剂的第一部分下方的栅绝缘层的一部分; 形成分别露出所述漏电极和所述栅极线的端部的第一和第二接触孔; 以及通过所述第一接触孔形成连接到所述漏电极的像素电极。
    • 8. 发明申请
    • Liquid crystal display
    • 液晶显示器
    • US20040141099A1
    • 2004-07-22
    • US10739195
    • 2003-12-19
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • G02F001/136
    • G02F1/1309G02F2001/136263
    • A gate line is formed on a substrate in a horizontal direction and a data repair line is formed on the same layer as the gate line in a vertical direction. The repair line is divided into two portions with respect to the gate line. A gate insulating film is formed on the gate line and the data repair line, and a data line is formed on the gate insulating film along the repair line having a smaller width than the repair line, a passivation film being deposited thereon. Contact holes are formed in the passivation film, and contact holes to expose both ends of the divided repair line are formed in the passivation film and gate insulating film. A transparent connecting pattern formed on the passivation film contacts the data line and the repair line through the contact holes. Both ends of the repair line are extended from the data line. A pixel electrode is formed on the passivation film, and the pixel electrode overlaps the edges of the repair line at a predetermined width. The repair line functions as a signal transmitting path when the data line is disconnected, and as a black matrix for blocking light-leakage. The transparent connecting pattern acts as a path when the data line is disconnected at the portion where the gate line intersects the data line.
    • 在水平方向上在基板上形成栅极线,并且在与垂直方向上的栅极线相同的层上形成数据修复线。 修理线相对于栅极线分为两部分。 在栅极线和数据修复线上形成栅极绝缘膜,并且沿着具有比修复线宽的宽度的修复线在栅极绝缘膜上形成数据线,在其上沉积钝化膜。 在钝化膜中形成接触孔,并且在钝化膜和栅极绝缘膜中形成用于露出分割的修复线的两端的接触孔。 形成在钝化膜上的透明连接图案通过接触孔接触数据线和修复线。 修复线的两端从数据线延伸。 像素电极形成在钝化膜上,像素电极以预定的宽度与修复线的边缘重叠。 当数据线断开时,修复线作为信号传输路径,并且作为用于阻止漏光的黑矩阵。 当数据线在栅极线与数据线相交的部分断开时,透明连接图案用作路径。
    • 9. 发明申请
    • Fabrication method of liquid crystal display panel
    • 液晶显示面板的制作方法
    • US20040125309A1
    • 2004-07-01
    • US10713198
    • 2003-11-17
    • Seung Hee NamMin Joo Kim
    • G02F001/136
    • G02F1/13458G02F1/1362
    • There is explained a fabrication method of a liquid crystal display panel capable of simplifying a substrate structure and a fabrication process. The fabrication method comprises the steps of: forming a thin film transistor formed at every region arranged by the intersection structure of a gate line and a data line formed on a substrate, a pixel electrode, and a substrate including a plurality of thin film transistor array substrate having a gate pad part including a gate pad connected to the gate line and a data pad part including a data pad connected to the data line; arranging a cutting-off plate on a rest region of the substrate except for the pad part; and exposing the gate pad of the pad part and the data pad protection electrode by a etching process using the cutting-off plate.
    • 已经说明了能够简化基板结构和制造工艺的液晶显示面板的制造方法。 该制造方法包括以下步骤:在形成在基板,像素电极和包括多个薄膜晶体管阵列的基板的栅极线和数据线的交叉结构布置的每个区域上形成薄膜晶体管 衬底,具有包括连接到栅极线的栅极焊盘的栅极焊盘部分和包括连接到数据线的数据焊盘的数据焊盘部分; 在所述基板的除了所述垫部之外的其余部分上设置切断板; 以及通过使用切断板的蚀刻工艺来暴露焊盘部分的栅极焊盘和数据焊盘保护电极。