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1. 发明授权

US06493964B1 Supercritical point drying apparatus for semiconductor device manufacturing and bio-medical sample processing 失效
标题翻译：用于半导体器件制造和生物医学样品处理的超临界点干燥装置
公开(公告)号：US06493964B1
公开(公告)日：2002-12-17
申请号：US09658185
申请日：2000-09-08
申请人： Anastasios J. Tousimis , Chris Tousimis
发明人： Anastasios J. Tousimis , Chris Tousimis
IPC分类号： F26B1310
CPC分类号： H01L21/67034 , G01N1/40 , G01N2001/4027
摘要： A critical point drying apparatus for sample preparation in electron microscopy and semiconductor wafer production includes a computer system to automate the operational modes in drying the specimen. These operational modes controlled by the computer system are: cooling, in which a drying chamber is cooled; starting, in which the specimen chamber is filled with a transitional fluid; purging, in which the transitional fluid purges an intermediary fluid from the drying chamber and the purged intermediary fluid is collected by a collector condenser; heating, in which the drying chamber is heated to elevate the transitional fluid to its critical point temperature and pressure; and bleeding, in which the drying chamber is depressurized to atmospheric pressure at a very slow rate until the drying chamber is completely vented, which signals the end of the drying operation. The drying chamber incorporates concave surfaces for pressure dispersal and to facilitate purging the intermediary fluid completely. The drying chamber incorporates angled inlet ports and windows that are sealed with gaskets. The drying chamber also incorporates the usage of a wafer holder, spacer rings and inserts to allow for the secure suspension of wafers being processed. Passing the cooling fluid through a closed loop refrigeration system may also cool the drying chamber.
摘要翻译：用于电子显微镜和半导体晶片生产中的样品制备的临界点干燥装置包括使干燥样品的操作模式自动化的计算机系统。由计算机系统控制的这些操作模式是：冷却，其中干燥室被冷却; 起始，其中样品室充满过渡流体; 清洗，其中过渡流体从干燥室清洗中间流体，并且被清除的中间流体由收集器冷凝器收集; 加热，其中干燥室被加热以将过渡流体升高到其临界点温度和压力; 和出血，其中干燥室以非常慢的速率减压至大气压，直到干燥室完全排气，这表明干燥操作结束。干燥室包含用于压力分散的凹面，并且便于完全清洗中间流体。干燥室包括用垫圈密封的成角度的入口和窗口。干燥室还包括晶片保持器，间隔环和插入件的使用，以允许正在处理的晶片的安全悬浮。将冷却液通过闭环制冷系统也可以冷却干燥室。

2. 发明授权

US06463678B2 Substrate changing-over mechanism in a vaccum tank 失效
标题翻译：真空罐中的底物转换机理
公开(公告)号：US06463678B2
公开(公告)日：2002-10-15
申请号：US09782194
申请日：2001-02-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1310
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

3. 发明授权

US06397493B1 Machine for producing and/or treating a material web 失效
标题翻译：用于生产和/或处理材料网的机器
公开(公告)号：US06397493B1
公开(公告)日：2002-06-04
申请号：US09643967
申请日：2000-08-23
申请人： Günter Halmschlager , Walter Holzer , Manfred Gloser , Peter Haslinger
发明人： Günter Halmschlager , Walter Holzer , Manfred Gloser , Peter Haslinger
IPC分类号： F26B1310
CPC分类号： D21F5/02 , D21F5/004 , D21F5/044 , F26B13/18 , F26B13/26 , F26B13/28
摘要： An apparatus for at least one of producing and treating a material web is provided including at least one wire; an outer sealing belt, which is wider than said at least one wire, comprising a pair of lateral edge regions; at least one heatable unit, having an outer cylindrical surface, wherein said at least one wire and said outer sealing belt are at least partially wrapped around said at least one heatable unit; an overpressure cap arranged to form a pressure chamber containing a medium under pressure, said medium under pressure exerting a pressure on said at least one heatable unit; and at least one of: (a) a seal formed between said lateral edge regions and said heatable unit; and (b) a seal formed between end faces of said overpressure cap and an opposing wall to seal said pressure chamber from an external environment.
摘要翻译：提供了一种用于生产和处理材料纤维网中的至少一种的设备，包括至少一根丝线; 比所述至少一根线宽的外密封带，包括一对侧边缘区域; 至少一个可加热单元，具有外圆柱形表面，其中所述至少一个线和所述外部密封带至少部分地围绕所述至少一个可加热单元缠绕; 一个超压帽，其被布置成形成一个包含压力介质的压力室，所述压力介质在所述至少一个可加热单元上施加压力; 以及至少一个：（a）形成在所述侧边缘区域和所述可加热单元之间的密封件; 和（b）在所述超压盖的端面和相对的壁之间形成的密封件，以将所述压力室与外部环境密封。

4. 发明授权

US06688020B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US06688020B2
公开(公告)日：2004-02-10
申请号：US09839430
申请日：2001-04-20
申请人： Takayuki Toshima , Tadashi Iino
发明人： Takayuki Toshima , Tadashi Iino
IPC分类号： F26B1310
CPC分类号： H01L21/67017 , B08B7/00 , H01L21/67028
摘要： A substrate processing apparatus and method which can prevent accidents in advance so as to ensure safety against interruption of operations of the apparatus and leakage of processing substances. In a substrate processing method in which wafers W are processed are processed by feeding an ozone gas 5 to the wafers W loaded in a processing vessel 2 while an interior atmosphere in the processing vessel is being exhausted to be passed through an ozone killer 10, the ozone gas 5 is fed under the conditions that the processing vessel 2 is tightly closed, and the ozone killer in its normal state. When the processing is interrupted, an interior atmosphere in the processing vessel 2 is forcedly exhausted. When the gas leaks, the interior atmosphere and a peripheral atmosphere of the processing vessel 2 are forcedly exhausted while the feed of the ozone gas 5 is paused. The processing gas is fed under a condition that the processing vessel is tightly closed, and the post-treatment of the exhausted interior atmosphere is normally carried out.
摘要翻译：一种可以预先事先防止事故的基板处理装置和方法，以确保安全性，防止装置的操作中断和处理物质的泄漏。在处理容器中的内部气氛被排出以通过臭氧消毒器10的同时，通过将臭氧气体5供给到装载在处理容器2中的晶片W来处理晶片W处理的基板处理方法，臭氧气体5在处理容器2紧密关闭的条件下进入，臭氧消毒器处于正常状态。当处理中断时，处理容器2中的内部气氛被强制耗尽。当气体泄漏时，处理容器2的内部气氛和周围气氛被强制排出，同时臭氧气体5的进料暂停。处理气体在处理容器密闭的条件下进料，并且通常进行排气的内部气氛的后处理。

5. 发明授权

US06678968B1 Supercritical point drying apparatus for semiconductor device manufacturing and bio-medical sample processing 失效
标题翻译：用于半导体器件制造和生物医学样品处理的超临界点干燥装置
公开(公告)号：US06678968B1
公开(公告)日：2004-01-20
申请号：US09988295
申请日：2001-11-19
申请人： Anastasios J. Tousimis , Chris Tousimis
发明人： Anastasios J. Tousimis , Chris Tousimis
IPC分类号： F26B1310
CPC分类号： H01L21/67034 , G01N1/40 , G01N2001/4027
摘要： A critical point drying apparatus for sample preparation in electron microscopy and semiconductor wafer production includes a computer system to automate the operational modes in drying the specimen. These operational modes controlled by the computer system are: cooling, in which a drying chamber is cooled; starting, in which the specimen chamber is filled with a transitional fluid; purging, in which the transitional fluid purges an intermediary fluid from the drying chamber and the purged intermediary fluid is collected by a collector condenser; heating, in which the drying chamber is heated to elevate the transitional fluid to its critical point temperature and pressure; and bleeding, in which the drying chamber is depressurized to atmospheric pressure at a very slow rate until the drying chamber is completely vented, which signals the end of the drying operation. The computer system interfaces with a remote client terminal to update the status of the operation of the critical point drying apparatus.
摘要翻译：用于电子显微镜和半导体晶片生产中的样品制备的临界点干燥装置包括使干燥样品的操作模式自动化的计算机系统。由计算机系统控制的这些操作模式是：冷却，其中干燥室被冷却; 起始，其中样品室充满过渡流体; 清洗，其中过渡流体从干燥室清洗中间流体，并且被清除的中间流体由收集器冷凝器收集; 加热，其中干燥室被加热以将过渡流体升高到其临界点温度和压力; 和出血，其中干燥室以非常慢的速率减压至大气压，直到干燥室完全排气，这表明干燥操作结束。计算机系统与远程客户终端接口，以更新关键点干燥设备的操作状态。

6. 发明授权

US06487794B2 Substrate changing-over mechanism in vacuum tank 失效
标题翻译：真空罐中底物转换机理
公开(公告)号：US06487794B2
公开(公告)日：2002-12-03
申请号：US09782195
申请日：2001-02-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1310
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A substrate changing-over mechanism in a vacuum processing apparatus which includes a substrate supporting means arranged within a vacuum tank which has at least two openings at a side wall of the tank, the openings being openable or closable by gate valves, the substrate supporting sections in upper and lower spaces and an ascending or descending driver section for driving the substrate supporting means; thereby allowing the supporting means to be stopped in a vertical direction at a plurality of predetermined positions.
摘要翻译：一种真空处理装置中的基板切换机构，包括布置在真空罐内的基板支撑装置，所述真空罐在罐的侧壁处具有至少两个开口，所述开口可由闸阀打开或关闭，所述基板支撑部分在上部和下部空间中，以及用于驱动基板支撑装置的上升或下降驱动器部分; 从而允许支撑装置在多个预定位置沿垂直方向停止。

7. 发明授权

US06637127B2 Dryer airflow sensor 失效
标题翻译：烘干机气流传感器
公开(公告)号：US06637127B2
公开(公告)日：2003-10-28
申请号：US09969065
申请日：2001-10-02
申请人： Ivan Reede , Marc Villeneuve , David G. Allen
发明人： Ivan Reede , Marc Villeneuve , David G. Allen
IPC分类号： F26B1310
CPC分类号： D06F58/22 , D06F2058/2864 , D06F2058/2887 , F26B21/12
摘要： An air flow detecting system is provided for monitoring air flow in a dryer system. The dryer system has an exhaust passage through which air from a drying compartment flows. The air flow detecting system includes a detector for monitoring a rate at which air from the drying compartment travels through the exhaust passage, and a signal generator. The signal generator is responsive to the detector and generates an electrical signal for which at least one of phase, frequency, voltage, or current varies over a continuous range based on a measured flow rate.
摘要翻译：提供了一种用于监测干燥器系统中的气流的气流检测系统。干燥器系统具有排气通道，来自干燥室的空气通过该排气通道流动。气流检测系统包括用于监测来自干燥室的空气通过排气通道的速率的检测器和信号发生器。信号发生器响应于检测器并且产生电信号，基于测量的流量，相位，频率，电压或电流中的至少一个在连续范围内变化。

8. 发明授权

US06401361B1 Apparatus and method for drying wafers by a solvent 有权
标题翻译：通过溶剂干燥晶片的装置和方法
公开(公告)号：US06401361B1
公开(公告)日：2002-06-11
申请号：US09713629
申请日：2000-11-15
申请人： Cho-Ching Chen , Shin-Shing Yang , Jenn-Wei Ju , Liang-Yi Chou , Chih-Hong Cheng
发明人： Cho-Ching Chen , Shin-Shing Yang , Jenn-Wei Ju , Liang-Yi Chou , Chih-Hong Cheng
IPC分类号： F26B1310
CPC分类号： H01L21/67253
摘要： An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking system is activated to stop the further loading of wafers into the drying chamber and thus preventing the outputting of undried wafers from the chamber. The apparatus is used to prevent any malfunction in the flow control valves or in any other flow control system that stops the flow of solvent vapor into the drying chamber.
摘要翻译：公开了一种用于干燥溶剂干燥室中的半导体晶片的装置和干燥方法。该装置配有警报/互锁系统，使得当溶剂蒸汽流入干燥室中时，触发警报并启动联锁系统，以停止将晶片进一步加载到干燥室中，从而防止从腔室输出未干燥的晶片。该装置用于防止流量控制阀或阻止溶剂蒸汽流入干燥室的任何其它流量控制系统中的任何故障。

9. 发明授权

US06226892B1 Drying module 失效
标题翻译：干燥模块
公开(公告)号：US06226892B1
公开(公告)日：2001-05-08
申请号：US09446497
申请日：2000-05-02
申请人： Helmut Bloecker , Gerhard Kauer
发明人： Helmut Bloecker , Gerhard Kauer
IPC分类号： F26B1310
CPC分类号： F26B9/003 , F26B9/06 , F26B21/00
摘要： A dryer module for drying filter supports in DNA preparation comprises a receiving member for receiving the filter support and at least one blower member, the blower member being arranged below the receiving member for receiving the filter support so that the filter support is blown on an dried from below. The dryer module also has a heating system for warming the air blown from below against the filter support, the heating system being arranged above the blower member, of which there is at least one. The dryer module is electronically controlled by a control means as a function of the measured temperature of the drying air. The dryer module can be used as a stand-along apparatus or in an automated environment.
摘要翻译：用于在DNA制备中干燥过滤器支撑物的干燥器模块包括用于接收过滤器支撑件的接收构件和至少一个鼓风机构件，鼓风机构件布置在接收构件的下方，用于接收过滤器支撑件，使得过滤器支撑件被吹送在干燥从下面。干燥器模块还具有用于将从下方吹出的空气加热到过滤器支撑件的加热系统，加热系统布置在鼓风机构件的上方，其中至少有一个。干燥器模块通过作为干燥空气的测量温度的函数的控制装置进行电子控制。干燥器模块可以用作独立设备或在自动化环境中使用。

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