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1. 发明授权

US06468402B1 Process for coating a substrate with titanium dioxide 失效
标题翻译：用二氧化钛涂覆基材的方法
公开(公告)号：US06468402B1
公开(公告)日：2002-10-22
申请号：US09589098
申请日：2000-06-08
申请人： Johan Emile Marie Vanderstraeten
发明人： Johan Emile Marie Vanderstraeten
IPC分类号： C23C1408
CPC分类号： C23C14/3414 , C03C17/2456 , C03C2217/212 , C03C2218/154 , C23C4/11 , C23C4/134
摘要： A process for coating a substrate with titanium dioxide, which process comprises the D.C. plasma sputtering and/or mid-frequency sputtering from a sputtering target which comprises sub-stoichiometric titanium dioxide, TiOx, where x is below 2.
摘要翻译：一种用二氧化钛涂覆基材的方法，该方法包括来自溅射靶的直流等离子体溅射和/或中频溅射，其包括亚化学计量的二氧化钛TiO x，其中x低于2。

2. 发明授权

US06335062B1 Reactive oxygen-assisted ion implantation into metals and products made therefrom 失效
标题翻译：活性氧辅助离子注入金属和由其制成的产品
公开(公告)号：US06335062B1
公开(公告)日：2002-01-01
申请号：US08304960
申请日：1994-09-13
申请人： Bruce D. Sartwell , Paul M. Natishan
发明人： Bruce D. Sartwell , Paul M. Natishan
IPC分类号： C23C1408
CPC分类号： C23C14/48 , Y10T428/12028 , Y10T428/12458 , Y10T428/12611 , Y10T428/12736 , Y10T428/12785
摘要： A method of ion implantation using oxygen backfill and a modified surface layer formed therefrom are provided. The method of ion implantation includes the steps of placing a substrate metal in an ion implantation vacuum chamber, introducing oxygen into the ion implantation vacuum chamber and directing a beam of ions at the substrate metal. The modified surface includes a substrate metal and implanted atoms at a surface of the substrate metal. The implanted atoms are integrated with the substrate metal. The substrate metal has an implanted atom concentration of at least 5 atomic % to a depth of over 250 Å.
摘要翻译：提供了使用氧回填的离子注入方法和由其形成的改性表面层。离子注入的方法包括以下步骤：将衬底金属放置在离子注入真空室中，将氧引入离子注入真空室并将离子束引导到衬底金属。改性表面包括衬底金属和在衬底金属的表面上注入的原子。植入的原子与衬底金属成一体。衬底金属的注入原子浓度至少为5原子％至深度超过250埃。

3. 发明授权

US06821618B2 Magnetic recording medium and process for producing the same 失效
标题翻译：磁记录介质及其制造方法
公开(公告)号：US06821618B2
公开(公告)日：2004-11-23
申请号：US10185728
申请日：2002-07-01
申请人： Jun Koujima , Teruaki Santoki , Kenichi Nakata , Takanori Doi , Masaaki Maekawa , Kousaku Tamari
发明人： Jun Koujima , Teruaki Santoki , Kenichi Nakata , Takanori Doi , Masaaki Maekawa , Kousaku Tamari
IPC分类号： C23C1408
CPC分类号： G11B5/653 , G11B5/851 , Y10T428/265
摘要： A magnetic recording medium exhibiting a high coercive force and excellent squareness having a substrate, an underlayer formed on the substrate, and a spinel-type iron oxide thin film with maghemite as a main component formed on the underlayer. The spinel-type iron oxide thin film has a thickness (t) of 5 to 50 nm, is constituted by grains having an average grain size (D) of 5 to 30 nm, standard deviation of sizes of grain of not more than 4 nm and a ratio (D/t) of the average grain size (D) to the thickness (t) of less than 1.0, exhibits a coercive force of not less than 159 kA/m (2,000 Oe) and a coercive squareness ratio S* of not less than 0.5:1 in a longitudinal recording medium or a squareness ratio not less than 0.75:1 in a perpendicular recording medium.
摘要翻译：具有高矫顽力和具有基底的优良矩形性的磁记录介质，在基底上形成的底层和在底层上形成有以磁赤铁矿为主要成分的尖晶石型氧化铁薄膜。尖晶石型氧化铁薄膜的厚度（t）为5〜50nm，由平均粒径（D）为5〜30nm的晶粒构成，粒径不超过4nm的标准偏差平均粒径（D）与厚度（t）的比（D / t）小于1.0时，矫顽力为159kA / m 2（2000Oe），矫顽截面比S * 在纵向记录介质中不小于0.5:1，或垂直记录介质中不小于0.75:1的矩形比。

4. 发明授权

US06706325B2 Article protected by a thermal barrier coating system and its fabrication 失效
标题翻译：文章由热障涂层系统及其制造保护
公开(公告)号：US06706325B2
公开(公告)日：2004-03-16
申请号：US09944909
申请日：2001-08-31
申请人： Irene Spitsberg , Robert William Bruce
发明人： Irene Spitsberg , Robert William Bruce
IPC分类号： C23C1408
CPC分类号： C23C28/321 , C23C28/325 , C23C28/345 , C23C28/3455 , Y10T428/12944
摘要： An article protected by a thermal barrier coating system is fabricated by providing an article substrate having a substrate surface, thereafter depositing a bond coat on the substrate surface, the bond coat having a bond coat surface, and thereafter processing the bond coat to flatten the bond coat surface. A thermal barrier coating is deposited overlying the bond coat surface. The thermal barrier coating is yttria-stabilized zirconia having a yttria content of from about 3 percent by weight to about 5 percent by weight of the yttria-stabilized zirconia.
摘要翻译：通过提供具有基材表面的制品基材，然后在基材表面上沉积粘合涂层，粘合涂层具有粘合涂层表面，然后加工粘合涂层使粘合剂平坦化，制造由热障涂层系统保护的物品外套表面。覆盖在粘结涂层表面上的热障涂层被沉积。热障涂层是氧化钇稳定的氧化锆，其氧化钇含量为氧化钇稳定的氧化锆的约3重量％至约5重量％。

5. 发明授权

US06797339B2 Method for forming thin film with a gas cluster ion beam 失效
标题翻译：用气体簇离子束形成薄膜的方法
公开(公告)号：US06797339B2
公开(公告)日：2004-09-28
申请号：US10351555
申请日：2003-01-27
申请人： Makoto Akizuki , Mitsuaki Harada , Atsumasa Doi , Isao Yamada
发明人： Makoto Akizuki , Mitsuaki Harada , Atsumasa Doi , Isao Yamada
IPC分类号： C23C1408
CPC分类号： C23C8/36 , C23C14/48 , H01J2237/0812 , H01L21/02238 , H01L21/31662 , H01L21/32105
摘要： A method of forming a thin film on the surface of a substrate such as silicon, in which a gas cluster (which is a massive atomic or molecular group of a reactive substance taking the gaseous form at room temperature under atmospheric pressure) is formed and then ionized, and the cluster ions are then irradiated onto a substrate surface under an acceleration voltage to cause a reaction. It is possible to form a high quality ultra-thin film having a very smooth interface, without causing any damage to the substrate, even at room temperature.
摘要翻译：在诸如硅的基板的表面上形成薄膜的方法，其中形成气体簇（其是在大气压下在室温下呈气态形式的反应物质的大量原子或分子基团），然后电离，然后在加速电压下将簇离子照射到基板表面上以引起反应。即使在基板表面上也可以形成具有非常光滑的界面的高质量超薄膜，而不会对基板造成任何损坏室内温度。

6. 发明授权

US06238730B1 Gas introduction pipe and magnetic recording medium production method using the pipe 失效
标题翻译：气体导入管和磁记录介质的生产方法采用管道
公开(公告)号：US06238730B1
公开(公告)日：2001-05-29
申请号：US09345866
申请日：1999-07-01
申请人： Tomohiro Kubo , Shuetsu Kumagai
发明人： Tomohiro Kubo , Shuetsu Kumagai
IPC分类号： C23C1408
CPC分类号： G11B5/85 , C23C14/0021
摘要： The present invention provides a gas introduction pipe in which the least component is replaced when deformation or damage is caused and a magnetic recording medium production method using this gas introduction pipe. The gas introduction pipe according to the present invention includes: a gas supply pipe 20 for supplying a gas; a main body 22, 23 connected to the gas supply pipe and having a gas flow passage 21 for flowing of a gas supplied from the gas supply pipe; and a blowoff block 25 arranged at the opposite side of the main body 22, 23 not having the gas supply pipe and having a blowoff opening 27 exposed outward for blowing off the gas outside. The blowoff block 25 is held so as to be sandwiched by the main body 22, 23 and can be detached and attached from/to the main body 22, 23.
摘要翻译：本发明提供一种气体引入管，其中在产生变形或损坏时最少成分被替换，以及使用该气体导入管的磁记录介质制造方法。根据本发明的气体导入管包括：气体供给管20，用于供给气体; 连接到气体供给管的主体22,23，具有用于使从气体供给管供给的气体流动的气体流路21; 以及布置在主体22,23的不具有气体供给管的相对侧的吹气块25，并且具有向外暴露的吹出口27，用于吹出外部的气体。吹出块25被保持以被主体22,23夹持，并且可以从主体22,23分离和附接。

7. 发明授权

US06171458B2 Method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors 有权
标题翻译：太阳能集热器用吸收层的制造方法，太阳能收集体的吸收层的实施方法和吸收层
公开(公告)号：US06171458B2
公开(公告)日：2001-01-09
申请号：US09265495
申请日：1999-03-10
申请人： Göran Hultmark
发明人： Göran Hultmark
IPC分类号： C23C1408
CPC分类号： C23C14/562 , C23C14/0057 , C23C14/0063 , C23C14/06 , C23C14/085 , F24S70/25 , Y02E10/40 , Y02P80/24
摘要： A spectral selective absorbing surface on solar collector elements has a very high solar absorbing ability, in the range of 96% to 97% and a low thermal emittance, in the order of 10%, and can be produced with high capacity in industrial scale. A reactive gas in an amount of 1 to 50 cm 3/min kW, preferably 10 cm 3/min kW, distributed in the coating zone provides that the metal layer deposed onto the receiving material partly oxidizes during the deposition, whereby a layer is obtained that comprises a grain mixture of metallic material and metal oxide, whereby 40% to 80%, preferably about 50%, of metallic material is embedded into the metal oxide closest to the receiving material. The metallic material is successively decreased to about zero at the surface of the layer by increasing the addition of oxygen at the end of the coating zone. The metal is selected from the group consisting of nickel, chromium, cobalt, molybdenum, or the similar, or a mixture thereof, preferably a nickel-chromium-alloy where the ratio of chromium is 4 to 30%, preferably about 20%, and the grain size is
摘要翻译：太阳能收集器元件上的光谱选择吸收表面具有非常高的太阳能吸收能力，在96％至97％的范围内，低发射率为10％左右，并且可以在工业规模的高容量下生产。分布在涂层区域中的量为1〜50cm 3 /分钟kW，优选为10cm 3 / min·kW的反应性气体使得沉积在接收材料上的金属层在沉积期间部分氧化，由此获得层其包括金属材料和金属氧化物的晶粒混合物，由此将40％至80％，优选约50％的金属材料嵌入最接近接收材料的金属氧化物中。金属材料通过增加涂层区末端氧的添加，在层的表面上连续地降低至约零。金属选自镍，铬，钴，钼或类似物，或其混合物，优选铬铬合金，其中铬的比率为4至30％，优选约20％，以及晶粒尺寸<0.005mm，优选0.001mm。

8. 发明授权

US06599584B2 Barrier coated plastic containers and coating methods therefor 失效
公开(公告)号：US06599584B2
公开(公告)日：2003-07-29
申请号：US09843983
申请日：2001-04-27
申请人： George Plester , Horst Ehrich
发明人： George Plester , Horst Ehrich
IPC分类号： C23C1408
CPC分类号： B05D1/62 , C23C14/32
摘要： Methods and systems are provided for making a coated plastic container, such as for packaged beverages, possessing a gas barrier and having enhanced resistance to loss in barrier due to handling abuses expansion of walls of the container. The system comprises a vacuum cell, a coating source in the vacuum cell for supplying a coating vapor to an external surface of a plastic container positioned within the vacuum cell, and gas feeds for supplying one or more process gases into an interior space of the vacuum cell. The coating source heats and evaporates an inorganic coating material, such as metal or silicon, to form a coating vapor, which is energized to form a plasma. The process gases include a carbon-containing gas, such as acetylene. The coating source is arranged within the vacuum cell such that the coating vapor and/or plasma reacts with at least one of the process gases and a thin coating is deposited and bonded on the external surface of the plastic container, such that the thin coating comprising carbon and inorganic material, such as an inorganic oxide.

9. 发明授权

US06576294B1 Method for forming barrier film 失效
标题翻译：阻挡膜形成方法
公开(公告)号：US06576294B1
公开(公告)日：2003-06-10
申请号：US08062736
申请日：1993-05-14
申请人： Roger W. Phillips , Lauren R. Wendt , Myra Tan-Johnson , David W. Todd , Charles Thomas Markantes
发明人： Roger W. Phillips , Lauren R. Wendt , Myra Tan-Johnson , David W. Todd , Charles Thomas Markantes
IPC分类号： C23C1408
CPC分类号： B32B27/06 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/086 , Y10T428/1352 , Y10T428/1359 , Y10T428/1379 , Y10T428/1383 , Y10T428/265
摘要： Barrier film with a high colorless transparency comprising a flexible plastic substrate. A barrier layer is formed on the surface and has a thickness ranging from approximately 50 to less than 200 Angstroms and is formed of a material selected from the group of aluminum oxide, tin oxide and yttrium oxide. An additional barrier layer formed of silicon dioxide may also be formed on the barrier layer.
摘要翻译：具有高无色透明度的阻隔膜，包括柔性塑料基材。在表面上形成阻挡层，其厚度范围为约50至小于200埃，并由选自氧化铝，氧化锡和氧化钇的材料形成。也可以在阻挡层上形成由二氧化硅形成的另外的阻挡层。

10. 发明授权

US06365016B1 Method and apparatus for arc plasma deposition with evaporation of reagents 有权
标题翻译：用试剂蒸发电弧等离子体沉积的方法和装置
公开(公告)号：US06365016B1
公开(公告)日：2002-04-02
申请号：US09271655
申请日：1999-03-17
申请人： Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
发明人： Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
IPC分类号： C23C1408
CPC分类号： C23C14/228 , C23C14/32 , C23C16/513 , H01J37/32422
摘要： A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.
摘要翻译：一种用于在基底上沉积涂层的方法和装置。涂布基材的方法包括蒸发第一反应物; 将蒸发的反应物引入等离子体; 以及将所述第一反应物沉积在所述衬底的表面上。例如，该方法可用于在玻璃或聚碳酸酯基底上高速沉积导电的紫外线过滤器涂层。用于在聚合物基底上沉积UV过滤器涂层的装置包括具有阳极和阴极以形成等离子体的等离子体发生器，以及用于将第一反应物引入等离子体的第一入口，第一反应物包含沉积的蒸发材料通过等离子体在衬底上。任选地，可以使用喷嘴来提供第一反应物到等离子体的受控输送。

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