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1. 发明授权

US6136108A Strontium master alloy composition having a reduced solidus temperature and method of manufacturing the same 失效
标题翻译：具有降低的固相线温度的锶母合金组合物及其制造方法
公开(公告)号：US6136108A
公开(公告)日：2000-10-24
申请号：US413673
申请日：1999-10-06
申请人： Gary W. Boone , Philip G. Vais , Daniel B. Franklin
发明人： Gary W. Boone , Philip G. Vais , Daniel B. Franklin
IPC分类号： C22B21/06 , C22C1/03 , C22C18/00 , C22C21/02 , C22C24/00 , C22F1/09 , C21D1/09
CPC分类号： C22C24/00 , C22C1/03 , C22C18/00 , C22B21/06 , Y10S75/952
摘要： Master alloy with 20-80% strontium, preferably 0.01-2.0% of aluminum and/or copper, and the balance essentially zinc plus impurities, and a method for preparing same and a method for modifying the microstructure of nonferrous alloys with said master alloy.
摘要翻译：具有20-80％锶的母合金，优选为0.01-2.0％的铝和/或铜，余量基本上为锌和杂质，以及其制备方法和用所述母合金改性有色合金的显微组织的方法。

2. 发明授权

US5897966A High temperature alloy article with a discrete protective coating and method for making 失效
标题翻译：高温合金制品具有独立的保护涂层和制造方法
公开(公告)号：US5897966A
公开(公告)日：1999-04-27
申请号：US606903
申请日：1996-02-26
申请人： Warren D. Grossklaus, Jr. , Richard R. Worthing, Jr.
发明人： Warren D. Grossklaus, Jr. , Richard R. Worthing, Jr.
IPC分类号： C23C10/48 , C23C10/58 , B32B15/10 , C22F1/09
CPC分类号： C23C10/58 , Y10T428/1275 , Y10T428/12861 , Y10T428/12875 , Y10T428/12944
摘要： An environmental resistant spot type coating is provided on a selected, discrete surface area of a high temperature operating article, by applying to the area a layer of at least one of the elements selected from Pt, Rh and Pd, and preferably Pt, to a thickness of about 0.0002" to less than 0.0006" and an average distribution of at least about 0.07 grams per square inch. The layer is heated at about 1800-2050.degree. F. for about 1/2-4 hours to diffuse the element with the surface area. Then the layer is aluminided to provide an average total coating thickness of about 0.001-0.005". The article provided includes an environmental resistant additive coating diffused with the selected discrete area. The coating comprises an outer portion of at least about 17 wt. % of the selected element, and an aluminide of the surface area or substrate. In one form, the outer portion is a two phase outer portion: a first phase of an aluminide of the selected element at a content of at least about 40 wt. % interspersed with a second phase comprising an aluminide in which Al is at least about 20 wt. %. Between the outer portion and the surface area is an inner portion which is a diffusion zone comprising diffused selected element along with an aluminide and/or elements diffused from the surface area.
摘要翻译：通过将选自Pt，Rh和Pd中的至少一种元素，优选Pt，至少一种Pt的层施加到该区域，在高温操作制品的选定的离散表面区域上提供耐环境斑点型涂层约0.0002“至小于0.0006”的厚度，平均分布为至少约0.07克/平方英寸。将层在约1800-2050°F加热约+ E，加热1/2 + EE -4小时以使元件与表面积扩散。然后将该层铝化，以提供约0.001-0.005“的平均总涂层厚度。所提供的制品包括与所选离散区域扩散的耐环境添加剂涂层。该涂层包含至少约17wt。％的选定元素，以及表面积或底物的铝化物。在一种形式中，外部是两相外部部分：所选元素的铝化物的第一相含量至少为约40wt。％散布在第二相中，第二相包含铝，其中Al为至少约20wt。％。在外部部分和表面区域之间是内部部分，其是扩散区域，其包括扩散选择的元素以及从表面区域扩散的铝化物和/或元素。

3. 发明授权

US6085966A Sputtering target assembly production method 失效
标题翻译：溅射靶组装生产方法
公开(公告)号：US6085966A
公开(公告)日：2000-07-11
申请号：US984130
申请日：1997-12-03
申请人： Hitoshi Shimomuki , Fumio Sasaki , Eiichi Shimizu
发明人： Hitoshi Shimomuki , Fumio Sasaki , Eiichi Shimizu
IPC分类号： B23K20/02 , B23K20/233 , C23C14/34 , H01L21/203 , B23K20/00 , B23K31/02 , B23K1/19 , C22F1/09
CPC分类号： B23K20/233 , B23K20/021 , C23C14/3407 , B23K2203/12
摘要： A method for producing a sputtering target assembly consisting of a target member used for sputtering and a backing plate bonded to the target member, which assembly has a high adherence strength and a high bonding strength as well as a sufficient tensile strength even under a high temperature. When producing a sputtering target assembly consisting of a target member used for sputtering and a backing plate bonded to the target member, bonding surfaces of the target member and the backing plate are made flat so as to have an arithmetic mean roughness Ra of 0.01 to 1.0 .mu.m before carrying out solid phase diffusion bonding between the target member and the backing plate.
摘要翻译：一种溅射靶组件的制造方法，该溅射靶组件由用于溅射的目标构件和与该靶构件结合的背板组成，该组件具有高的粘附强度和高的接合强度，并且即使在高温下也具有足够的拉伸强度。当制造由用于溅射的目标构件和结合到目标构件的背板组成的溅射靶组件时，目标构件和背板的接合表面被制成平坦的，以便具有0.01至1.0的算术平均粗糙度Ra 在目标构件和背板之间进行固相扩散接合之前。

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