专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06669763B1 Water based protectant containing a reaction product of two ionic surfactants 失效
标题翻译：含有两种离子表面活性剂的反应产物的水基保护剂
公开(公告)号：US06669763B1
公开(公告)日：2003-12-30
申请号：US10340749
申请日：2003-01-13
申请人： Vahid Ghodoussi
发明人： Vahid Ghodoussi
IPC分类号： C09G100
CPC分类号： C09G1/12 , C09G1/08
摘要： A composition for application to a surface and a method of making the same, said composition comprising at least one wax; at least one reaction product derived from a first surfactant and a second surfactant; and between 40% and 99.8% water by weight. The composition is made by: a) forming an emulsion by combining the water and the wax after heating both the water and the wax to a temperature greater than the melting point of the wax, where at least one of said water and said wax contains said first surfactant, said first surfactant being selected from the group consisting of a cationic surfactant and an anionic surfactant; and b) adding said second surfactant to the emulsion, said second surfactant having a charge which is opposite to that of said first surfactant.
摘要翻译：一种用于表面的组合物及其制备方法，所述组合物包含至少一种蜡; 衍生自第一表面活性剂和第二表面活性剂的至少一种反应产物; 和40％至99.8％之间的水。该组合物通过以下方法制备：a）在将水和蜡加热至大于蜡熔点的温度下，通过组合水和蜡来形成乳液，其中所述水和所述蜡中的至少一种含有所述第一表面活性剂，所述第一表面活性剂选自阳离子表面活性剂和阴离子表面活性剂; 和b）将所述第二表面活性剂加入到所述乳液中，所述第二表面活性剂具有与所述第一表面活性剂相反的电荷。

2. 发明授权

US06342544B1 Durable outsole for article of footwear 有权
标题翻译：耐用外底鞋类物品
公开(公告)号：US06342544B1
公开(公告)日：2002-01-29
申请号：US09292764
申请日：1999-04-14
申请人： Ruzica Krstic , Leonard Edward Raymond Kosinski
发明人： Ruzica Krstic , Leonard Edward Raymond Kosinski
IPC分类号： C09G100
CPC分类号： A43B13/122 , A43B5/02 , A43B13/223 , C08G2410/00 , C08L75/04 , C08L27/12
摘要： An article of footwear, such as an athletic shoe, having a wear resistant outsole is disclosed. The article of footwear includes an upper secured to a sole having a ground engaging portion with a wear resistant material composed of a thermoplastic polymer blended with from 0.1% to 2% of a fluorocarbon additive. In a preferred embodiment, the sole has ground engaging protrusions or cleats with at least the tip of one cleat composed of the wear resistant material. Preferably, the wear resistant material is a blend of thermoplastic polyurethane, such as Bayer Corporation's TEXIN 285™ or DESMONPAN 8785™, blended with 0.1% to 2% perfluoropolyether, such as DuPont KRYTOX™ general purpose oils and greases having GPL oil grades from 100 to 107, and more preferably having GPL oil grades from 101 to 105, inclusive.
摘要翻译：公开了一种具有耐磨外底的鞋类，例如运动鞋。鞋类物品包括固定到鞋底的鞋面，鞋面具有与由0.1％至2％的氟碳添加剂混合的热塑性聚合物组成的耐磨材料的接地部分。在优选实施例中，鞋底具有至少由耐磨材料构成的一个防滑板的至少前端的地面接合突起或夹板。优选地，耐磨材料是热塑性聚氨酯的混合物，例如拜耳公司的TEXIN 285 TM或DESMONPAN 8785 TM，与0.1％至2％的全氟聚醚混合，例如DuPont KRYTOX TM通用油和润滑脂具有100至107的GPL油级，更优选具有101至105的GPL油等级。

3. 发明授权

US06821309B2 Chemical-mechanical polishing slurry for polishing of copper or silver films 失效
标题翻译：用于抛光铜或银膜的化学机械抛光浆料
公开(公告)号：US06821309B2
公开(公告)日：2004-11-23
申请号：US10081979
申请日：2002-02-22
申请人： Rajiv K. Singh , Seung-Mahn Lee
发明人： Rajiv K. Singh , Seung-Mahn Lee
IPC分类号： C09G100
CPC分类号： C09G1/02 , C09K3/1463 , C23F3/06 , H01L21/3212
摘要： A slurry for chemical mechanical polishing (CMP) of a copper or silver containing film provides at least one reactant for reacting with the copper or silver film to form a soft layer on the surface of the copper or silver film. The soft layer has a hardness less than the copper or silver film. The slurry preferably includes either no particles or particles which are softer than the copper or silver layer. A method for chemical mechanical polishing (CMP) a copper or silver containing film includes the steps of providing a slurry for reacting with the copper or silver film to form a soft layer on the surface of the copper or silver film and uses either no particles or particles softer than the copper or silver film, applying the slurry to the copper or silver film to form the soft layer, and removing the soft layer using a polishing pad.
摘要翻译：用于含铜或银的膜的化学机械抛光（CMP）的浆料提供至少一种用于与铜或银膜反应的反应物，以在铜或银膜的表面上形成软层。软层的硬度小于铜或银膜。浆料优选不包括比铜或银层更软的颗粒或颗粒。一种用于化学机械抛光（CMP）的含铜或银的膜的方法包括以下步骤：提供用于与铜或银膜反应的浆料，以在铜或银膜的表面上形成软层，并且不使用任何颗粒或比铜或银膜更软的颗粒，将浆料施加到铜或银膜以形成软层，并使用抛光垫去除软层。

4. 发明授权

US06695905B2 PIGMENTS HAVING A VIEWING ANGLE DEPENDENT SHIFT OF COLOR, METHOD FOR PRODUCING SAID PIGMENTS, USE OF SAID PIGMENTS IN SECURITY APPLICATIONS, COATING COMPOSITION COMPRISING SAID PIGMENTS AND A DETECTING DEVICE 有权
标题翻译：具有观察角度的颜料，用于生产所述颜料的方法，在安全应用中使用所述颜料的方法，包含所述颜料的涂料组合物和检测装置
公开(公告)号：US06695905B2
公开(公告)日：2004-02-24
申请号：US10182734
申请日：2002-08-14
申请人： Olivier Rozumek , Edgar Müller
发明人： Olivier Rozumek , Edgar Müller
IPC分类号： C09G100
CPC分类号： C09C1/0015 , C01P2004/84 , C09B67/0098 , C09C2200/1054 , C09C2200/301 , C09C2200/304 , C09C2200/305 , C09C2210/50 , C09C2220/20 , C09D5/36
摘要： The invention describes luminescent optically variable pigments (OVP), methods for obtaining such pigments, as well as the use of such pigments as security elements in inks, coatings and articles. The luminescence centers are preferably incorporated into the dielectric material of the OVP's optical Fabry-Perot resonance cavity, allowing for the machine-discrimination of luminescent OVP from simple mixtures of luminescents and non-luminescent OVP.
摘要翻译：本发明描述了发光光学可变颜料（OVP），获得这种颜料的方法，以及在油墨，涂料和制品中使用这些颜料作为安全元件。发光中心优选并入OVP的光学法布里 - 珀罗共振腔的电介质材料中，从而允许通过发光和非发光OVP的简单混合物对发光OVP进行机器鉴别。

5. 发明授权

US06338743B1 Buffer solutions for suspensions used in chemical-mechanical polishing 失效
标题翻译：用于化学机械抛光的悬浮液缓冲溶液
公开(公告)号：US06338743B1
公开(公告)日：2002-01-15
申请号：US09403098
申请日：2000-04-03
申请人： Claus Dusemund , Rudolf Rhein , Manuela Schweikert , Martin Hostalek
发明人： Claus Dusemund , Rudolf Rhein , Manuela Schweikert , Martin Hostalek
IPC分类号： C09G100
CPC分类号： H01L21/30625 , C09G1/02 , C09K3/1463 , C23F3/00
摘要： The present invention relates to buffer systems in the form of solutions or salts for preparing suspensions which can be used for chemomechanical polishing. In particular, these buffer systems can be used for preparing suspensions having a high pH of 9.5-13 which are used for the chemomechanical polishing of Si and metal surfaces of semiconductors, known as wafers.
摘要翻译：本发明涉及用于制备可用于化学机械抛光的悬浮液的溶液或盐形式的缓冲系统。特别地，这些缓冲系统可用于制备高pH为9.5-13的悬浮液，其用于化学机械抛光Si和被称为晶片的半导体的金属表面。

6. 发明授权

US06258137B1 CMP products 有权
标题翻译： CMP产品
公开(公告)号：US06258137B1
公开(公告)日：2001-07-10
申请号：US09413518
申请日：1999-10-06
申请人： Ajay K. Garg , Brahmanandam V. Tanikella , William R. Delaney
发明人： Ajay K. Garg , Brahmanandam V. Tanikella , William R. Delaney
IPC分类号： C09G100
CPC分类号： B82Y30/00 , C01F7/442 , C01P2002/01 , C01P2004/52 , C01P2004/64 , C01P2006/12 , C09K3/1436 , C09K3/1463 , Y10T428/2993
摘要： CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
摘要翻译： CMP工艺和产品使用包含粒径小于50纳米且表面积至少为50m 2 / gm的α氧化铝颗粒的氧化铝。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式