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    • 3. 发明授权
    • Dental porcelain
    • 牙科瓷器
    • US06187701B1
    • 2001-02-13
    • US09321551
    • 1999-05-28
    • Masato SekinoHiroyuki NakagawaOsamu IwamotoMasaaki Ushioda
    • Masato SekinoHiroyuki NakagawaOsamu IwamotoMasaaki Ushioda
    • C03B804
    • A61K6/0008A61K6/0017A61K6/0094A61K6/0205A61K6/0215
    • Provided is a porcelain which is suitable as a dental porcelain capable of being fired on a ceramics core and has a low firing temperature and a low thermal expansion coefficient and which is excellent in a chemical durability. The above dental porcelain comprises glass containing silicon oxide, aluminum oxide, boron oxide, zinc oxide, sodium oxide and lithium oxide as principal components. The contents of these respective components in the above glass are 57 to 65% by weight of SiO2, 8 to 18% by weight of Al2O3, 15 to 25% by weight of B2O3, 0.1 to 2% by weight of ZnO, 3 to 7% by weight of Na2O and 2 to 8% by weight of Li2O respectively in terms of a percent by weight based on the total of the respective components when the respective components are reduced to SiO2, Al2O3, B2O3, ZnO, Na2O and Li2O respectively. The particularly preferred dental porcelain comprises glass having a thermal expansion coefficient of 6.0×10−6 (1/°C.) or less as a principal structural component.
    • 本发明提供一种适合作为能够在陶瓷芯上焙烧的牙科瓷,并且具有低烧成温度和低热膨胀系数并且化学耐久性优异的瓷器。 上述牙瓷包含含有氧化硅,氧化铝,氧化硼,氧化锌,氧化钠和氧化锂作为主要成分的玻璃。 上述玻璃中的各成分的含量为SiO 2为57〜65重量%,Al 2 O 3为8〜18重量%,B 2 O 3为15〜25重量%,ZnO为0.1〜2重量%,3〜7 相对于各成分分别还原为SiO 2,Al 2 O 3,B 2 O 3,ZnO,Na 2 O,Li 2 O时,各成分的总量,按重量百分比表示,分别为Na 2 O和2〜8重量%的Li 2 O。 特别优选的牙瓷包含热膨胀系数为6.0×10 -6(1 /℃)以下的玻璃作为主要结构成分。
    • 4. 发明授权
    • Particle deposition system and method
    • 颗粒沉积系统和方法
    • US06789401B1
    • 2004-09-14
    • US09894447
    • 2001-06-28
    • Franklin W. DabbyBedros Orchanian
    • Franklin W. DabbyBedros Orchanian
    • C03B804
    • C03B37/01486C03B37/01406C03B37/0142C03B2207/36C03B2207/66C03B2207/70C03B2207/80
    • A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.
    • 一种用于将化学蒸气沉积到工件上的沉积系统,包括具有用于在工件上进行化学气相沉积的多个部件的沉积室。 沉积室包括由Hasteloy制成的内表皮,用于将多个部件和工件从围绕沉积系统的空气密封,外表皮包围内皮,并通过气隙与内皮隔开。 外皮包括在沉积室的内表皮和外表皮之间的气隙中产生对流的排气口。 沉积系统还具有用于调节进入沉积室的气体和蒸汽的流动的气体面板,以及用于控制气体面板和沉积室中的部件的操作的计算机。
    • 7. 发明授权
    • Manufacturing method of synthetic silica glass
    • 合成石英玻璃的制造方法
    • US06378340B2
    • 2002-04-30
    • US09525231
    • 2000-03-14
    • Seishi FujiwaraNorio KomineHiroki Jinbo
    • Seishi FujiwaraNorio KomineHiroki Jinbo
    • C03B804
    • C03B19/1415C03B2207/32C03B2207/34
    • A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degassed, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
    • 制造合成石英玻璃的方法包括以下步骤:在其中加入包含液体硅化合物的储液罐,使用发泡剂在液态硅化合物中产生气泡,使用脱气,将液态硅化合物置换成蒸发器,除去气泡,同时 控制由液体质量流量计置换的液体硅化合物的量,将置换的液体硅化合物与载气混合以产生气态硅化合物,将气态硅化合物注入合成炉中,并通过水解形成合成二氧化硅玻璃 合成炉中的气态硅化合物。