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1. 发明授权

US06500870B1 Method for manufacturing of silica sols 失效
标题翻译：二氧化硅溶胶的制造方法
公开(公告)号：US06500870B1
公开(公告)日：2002-12-31
申请号：US09713165
申请日：2000-11-15
申请人： Magnus Olof Linsten , Bozena Stanislawa Tokarz , Kenneth Olof Larsson
发明人： Magnus Olof Linsten , Bozena Stanislawa Tokarz , Kenneth Olof Larsson
IPC分类号： C01B33141
CPC分类号： C01B33/1485
摘要： A method for production of high purity silica sols comprising the steps: (a) adding a phosphonic acid-based complexing agent to the silicic acid-containing solution forming complexes with metal cations present in said solution; (b) forming in said silicic acid-containing solution a precipitation containing phosphonic acid-based complexing agent and metal cations; (c) removing the precipitation from the solution; and, (d) polymerising the silicic acid in the solution to obtain a silica sol. The invention also relates to silica sols containing at least one phosphonic acid-based complexing agent.
摘要翻译：一种制备高纯度硅溶胶的方法，包括以下步骤：（a）将磷酸基络合剂加入含硅酸的溶液中，与所述溶液中存在的金属阳离子形成络合物; （b）在所述含硅酸溶液中形成含有膦酸基络合剂和金属阳离子的沉淀物; （c）从溶液中除去沉淀物; 和（d）使溶液中的硅酸聚合，得到二氧化硅溶胶。本发明还涉及含有至少一种基于膦酸的络合剂的硅溶胶。

2. 发明授权

US06486216B1 Stable colloidal silica aquasols 有权
标题翻译：稳定的胶体二氧化硅水溶胶
公开(公告)号：US06486216B1
公开(公告)日：2002-11-26
申请号：US09604335
申请日：2000-06-27
申请人： Bruce A. Keiser , Maureen B. Nunn , Cheng-Sung Huang , Dennis L. MacDonald
发明人： Bruce A. Keiser , Maureen B. Nunn , Cheng-Sung Huang , Dennis L. MacDonald
IPC分类号： C01B33141
CPC分类号： C01B33/1435 , C01B33/143 , D21H17/29 , D21H17/68 , D21H21/10
摘要： A stable aquasol containing colloidal silica having a surface area of from about 700 m2/g to about 1100 m2/g, and an S-value of from about 20 to about 50; wherein the colloidal silica is not surface treated; wherein the molar ratio of SiO2/Na2O in the colloidal silica is greater than about 13.0:1 and is less than about 17.0:1; and wherein the aquasols have a percent by weight SiO2 solids level of from about 7.00 percent to about 16.80 percent is described and claimed.
摘要翻译：一种稳定的含有胶体二氧化硅的水溶胶，其表面积为约700m 2 / g至约1100m 2 / g，S值为约20至约50; 其中所述胶体二氧化硅未进行表面处理; 其中所述胶体二氧化硅中SiO 2 / Na 2 O的摩尔比大于约13.0:1且小于约17.0:1; 并且其中所述水溶胶具有约7.00重量％至约16.80重量％的SiO 2固体含量的百分比。

3. 发明授权

US06372806B1 Method of making colloidal silica 有权
标题翻译：制备胶体二氧化硅的方法
公开(公告)号：US06372806B1
公开(公告)日：2002-04-16
申请号：US09504320
申请日：2000-02-14
申请人： Bruce A. Keiser , Maureen B. Nunn , Cheng-Sung Huang , Dennis L. MacDonald
发明人： Bruce A. Keiser , Maureen B. Nunn , Cheng-Sung Huang , Dennis L. MacDonald
IPC分类号： C01B33141
CPC分类号： C01B33/1435 , C01B33/143 , D21H17/29 , D21H17/68 , D21H21/10
摘要： Disclosed are stable, aqueous colloidal silicas having surface area of greater than 700 m2/g and S-values of from 20-50. These colloidal silicas do not require treatment with surface treatment agents such as aluminum to achieve stability. These colloidal silica aquasols can be produced and stored at concentrations of greater than 7 percent by weight SiO2 solids, and even as high as 15 percent by weight solids or higher, and remain stable at room temperature for at least 30 days compared to art-known silica aquasols. These colloidal silica sols demonstrate advantageously improved performance over art-known colloidal silica sots in applications such as in drainage and retention in papermaking processes. Also disclosed are processes for making aqueous colloidal silicas of the invention and the use of such colloidal silicas in papermaking processes.
摘要翻译：公开了表面积大于700m 2 / g且S值为20-50的稳定的水性胶体二氧化硅。这些胶体二氧化硅不需要用表面处理剂如铝处理以达到稳定性。这些胶体二氧化硅水溶胶可以以大于7重量％的SiO 2固体，甚至高达15重量％固体或更高的浓度生产和储存，并且在室温下保持稳定至少30天，与本领域已知的二氧化硅水溶胶。这些胶体二氧化硅溶胶在诸如在造纸过程中的排水和保留等应用中证明有利地改进了本领域已知的胶态二氧化硅沉淀物的性能。还公开了制备本发明的水性胶体二氧化硅的方法以及这种胶体二氧化硅在造纸方法中的用途。

4. 发明授权

US06248144B1 Process for producing polishing composition 有权
标题翻译：抛光组合物的制造方法
公开(公告)号：US06248144B1
公开(公告)日：2001-06-19
申请号：US09616974
申请日：2000-07-14
申请人： Kazusei Tamai , Katsuyoshi Ina
发明人： Kazusei Tamai , Katsuyoshi Ina
IPC分类号： C01B33141
CPC分类号： C09G1/02 , B01F3/1214 , B01F2003/125 , B01F2215/0045 , H01L21/30625
摘要： A process for producing a polishing composition, which comprises preliminarily adjusting water to pH 2-4, adding from 40 to 60 wt % of fumed silica to the water under high shearing force, adding water to lower the viscosity to 2-10000 cps, stirring the mixture under low shearing force for at least 5 minutes, adding water to lower the fumed silica concentration to 10-38 wt %, and adding a basic substance under vigorous stirring to raise the pH to 9-12.
摘要翻译：一种抛光组合物的制造方法，其特征在于，将水预先调节至pH2〜2-4，在高剪切力下，向水中添加40〜60重量％的热解法二氧化硅，加入水使粘度降至2-10000cps，搅拌该混合物在低剪切力下至少5分钟，加入水以将煅制二氧化硅浓度降低至10-38重量％，并在剧烈搅拌下加入碱性物质以将pH升高至9-12。

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