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1. 发明授权

US07371992B2 Method for non-contact cleaning of a surface 失效
标题翻译：表面非接触清洁方法
公开(公告)号：US07371992B2
公开(公告)日：2008-05-13
申请号：US10384506
申请日：2003-03-07
申请人： Jeffrey W. Carr
发明人： Jeffrey W. Carr
IPC分类号： B23K10/06
CPC分类号： H01L21/02046 , B08B7/0035 , C03C23/007 , C03C23/0075 , G03F1/82 , H01L21/3065 , H01L21/67028 , H05H1/30
摘要： A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the feed gases of the torch. Reactive atom plasma processing can be used to clean the surface of a contaminant that chemically combines with the atomic radicals of the precursor without affecting the surface. The torch can also be used to modify the surface after cleaning, without transferring the object or engaging in any intermediate processing, by supplying a second reactive precursor that reacts with the surface itself. The flame torch can be used to shape, polish, etch, planarize, deposit, chemically modify and/or redistribute material on the surface of the object.This description is not intended to be a complete description of, or limit the scope of, the invention. Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.
摘要翻译：火焰焰炬可用于通过向火炬的进料气体提供反应性前体气体来清洁诸如玻璃光学元件，极薄工件或半导体晶片的接触敏感物体的表面。反应性原子等离子体处理可用于清洁与前体的原子自由基化学结合而不影响表面的污染物的表面。通过提供与表面本身反应的第二反应性前体，手电筒也可用于在清洁之后改变表面，而不转移物体或进行任何中间加工。火焰焰炬可用于在物体的表面上成形，抛光，蚀刻，平面化，沉积，化学修饰和/或重新分布材料。本说明书不是对本发明的完整描述或限制本发明的范围。本发明的其它特征，方面和目的可以通过对说明书，附图和权利要求的评述来获得。

2. 发明授权

US07273995B1 Plasma generator 失效
标题翻译：等离子发生器
公开(公告)号：US07273995B1
公开(公告)日：2007-09-25
申请号：US10344345
申请日：1999-11-23
申请人： Andreas Manz , Jan Cornelis Titus Eijkel , Herbert Stoeri
发明人： Andreas Manz , Jan Cornelis Titus Eijkel , Herbert Stoeri
IPC分类号： B23K10/06
CPC分类号： H05H1/48
摘要： A microfabricated plasma generator and a method of generating a plasma, the plasma generator comprising: a substrate chip; a chamber defined by the substrate chip, the chamber including an inlet port through which analyte is in use delivered, an outlet port and a plasma-generation region in which a plasma is in use generated; and first and second electrodes across which a voltage is in use applied to generate a plasma in the plasma-generation region.
摘要翻译：一种微制造等离子体发生器和产生等离子体的方法，所述等离子体发生器包括：衬底芯片; 由所述衬底芯片限定的腔室，所述腔室包括被分析物在使用中被输送的入口端口，其中使用等离子体的出口端口和等离子体产生区域; 以及施加电压的第一和第二电极，用于在等离子体产生区域中产生等离子体。

3. 发明授权

US07247392B2 Aluminum alloy heat exchanger and method of producing the same 有权
标题翻译：铝合金换热器及其制造方法
公开(公告)号：US07247392B2
公开(公告)日：2007-07-24
申请号：US10999232
申请日：2004-11-30
申请人： Kazumitsu Sugano , Noriyuki Yamada , Akio Niikura , Yoshiaki Ogiwara , Masaki Shimizu , Kenji Negura , Sunao Fukuda , Yoshihiko Kamiya
发明人： Kazumitsu Sugano , Noriyuki Yamada , Akio Niikura , Yoshiaki Ogiwara , Masaki Shimizu , Kenji Negura , Sunao Fukuda , Yoshihiko Kamiya
IPC分类号： B32B15/20 , F28F21/08 , B23K101/14 , B23K10/06
CPC分类号： F28F21/089 , F28F19/06 , F28F21/084 , Y10S165/905 , Y10S428/933 , Y10T428/12458 , Y10T428/12764
摘要： An aluminum alloy heat exchanger having a tube composed of a thin aluminum alloy clad material, wherein, in the clad material, one face of an aluminum alloy core material containing Si 0.05–1.0 mass % is clad with an Al—Si-series filler material containing Si 5–20 mass %, and the other face is clad with a sacrificial material containing Zn 2–10 mass % and/or Mg 1–5 mass %, and wherein an element diffusion profile of the clad material by EPMA satisfies (1) and/or (2): L-LSi-LZn≧40(μm) (1) L-LSi-LMg≧5(μm) (2) wherein L is a tube wall thickness (μm); LSi is a position (μm) indicating an amount of Si diffused from the filler material; and LZn and LMg each represent a region (μm) indicating an amount of Zn or Mg diffused from the sacrificial material, respectively; and a method of producing the heat exchanger.
摘要翻译：一种铝合金热交换器，其具有由铝合金包覆材料制成的管，其中，在包层材料中，含有0.05〜1.0质量％的Si的铝合金芯材的一面用Al-Si系填料含有5-20质量％的Si，另一面用包含Zn 2-10质量％和/或Mg 1-5质量％的牺牲材料包覆，其中EPMA的包层材料的元素扩散分布满足（1 ）和/或（2）：<？in-line-formula description =“In-line Formulas”end =“lead”？> LL = 40（mum）（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead” （2）<？在线公式描述=“在线公式”end =“尾” 其中L是管壁厚度（mum）; L Si是表示从填充材料扩散的Si的量的位置（母体）和L＆lt; Zn＆gt;和L＆lt; M＆gt;分别表示表示从牺牲材料扩散的Zn或Mg的量的区域（母体）。以及制造该热交换器的方法。

4. 发明授权

US07186943B2 MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression 失效
标题翻译： MERIE等离子体反应器，其顶置RF电极通过电弧抑制调谐到等离子体
公开(公告)号：US07186943B2
公开(公告)日：2007-03-06
申请号：US11105307
申请日：2005-04-12
申请人： Daniel J. Hoffman , Yan Ye , Dan Katz , Douglas A. Buchberger, Jr. , Xiaoye Zhao , Kang-Lie Chiang , Robert B. Hagen , Matthew L. Miller
发明人： Daniel J. Hoffman , Yan Ye , Dan Katz , Douglas A. Buchberger, Jr. , Xiaoye Zhao , Kang-Lie Chiang , Robert B. Hagen , Matthew L. Miller
IPC分类号： B23K10/06
CPC分类号： H01J37/3244 , H01J37/32082 , H01J37/32183 , H01J37/3266
摘要： A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for supplying power at a frequency of the generator to the overhead electrode and capable of maintaining a plasma within the chamber at a desired plasma ion density level. The overhead electrode has a capacitance such that the overhead electrode and the plasma formed in the chamber at the desired plasma ion density resonate together at an electrode-plasma resonant frequency, the frequency of the generator being at least near the electrode-plasma resonant frequency. The reactor further includes a set of MERIE magnets surrounding the plasma process area overlying the wafer surface that produce a slowly circulating magnetic field which stirs the plasma to improve plasma ion density distribution uniformity.
摘要翻译：一种用于处理半导体工件的等离子体反应器，包括具有室壁并具有用于保持半导体支撑件的工件支撑件的反应室，所述电极包括室壁的一部分，RF发电机，用于以发电机到顶置电极并且能够将室内的等离子体保持在期望的等离子体离子密度水平。顶置电极具有这样的电容，使得在期望的等离子体离子密度下在室中形成的顶置电极和等离子体以电极 - 等离子体共振频率共振，发电机的频率至少接近电极 - 等离子体共振频率。反应器还包括围绕晶片表面的等离子体处理区域的一组MERIE磁体，其产生缓慢循环的磁场，其搅动等离子体以改善等离子体离子密度分布均匀性。

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