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USRE38097E1 Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports 有权
标题翻译：具有等离子体室的化学气相沉积系统具有分离的工艺气体和清洁气体注入口
公开(公告)号：USRE38097E1
公开(公告)日：2003-04-29
申请号：US09989106
申请日：2001-11-21
申请人： David Trussell , C. Robert Koemtzopoulos , Felix Kozakevich
发明人： David Trussell , C. Robert Koemtzopoulos , Felix Kozakevich
IPC分类号： B08B9100
CPC分类号： C23C16/45563 , C23C16/4405 , H01J37/32192 , H01J37/32862
摘要： A method and arrangement for the insitu cleaning of a chamber in which process gas is injected into the chamber through gas injection ports. Separate gas injection ports through which process gas and the cleaning gas are injected into the chamber are provided. The process gas is injected into the chamber, such as a plasma chamber, through a first gas injection port while the cleaning gas, which cleans the residue left by the process gas during the deposition process, is injected into the chamber through the second gas injection port that is separate from the first gas injection port through which the process gas is injected. The separation of the gas injection ports provides an equalized pressure within the jet screw ports for the process gas and the interior of the chamber. This allows the jet screw ports to be maximally cleaned and reduces the frequency of replacement of the jet screw ports in the chamber.
摘要翻译：一种用于本体清洁腔室的方法和装置，其中工艺气体通过气体注入口注入到腔室中。提供了将过程气体和清洁气体注入室中的独立气体注入口。将处理气体通过第一气体注入口注入到诸如等离子体室的室中，同时清洁在沉积过程中由工艺气体留下的残余物的清洁气体通过第二气体注射注入到室中端口，其与注入工艺气体的第一气体注入口分离。气体喷射端口的分离为处理气体和室内部的喷射螺杆端口提供均衡的压力。这允许喷射螺杆端口被最大限度地清洁并且降低了腔室中的喷射螺杆端口的更换频率。

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