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1. 发明专利

CZ5460U1 Device for separating coarse impurities of cleansing liquid within portable containers 未知
公开(公告)号：CZ5460U1
公开(公告)日：1997-02-12
申请号：CZ588396
申请日：1996-10-17
申请人： NEMEC JOSEF
发明人： NEMEC JOSEF
IPC分类号： B08B3/14 , B01D21/00 , B08B1/00 , B08B003/14 , B01D021/00 , B08B001/00

2. 发明申请

US20030183253A1 Cleaning method 有权
标题翻译：清洗方法
公开(公告)号：US20030183253A1
公开(公告)日：2003-10-02
申请号：US10363346
申请日：2003-02-28
发明人： Gay Joyce Cornelius , Malcolm Tom Mckechnie
IPC分类号： B08B003/14
CPC分类号： C11D17/046 , C02F5/10 , C11D11/0017 , C11D11/0023 , C11D17/04
摘要： A method of cleaning household articles entails contacting cleaning water with a container containing a substantially water-insoluble modifying agent able to bind calcium ions. The container is permeable to water and to calcium ions but retains the modifying agent. The container may be a bag, for example of textile or paper.
摘要翻译：清洁家用物品的方法需要将清洁水与容纳能够结合钙离子的基本上不溶于水的改性剂的容器接触。容器对水和钙离子是可渗透的，但保留改性剂。容器可以是例如织物或纸的袋子。

3. 发明申请

US20030148906A1 Stable liquid or gel bleaching composition containing diacyl peroxide particles 审中-公开
标题翻译：含有二酰基过氧化物颗粒的稳定的液体或凝胶漂白组合物
公开(公告)号：US20030148906A1
公开(公告)日：2003-08-07
申请号：US10349734
申请日：2003-01-23
申请人： The Procter & Gamble Company
发明人： Elizabeth Ann Alam , Marie Rose Salem , Leslie Dawn Waits , Brian Xiaoqing Song
IPC分类号： B08B007/00 , B08B009/20 , B08B003/14 , B08B003/00 , C11D001/00 , C23G001/00
CPC分类号： C11D11/0035 , C11D3/3945 , C11D3/3947
摘要： Liquid or gel bleaching compositions comprising a diacyl peroxide, thickener, and water are disclosed. Preferred compositions are for use in automatic dishwashing machines. The compositions are effective in removing stains, especially carotenoid stains, from plastics while minimizing deposition.
摘要翻译：公开了包含二酰基过氧化物，增稠剂和水的液体或凝胶漂白组合物。优选的组合物用于自动洗碗机。该组合物有效地从塑料中去除污渍，特别是类胡萝卜素污渍，同时使沉积最小化。

4. 发明申请

US20030134037A1 Method for cleaning and renovating pipelines 失效
标题翻译：清洁和更新管道的方法
公开(公告)号：US20030134037A1
公开(公告)日：2003-07-17
申请号：US10317254
申请日：2002-12-10
申请人： JE Cleanpress Ltd. Co.
发明人： Xiao Ming Wang , Xiao Jun Wang
IPC分类号： B08B007/00 , B08B009/00 , B08B009/027 , B08B009/093 , B08B003/00 , B08B003/14
CPC分类号： B08B9/057 , B24C3/327
摘要： A pipeline cleaning and renovating method of the present invention comprises introduction of abrasive particulates by pressurized air through the pipelines to remove the incrustation adhering to the inner surface of the pipelines. Water or other liquids are introduced into the pipelines to generate or increase a moisture content in a flow of the pressurized air. The air flow through the pipelines is controlled to induce a substantially helical flow pattern such that a substantial amount of abrasive particulates are driven by the air flow to move along the inner surface of the pipeline in order to efficiently remove the incrustation. After the pipelines are cleaned, a coating material is added into the pipelines and driven by the air flow in the substantially helical flow pattern to provide an even coating film on the cleaned inner surface of the pipelines. This method can be broadly applied to various types of pipelines and various diameters of the pipelines from 13 mm to 300 mm. The length of the pipeline being cleaned at one time can be from several hundred meters to more than one kilometer, depending on the type of pipeline.
摘要翻译：本发明的管道清洗和更新方法包括通过管道引入加压空气的磨料颗粒以除去附着在管道内表面上的结垢。将水或其它液体引入管道中以产生或增加加压空气流中的含水量。通过管道的空气流被控制以引起基本上螺旋的流动模式，使得大量的磨料颗粒被空气流驱动以沿着管道的内表面移动，以有效地去除结垢。在管道被清洁之后，将涂料添加到管道中并由基本上螺旋状流动图案中的空气流驱动，以在管道的净化内表面上提供均匀的涂膜。该方法可广泛应用于各种类型的管道和管道的各种直径从13mm到300mm。根据管道类型，一次清洁的管道的长度可以从几百米到一公里以上。

5. 发明申请

US20030005945A1 Method for surface-treatment, surface-treated article and device for surface treatment 失效
标题翻译：表面处理方法，表面处理制品和表面处理装置
公开(公告)号：US20030005945A1
公开(公告)日：2003-01-09
申请号：US10009884
申请日：2001-11-13
发明人： Hiroyuki Onishi , Shinya Yamagata , Masahiro Hanmura , Masaya Shibatani , Fumie Uehara
IPC分类号： B08B007/00 , C23G001/00 , C03C023/00 , C23G001/02 , B08B003/00 , B08B003/14 , B41J002/01
CPC分类号： B41M7/0018 , B41J11/0015 , B41M5/0017 , B41M5/508 , B41M5/5218 , B41M7/0045
摘要： nullThe present inventionnull provides a surface treatment method for recorded matter which can improve the weather resistance characteristics such as light resistance, gas resistance and the like of recorded matter in which images are recorded on the recording medium, as well as providing a surface-treated product using this surface treatment method, and a surface treatment apparatus. The surface treatment method of the present invention is characterized in that the surface of recorded matter in which images are recorded on a recording medium is treated using a specified treatment agent. The abovementioned treatment agent is a treatment agent which contains one or more active constituents selected from the group consisting of sulfur compounds, nitrogen compounds,. fluorine compounds, natural resins and synthetic resins, or a treatment agent comprising water or an organic solvent.
摘要翻译： [本发明]提供了一种用于记录物质的表面处理方法，其可以改善记录物质的记录物质的耐光性，耐气体性等耐候性特性，其中，图像被记录在记录介质上，使用该表面处理方法的处理物，以及表面处理装置。本发明的表面处理方法的特征在于，使用规定的处理剂对图像记录在记录介质上的记录物的表面进行处理。上述处理剂是含有一种或多种选自硫化合物，氮化合物的活性成分的处理剂。氟化合物，天然树脂和合成树脂，或包含水或有机溶剂的处理剂。

6. 发明申请

US20020144717A1 Critical and supercritical cleaning of hydrocarbon-containing materials 失效
标题翻译：含烃材料的临界和超临界清洗
公开(公告)号：US20020144717A1
公开(公告)日：2002-10-10
申请号：US10066291
申请日：2002-01-31
发明人： Ian Tunnicliffe , Raymond Mt. Joy
IPC分类号： B08B003/00 , B08B003/14 , B08B007/00
CPC分类号： E21B21/066 , B01D11/0203 , B01D11/028 , B01D11/0403 , B01D11/0407 , B01D11/0488 , C10G1/04 , C10G21/00 , C10G21/006 , C10G21/06
摘要： A method for cleaning materials containing solids and/or liquids is disclosed which involves contacting the materials with an extracting fluid including Xe, NH3, lower aromatics, nitrous oxide, water, CO, CO2, H2O, lower alcohols, lower alkanes, lower alkenes, or mixtures or combinations thereof under conditions of temperature and pressure sufficient to maintain the fluid at, near or above its critical point and to products derived therefrom.
摘要翻译：公开了一种用于清洁含有固体和/或液体的材料的方法，其包括将材料与包括Xe，NH 3，低级芳族化合物，一氧化二氮，水，CO，CO 2，H 2 O，低级醇，低级烷烃，低级烯烃，或其混合物或组合，其温度和压力足以使流体保持在其临界点附近或之上，并且产生的产物。

7. 发明申请

US20020077259A1 Stabilized alkaline compositions for cleaning microlelectronic substrates 有权
标题翻译：用于清洁微电子底物的稳定的碱性组合物
公开(公告)号：US20020077259A1
公开(公告)日：2002-06-20
申请号：US09859142
申请日：2001-05-16
发明人： David C. Skee
IPC分类号： B08B007/00 , B08B003/00 , C23G001/00 , C23G001/02 , C03C023/00 , F23J001/00 , B08B003/10 , B08B003/14
CPC分类号： H01L21/02063 , C11D3/0073 , C11D7/261 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F1/32 , C23G1/20 , C23G1/22 , G03F7/425 , H01L21/02052 , H01L21/02071 , H01L21/31133 , Y10S134/902 , Y10S438/906
摘要： The invention provides aqueous alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions typically contain (a) one or more metal ion-free bases at sufficient amounts to produce a pH of about 10-13 and one or more bath stabilizing agents having at least one pKa in the range of 10-13 to maintain this pH during use; (b) optionally, about 0.01 % to about 5% by weight (expressed as % SiO2) of a water-soluble metal ion-free silicate; (c) optionally, about 0.01% to about 10% by weight of one or more chelating agents; (d) optionally, about 0.01% to about 80% by weight of one or more water-soluble organic co-solvents; and (e) optionally, about 0.01% to about 1% by weight of a water-soluble surfactant.
摘要翻译：本发明提供了用于微电子工业的含水碱性组合物，用于通过去除光致抗蚀剂残余物和其它不需要的污染物来剥离或清洁半导体晶片衬底组合物通常含有（a）足够量的一种或多种不含金属离子的碱，以产生约10-13的pH和一种或多种具有至少一个pKa在10-13范围内的浴稳定剂以保持该pH 使用期间（b）任选的水溶性金属离子的硅酸盐的约0.01重量％至约5重量％（以SiO 2表示）（c）任选地，约0.01重量％至约10重量％的一种或多种螯合剂; （d）任选地，约0.01％至约80％重量的一种或多种水溶性有机助溶剂; 和（e）任选地，约0.01重量％至约1重量％的水溶性表面活性剂。

8. 发明申请

US20020074017A1 Cleaning of internal passages of airfoils 有权
公开(公告)号：US20020074017A1
公开(公告)日：2002-06-20
申请号：US09740704
申请日：2000-12-19
发明人： John E. Schilbe , Rebecca J. Boczkaja , Bruce M. Warnes
IPC分类号： C23G001/00 , B08B009/00 , C03C023/00 , B08B009/027 , B08B003/00 , B08B003/14 , B08B007/00
CPC分类号： F01D25/007 , B08B3/08 , B08B9/00 , B08B9/02 , C23G1/10 , C23G1/32 , F01D25/002 , F02C7/30 , F05D2260/607 , Y02T50/67 , Y02T50/671 , Y02T50/675
摘要： A chemical cleaning method for cleaning an internal passage of an engine-run gas turbine engine airfoil wherein the airfoil is immersed in an inorganic hydroxide medium at superambient temperature and atmospheric pressure for a short time to remove accumulated oxides and dirt from the internal passage. The hydroxide medium can comprise molten KOH and immersion times of the engine-run airfoil not exceeding 10 minutes are involved.

9. 发明申请

US20020023664A1 Process for the chemical treatment of semiconductor wafers 失效
公开(公告)号：US20020023664A1
公开(公告)日：2002-02-28
申请号：US09882207
申请日：2001-06-15
申请人： WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG
发明人： Roland Brunner
IPC分类号： B08B003/04 , C23G001/00 , C03C023/00 , C23G001/02 , B08B003/00 , B08B003/14 , B08B007/00
CPC分类号： H01L21/02049 , H01L21/02052 , Y10S134/902
摘要： A process for the chemical treatment of semiconductor wafers in the presence of HF and then in the presence of ozone, in particular for the cleaning of silicon semiconductor wafers, is such that the semiconductor wafers that are treated with the medium containing ozone are free of aqueous HF.

10. 发明申请

US20040129295A1 Chemical composition and method 审中-公开
标题翻译：化学成分及方法
公开(公告)号：US20040129295A1
公开(公告)日：2004-07-08
申请号：US10691555
申请日：2003-10-24
发明人： David C. Lovetro , David J. Bonislawski , Laural C. Webb
IPC分类号： B08B003/14 , B08B007/00
CPC分类号： C05B17/02 , C01B15/037 , C05B17/00 , Y10S71/903 , C05D9/02
摘要： The invention relates to a process for cleaning metals comprising a step of contacting a metal with an aqueous solution comprising hydrogen peroxide and at least one compound selected from the group consisting of complexing agents based on phosphonic acids, salts and degradation products thereof in an amount from about 10 to about 60 wt % based on the amount of hydrogen peroxide.
摘要翻译：本发明涉及一种清洁金属的方法，包括使金属与包含过氧化氢和至少一种选自基于膦酸的络合剂，其盐和降解产物的至少一种化合物的水溶液接触的步骤，其量为约10至约60重量％，基于过氧化氢的量。

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