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    • 8. 发明授权
    • Method of forming first order transition films
    • 形成一阶转换膜的方法
    • US3741823A
    • 1973-06-26
    • US3741823D
    • 1970-10-26
    • GEN ELECTRIC
    • LOMMEL J
    • G11B13/04H01F10/32H01F1/02
    • B82Y25/00G11B13/045H01F10/002H01F10/325
    • THIN FILMS OF ION-RHODIUM EXHIBITING A BROADLY HYSTERIC FIRST ORDER TRANSISTION BETWEEN THE FERROMAGNETIC AND ANTIFERROMAGNETIC STATES ARE PRODUCED BY SEQUENTIALLY DEPOSITING IRON AND RHODIUM FILMS UPON A REFRACTORY SUBSTRATE AT A PRESSURE IN THE RANGE OF 1X10**-6 TORR, ANNEALING THE STRUCTURE IN A VACUUM OF 1X10**-6 TORR AT A TEMPERATURE OF APPROXIMATELY 700* C. FOR 1 HOUR TO PRODUCE A COMPLETE DIFFUSION OF THE IRON AND RHODIUM LAYERS, AND SUBSEQUENTLY SUBJECTING THE DIFFUSED LAYERS TO A SECOND ANNEAL IN AN ATMOSPHERE GREATER THAN 10 PARTS PER MILLION OXYGEN IN A THERMAL CYCLE THAT INCLUDES SLOWLY HEATING THE STRUCTURE TO 400* C., MAINTAINING THE 400* C. FOR APPROXIMATELY 10 MINUTES AND SLOWLY COOLING TO ROOM TEMPERATURE. FILMS THUS FORMED ARE ADVANTAGEOUSLY EMPOLYED IN THE RECORDING OF DIGITAL INFORMATION BY ELECTRON BEAM HEATING INDIVIDUAL REGIONS THROUGH A FIRST ORDER TRANSISTION TO THE FERROMAGNETIC STATE WHEREUPON THE REGIONS ARE PERMITTED TO COOL TO A BIASING TEMPERATURE SLIGHTLY HIGHER THAN THE TEMPERATURE OF TRANSISTION BACK TO AN ANTIFEROMAGNETIC STATE. A MAGNETIC FIELD THEN IS APPLIED TO THE ENTIRE FILM TO MAGNETIZE ONLY THOSE REGIONS OF THE FILM IN THE FERROMAGNETIC STATE AND READOUT OF THE RECORDED INFORMATION CAN BE ACHIEVED BY CONVENTIONAL ELECTRON BEAM MICROSCOPY. THE FERROMAGNETISM OF THE FILM SUBSEQUENTLY CAN BE ERASED BY COOLING THE FILM BELOW THE TRANSISTION TEMPERATURE TO THE ANTIFERROMAGNETIC STATE OR BY THE APPLICATION OF A STRAIN TO THE FILM.
    • 9. 发明公开
    • Antiferromagnetic memory device
    • 反铁磁性研究
    • EP3001470A1
    • 2016-03-30
    • EP14186900.8
    • 2014-09-29
    • Hitachi, Ltd.
    • Wunderlich, JoergMarti, XavierJungwirth, Tomas
    • H01L43/00G11C11/16H01L43/10
    • H01L43/00G11C11/16G11C11/161G11C11/1675H01F10/002H01L43/10
    • An antiferromagnetic memory device (1) is described. The memory device comprises an antiferromagnetic region (4) having a broken inversion symmetry along an axis (5), for example, by virtue of having bulk broken inversion symmetry in part of the unit cell corresponding to the antiferromagnetic spin sublattice or in the full unit cell or by virtue of being sufficiently thin and having broken structural inversion symmetry. The antiferromagnetic region (4) may comprise di-manganese gold (Mn 2 Au). The antiferromagnetic region (4) has an antiferromagnetic spin axis (6) which is selectively orientable along first and second easy axes (7 1 , 7 2 ) which are not parallel to the axis along which inversion symmetry is broken. The memory device also comprises a conductive channel configured to define a conductive path (10 1 ) through the antiferromagnetic region which is substantially not parallel to the axis along which inversion symmetry is broken or the device comprises a conductive path (50 1 ) through a paramagnetic or diamagnetic region adjacent to the antiferromagnetic region so as to cause spin-polarised current to diffuse into the antiferromagnetic region.
    • 描述了反铁磁存储器件(1)。 存储器件包括具有沿着轴线(5)具有破坏的反转对称性的反铁磁区域(4),例如,由于在对应于反铁磁自旋子晶格的单位单元的一部分中具有体积破碎的反转对称,或者在整个单元 或者由于足够薄并具有断裂的结构反演对称性。 反铁磁性区域(4)可以包含二锰金(Mn 2 Au)。 反铁磁区域(4)具有反铁磁旋转轴线(6),该反铁磁旋转轴线可以沿着第一和第二容易轴(7a,7b)选择性地定向,所述第一和第二容易轴线不平行于反转对称性被破坏的轴线。 存储器件还包括导电通道,其被配置为通过反铁磁区域限定导电路径(10 1),所述反铁磁区域基本上不平行于反转对称性断开的轴线,或者该器件包括通过顺磁性的导电路径(50 1) 或与反铁磁性区域相邻的抗磁性区域,以使自旋极化电流扩散到反铁磁性区域。