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1. 发明公开

CN1834783A 负型感光树脂组合物无效
公开(公告)号：CN1834783A
公开(公告)日：2006-09-20
申请号：CN200610058835.8
申请日：2006-03-01
申请人：罗门哈斯电子材料有限公司
发明人：荒尾圭 , 野村真
IPC分类号： G03F7/027 , G03F7/033 , G03F7/004
CPC分类号： G03F7/0382 , G03F7/0381
摘要：本发明提供用于在硅晶片上或印刷线路板上形成中间层绝缘层的负型感光树脂组合物。所述组合物包括乙烯基苯酚树脂、联苯基－苯酚树脂和含环氧基的材料。还提供使用该组合物形成有图案的介电膜的方法。该树脂组合物可用在芯片规格等级包装的制造中，例如，用作中间层绝缘层。

2. 发明公开

EP0667877A1 EINKOMPONENTIGES REAKTIONSHARZSYSTEM 失效
标题翻译：单组分反应树脂体系。
公开(公告)号：EP0667877A1
公开(公告)日：1995-08-23
申请号：EP93924006.0
申请日：1993-10-27
申请人： SIEMENS AKTIENGESELLSCHAFT
发明人： BAYER, Heiner , PLUNDRICH, Winfried , WIPFELDER, Ernst
IPC分类号： C08G59 , G03F7 , H01B3
CPC分类号： H01B3/40 , C08G59/226 , C08G59/304 , C08G59/38 , G03F7/0381
摘要： A unitary reaction resin system that is stable in storage and yet cures well consists of a mixture of commercially available epoxy resins and phosphorus-containing glycidyl esters, in particular phosphonic acid diglycidyl esters, and of cationic photo initiators. The low-viscosity reaction resin systems are not curable by purely thermal means and can be processed at high temperatures and in particular be highly filled. The reaction resin systems, which are also stable in storage after UV activation, can under moderate conditions be cured into flame-resistant molding materials.

3. 发明申请

WO1994007183A1 ULTRAVIOLET LIGHT SENSITIVE ONIUM SALTS AND THE USE THEREOF AS PHOTOINITIATORS 审中-公开
标题翻译：超紫外线敏感性钠盐及其作为光敏剂的用途
公开(公告)号：WO1994007183A1
公开(公告)日：1994-03-31
申请号：PCT/US1993008092
申请日：1993-08-30
申请人： EASTMAN KODAK COMPANY
发明人： EASTMAN KODAK COMPANY , SAEVA, Franklin, Donald
IPC分类号： G03F07/029
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/0381 , G03F7/039 , G03G5/026
摘要： A composition of matter including an onium salt and a method of forming images. The onium salt has a chromophore which absorbs ultraviolet radiation, an S, Se, As, N or P atom which is free of substituents exhibiting a higher energy occupied molecular orbital than the chromophore; an insulating group which links the chromophore to the S, Se, As, N or P atom of the salt and substantially prevents (pi) resonance from the chromophore through the S, Se, As, N or P atom; and an anion. The onium salt is capable of forming a Bronsted acid upon exposure to ultraviolet radiation in the presence of a proton source. In the method of forming images, the onium salt is exposed to ultraviolet radiation in the presence of a proton source, to convert said onium salt to a Bronsted acid.
摘要翻译：包含鎓盐的物质组合物和形成图像的方法。鎓盐具有吸收紫外线辐射的发色团，不具有比发色团具有更高能量占据分子轨道的取代基的S，Se，As，N或P原子; 将发色团连接到盐的S，Se，As，N或P原子的绝缘基团，并且基本上防止（pi）从发色团通过S，Se，As，N或P原子的共振; 和阴离子。鎓盐在质子源存在下暴露于紫外线辐射下能够形成布朗斯台德酸。在形成图像的方法中，鎓盐在质子源存在下暴露于紫外线辐射，以将所述鎓盐转化成布朗斯台德酸。

4. 发明授权

US10635001B2 Patterned bank structures on substrates and formation method 有权
公开(公告)号：US10635001B2
公开(公告)日：2020-04-28
申请号：US15753837
申请日：2016-07-25
申请人： Merck Patent GmbH
发明人： Li Wei Tan , Pawel Miskiewicz , Graham Smith
IPC分类号： G03F7/38 , G03F7/40 , H01L31/04 , G03F7/022 , G03F7/004 , G03F7/023 , G03F7/035 , G03F7/038 , G03F7/00 , H01L21/3205 , H01L51/50
CPC分类号： G03F7/40 , G03F7/0048 , G03F7/022 , G03F7/0226 , G03F7/0236 , G03F7/035 , G03F7/0381 , G03F7/38 , G03F7/0007 , H01L21/3205 , H01L31/04 , H01L51/5012
摘要： A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.

5. 发明申请

US20060199098A1 Negative-type photosensitive resin composition containing epoxy-containing material 审中-公开
标题翻译：含有含环氧材料的负型感光性树脂组合物
公开(公告)号：US20060199098A1
公开(公告)日：2006-09-07
申请号：US11365100
申请日：2006-03-01
申请人： Kei Arao , Makoto Nomura
发明人： Kei Arao , Makoto Nomura
IPC分类号： G03C1/76
CPC分类号： G03F7/0382 , G03F7/0381
摘要： Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.
摘要翻译：提供可以用于在硅晶片或印刷线路板上形成层间绝缘层的负型感光性树脂组合物。组合物包括乙烯基苯酚树脂，联苯酚树脂和含环氧树脂的材料。还提供了使用这种组合物形成图案化电介质膜的方法。树脂组合物可用于制造晶片级芯片级封装和LSI，例如作为层间绝缘层。

6. 发明授权

US4251619A Process for forming photo-polymeric image 失效
标题翻译：形成光聚合物图像的方法
公开(公告)号：US4251619A
公开(公告)日：1981-02-17
申请号：US105540
申请日：1979-12-20
申请人： Yoshio Kurita
发明人： Yoshio Kurita
IPC分类号： G03F7/26 , G03F7/004 , G03F7/023 , G03F7/027 , G03F7/033 , G03F7/038 , G03F7/105 , G03F7/20 , H05K3/00 , G03C5/04 , G03C1/68
CPC分类号： G03F7/0381 , G03F7/023 , G03F7/105 , G03F7/027 , G03F7/033 , Y10S522/91
摘要： This invention relates to a process for forming photo-polymerized images in light sensitive layers containing an activated component, a light sensitive resin and a colorable or decolorable component. Upon exposure to activating radiation the colored component is decolored or the decolorable component is colored and the energy involved is transferred to the light sensitive resin for polymerization.
摘要翻译：本发明涉及在含有活化成分，光敏树脂和可着色或不可剥离成分的光敏层中形成光聚合图像的方法。暴露于活化辐射后，着色组分脱色或不可脱色组分着色，所涉及的能量转移到光敏树脂进行聚合。

7. 发明授权

US3231377A Photosensitive compositions containing polyethylene oxide, a phenolic resin, and a photosensitive compound and process for producing printing plates therefrom 失效
标题翻译：含有聚环氧乙烷，酚醛树脂和感光性化合物的感光性组合物及其印刷版的制造方法
公开(公告)号：US3231377A
公开(公告)日：1966-01-25
申请号：US29215163
申请日：1963-07-01
申请人： UNION CARBIDE CORP
发明人： DICKINSON BARRY L , SILVER JULIUS L
IPC分类号： C08L61/06 , C08L71/02 , G03F7/038
CPC分类号： G03F7/0381 , C08L61/06 , C08L71/02 , C08L2666/22 , C08L61/04 , C08L2666/28 , C08L2666/54

8. 发明申请

US20140234777A1 PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART 有权
标题翻译：光敏组合物，固化膜及其生产工艺及电子部件
公开(公告)号：US20140234777A1
公开(公告)日：2014-08-21
申请号：US14166856
申请日：2014-01-29
申请人： JSR CORPORATION
发明人： Tomohiko SAKURAI , Masaaki HANAMURA
IPC分类号： G03F7/004 , C09D125/08 , G03F7/20
CPC分类号： G03F7/0226 , C08F8/12 , C09D125/18 , G03F7/0236 , G03F7/0381 , G03F7/0387 , G03F7/40 , C08F212/14 , C08F212/08 , C08F2220/325
摘要： It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH2OR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).
摘要翻译：本发明的目的是提高树脂组合物和适合用于形成例如表面保护膜和例如电子部件的层间绝缘膜的光敏组合物的固化性，同时减少残留在当组合物用于在基材上形成固化膜时，基材。光敏组合物包括具有酚羟基的树脂（A），具有至少两个恶唑啉基的交联剂（B1）和具有由-CH 2 OR表示的至少两个基团的交联剂（B2）（其中R是氢原子，碳原子数1〜10的烷基或乙酰基）和感光性酸发生剂（C）。

9. 发明申请

US20090253073A1 Light-Sensitive Component for Use in Photoresists 有权
标题翻译：用于光致抗蚀剂的光敏组分
公开(公告)号：US20090253073A1
公开(公告)日：2009-10-08
申请号：US12084614
申请日：2006-11-06
申请人： Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
发明人： Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
IPC分类号： G03F7/20 , C08G8/02 , G03F7/004
CPC分类号： G03F7/0233 , C07C309/76 , C08K5/42 , G03F7/0381
摘要： A compound of the formula (I) where the symbols and indices are each defined as follows: A is A′, R or O—R; where R is a straight-chain, branched or cyclic, saturated or unsaturated aliphatic radical having 1-8 carbon atoms; A′ is the same or different and is B is a bond, —O—C(O)—, —C(O)—O—, —O—C(O)—, —C(O)—NH—, —NH—C(O)—, —C(O)—O—CH2—CH(OH)—CH2—O, —O—CH2—CH(OH)—CH2—O—(O)C—, —O—C(O)—O—, —O—C(O)—NH— or —NH—C(O)—O—; R1 is H or OH; m is 1, 2, 3, 4 or 5; Y is n is a positive rational number ≧3; E is the same or different and is —CH—CHR2—, —CHR2—CH2—, —CH2—CHR2—O—, —O—CHR2—CH2—, —(CH2)r—O— or —O—(CH2)—; R2 is H or CH3 and r is 1 or 4, is suitable as a light-sensitive component for photoresists.
摘要翻译：符号和指数各自定义如下：式（I）的化合物：A是A'，R或O-R; 其中R是具有1-8个碳原子的直链，支链或环状饱和或不饱和的脂族基团; A'相同或不同，B为键，-OC（O） - ， - C（O）-O-，-OC（O） - ， - C（O）-NH-，-NH-C （O） - ， - C（O）-O-CH 2 -CH（OH）-CH 2 -O，-O-CH 2 -CH（OH）-CH 2 -O-（O） O-，-OC（O）-NH-或-NH-C（O）-O-; R1是H或OH; m为1,2,3,4或5; Y是n是正有理数> = 3; E相同或不同，为-CH-CHR 2 - ， - CHR 2 -CH 2 - ， - CH 2 -CHR 2 -O - ， - O-CHR 2 -CH 2 - ， - （CH 2）r O-或-O-（CH 2） ; R2是H或CH3，r是1或4，适用作光致抗蚀剂的光敏组分。

10. 发明授权

US5302757A Ultraviolet light sensitive onium salts 失效
标题翻译：紫外光敏敏盐
公开(公告)号：US5302757A
公开(公告)日：1994-04-12
申请号：US944640
申请日：1992-09-14
申请人： Franklin D. Saeva
发明人： Franklin D. Saeva
IPC分类号： G03F7/029 , C07C381/12 , C08K5/16 , C08K5/48 , C08K5/49 , C08K5/59 , C08L101/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03G5/026 , C07C321/28
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/0381 , G03F7/039 , G03G5/026
摘要： A composition of matter including an onium salt and a method of forming images. The onium salt has a chromophore which absorbs ultraviolet radiation, an S, Se, As, N or P atom which is free of substituents exhibiting a higher energy occupied molecular orbital than the chromophore; an insulating group which links the chromophore to the S, Se, As, N or P atom of the salt and substantially prevents .pi. resonance from the chromophore through the S, Se, As, N or P atom; and an anion. The onium salt is capable of forming a Bronsted acid upon exposure to ultraviolet radiation in the presence of a proton source. In the method of forming images, the onium salt is exposed to ultraviolet radiation in the presence of a proton source, to convert said onium salt to a Bronsted acid.
摘要翻译：包含鎓盐的物质组合物和形成图像的方法。鎓盐具有吸收紫外线辐射的发色团，不具有比发色团具有更高能量占据分子轨道的取代基的S，Se，As，N或P原子; 将发色团连接到盐的S，Se，As，N或P原子的绝缘基团，并且基本上防止（pi）从发色团通过S，Se，As，N或P原子的共振; 和阴离子。鎓盐在质子源存在下暴露于紫外线辐射下能够形成布朗斯台德酸。在形成图像的方法中，鎓盐在质子源存在下暴露于紫外线辐射，以将所述鎓盐转化成布朗斯台德酸。

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